- Review
Inverse Lithography Technology (ILT) Under Chip Manufacture Context
- Xiaodong Meng,
- Cai Chen and
- Jie Ni
16 January 2026
As semiconductor process nodes shrink to 3 nm and beyond, traditional optical proximity correction (OPC) and resolution enhancement technologies (RETs) can no longer meet the high patterning precision needs of advanced chip manufacturing due to the s...