Micro-optical gyroscopes (MOGs) place a range of components of the fiber-optic gyroscope (FOG) onto a silicon substrate, enabling miniaturization, low cost, and batch processing. MOGs require high-precision waveguide trenches fabricated on silicon in...
SiC wafers were etched using a filament plasma of He:NF3:O2 (helium:nitrogen trifluoride:oxygen) mixed gas at atmospheric pressure. When 0.5–2 sccm of NF3 was mixed to 2 slm of He filament plasma, the etch depth and etch rate increased, but there was...
This paper presents the observed changes when replacing the widely used CHF3 gas in semiconductor processing with two isomeric gases, C4H2F6-iso and C4H2F6-Z. This study investigates the etching process results of SiO2 and Si3N4 by varying the ratios...
ZnS is one of the most promising wide-bandgap semiconductors for optoelectronic and sensing applications owing to its efficient ultraviolet–blue emission, high exciton binding energy, and chemical stability. However, the synthesis of ZnS nanocr...
In the current study, the performance of the npn solar cell (SC) microstructure is improved by inspecting some modifications to provide possible paths for fabrication techniques of the structure. The npn microstructure is simulated by applying a proc...
Porous Nb2O5 films obtained by a modified hard-template method were studied and their optical and sensing properties were optimized in order to find applications in chemo-optical sensing. Porous films were prepared by following three steps: liquid mi...
Label-free detection of biomolecules using localized surface plasmon resonance (LSPR) substrates is a highly attractive method for point-of-care (POC) testing. One of the remaining challenges to developing LSPR-based POC devices is to fabricate the L...
Janus particles for oil–water separation have attracted widespread attention in recent years. Herein, we prepared a bowl-shaped Janus particle that could rapidly separate oil and water through a thiol–ene click reaction and selective etch...
Silicon oxycarbide ceramers containing 5% aluminum, zirconium, and cobalt with respect to the total Si amount are prepared from a commercial polysiloxane and molecular precursors and pyrolyzed at temperatures ranging from 500 to 1000 °C. HF etching i...
Block copolymers (BCPs) have garnered considerable interest due to their ability to form microphase-separated structures suitable for nanofabrication. For these applications, it is critical to achieve both sufficient etch selectivity and a small doma...
In this work, we show a correlation between the composition and the microstructural and optical properties of bright and uniform luminescent porous silicon (PSi) films. PSi films were synthesized by electrochemical etching using nitric acid in an ele...
In this work, a pH-responsive drug-carrier based on chitosan-silica nanospheres was developed as a carrier for Albendazole (ABZ), a poorly water-soluble anthelmintic drug. Spherical silica nanoparticles were obtained by Stöber method and further etch...
We demonstrate the fabrication of air gaps in a PECVD SiN interlayer through lateral recess by employing two consecutive plasma etch steps on an AlN/SiN/Al2O3 stack. This approach enables the preservation of sub-100 nm openings in Al2O3, offering a p...
InGaN based resonant-cavity light-emitting diode (RC-LED) structures with an embedded porous-GaN/n-GaN distributed Bragg reflector (DBR) and a top dielectric Ta2O5/SiO2 DBR were demonstrated. GaN:Si epitaxial layers with high Si-doping concentration...
We report on the fabrication of highly uniform field emitter arrays (FEAs) with an integrated self-aligned extraction gate from bulk molybdenum. All critical dimensions of the emitter tip were determined by a single process step of Inductively Couple...
Black silicon (BSi) fabrication via surface texturization of Si-wafer in recent times has become an attractive concept regarding photon trapping and improved light absorption properties for photovoltaic applications. In this study, surface texturizat...
The fabrication of semiconductor devices with three-dimensional architectures imposes unprecedented demands on advanced plasma dry etching processes. These include the simultaneous requirements of high throughput, high material selectivity, and preci...
Ceramics are a very popular material in dental implant technology due to their tribological properties, their biocompatibility and their esthetic appearance. However, their natural surface structure lacks the ability of proper osseointegration, which...
In this study, a process is developed for the fabrication of buried top-gated graphene transistors with Al2O3 as a gate dielectric, yielding devices that can be suitable for not only flexible electronics but also laser-induced graphene (LIG)-based te...
Microcracks inevitably appear on the SiC wafer surface during conventional thinning. It is generally believed that the damage-free surfaces obtained during chemical reactions are an effective means of inhibiting and eliminating microcracks. In our pr...
The electrical performance of the back-channel etched Indium–Gallium–Zinc–Oxide (IGZO) thin-film transistors (TFTs) with copper (Cu) source and drain (S/D) which are patterned by a selective etchant was investigated. The Cu S/D were...
We fabricated InGaN/GaN nanorod light emitting diode (LED) on (-201) β-Ga2O3 substrate via the SiO2 nanosphere lithography and dry-etching techniques. The InGaN/GaN nanorod LED grown on β-Ga2O3 can effectively suppress quantum confined Stark effect (...
Plasmonic nanoantennas can significantly enhance the light–matter interactions at the nanoscale, and as a result have been used in a variety of applications such as sensing molecular vibrations in the infrared range. Indium–tin–oxid...
This study presents a multilayer magnetic Janus sub-micrometric particle (MMJSP) as a nanoreactor for lipase catalysis. The core of the nanoparticle is constructed from a core-shell Fe3O4@SiO2 framework, which serves as a precursor for the sequential...
Metasurfaces, planar structures made on a subwavelength scale, enable state-of-the-art manipulation of light and have become a promising solution for compact optical devices. However, fabrication of these nanoscale structures relies on demanding proc...
Chirality plays a significant part in many vital processes, and to further our level of understanding, there is a steadily growing interest in enhancing the yield of enantioselective processes. Here, a multilayer with etched grooves is activated in a...
Acoustic energy penetrates into the Si substrate at cavity boundaries. Due to this, the air cavity-based bulk acoustic resonators experience higher harmonic mode, parasitic resonance, and spurious mode. To overcome these effects and enhance the perfo...
Aluminum Silicon (Al-Si) alloys are the most important among cast alloys and have widespread application. The β-Si phase is detrimental to the growth of micro arc oxidation (MAO) layers on Al-Si alloys. In this paper, the β-Si in the skin layer of di...
The inductively coupled plasma reactive ion etching (ICP-RIE) is a selective dry etching method used in fabrication technology of various semiconductor devices. The etching is used to form non-planar microstructures—trenches or mesa structures,...
Ultra-short 230 fs laser pulses of a 515 nm wavelength were tightly focused onto 700 nm focal spots and utilised in opening ∼0.4–1 μm holes in alumina Al2O3 etch masks with a 20–50 nm thickness. Such dielectric masks simplify...
Micro-light emitting diodes (Micro-LEDs) based on III-nitride semiconductors have become a research hotspot in the field of high-resolution display due to its unique advantages. However, the edge effect caused by inductively coupled plasma (ICP) dry...
In this paper, the relationship between coordination complexes and electrical properties according to the bonding structure of boron and silicon was analyzed to optimize the p–n junction quality for high-efficiency n-type crystalline solar cell...
The emission of mercury from coal combustion has caused consequential hazards to the ecosystem. The key challenge to abating the mercury emission is to explore highly efficient adsorbents. Herein, sulfur-functionalized carbon (S-C) was synthesized by...
This study evaluated whether airborne-particle abrasion could be an alternative to hydrofluoric acid etching as a pretreatment for the adhesive bonding of silicate ceramic restorations. Feldspar (FEL; n = 100), lithium silicate (LiSi; n = 100), and z...
GaN-based Micro-LED has been widely regarded as the most promising candidate for next generation of revolutionary display technology due to its advantages of high efficiency, high brightness and high stability. However, the typical micro-fabrication...
With the development of new designs and materials for nano-scale transistors, vertical Gate-All-Around Field Effect Transistors (vGAAFETs) with germanium as channel materials have emerged as excellent choices. The driving forces for this choice are t...
Heteroatom doping is a widely used method for the modification of the electronic and chemical properties of graphene. A low-pressure chemical vapor deposition technique (CVD) is used here to grow pure, nitrogen-doped and phosphorous-doped few-layer g...
Nanoscale film thickness metrology suffers from inconsistent results across instruments operating on different physical principles, which undermines measurement reliability and traceability. For single-wavelength ellipsometry in particular, inherent...
The formation of porous silicon by Pd nanoparticles-assisted chemical etching of single-crystal Si with resistivity ρ = 0.01 Ω·cm at 25 °C, 50 °C and 75 °C in HF/H2O2/H2O solution was studied. Porous layers of silicon wer...
ZnO thin films were deposited using RF sputtering by varying the argon:oxygen gas flow rates and substrate temperatures. Structural, optical and electrical characterization of ZnO thin films were systematically carried out using X-Ray diffraction (XR...
Nb2O5 (niobia) coatings were prepared by spin coating of niobium sol, synthesized using niobium chloride as the precursor and ethanol and water as solvents, followed by high-temperature annealing. Doping of the films was achieved by incorporating com...
The development of efficient catalyst materials that can drive high catalytic performance is challenging. Here, we report a well-defined hollow mesoporous TiN nanostructure for use as Pt catalyst support material for methanol electro-oxidation. The h...
Graphene was directly grown on SiO2/Si substrates using microwave plasma-enhanced chemical vapor deposition (PECVD) to investigate how synthesis-driven variations in structure and doping influence carrier transport. The effects of synthesis temperatu...
Carbon solid solubility in metals is an important factor affecting uniform graphene growth by chemical vapor deposition (CVD) at high temperatures. At low temperatures, however, it was found that the carbon diffusion rate (CDR) on the metal catalyst...
We propose a new type of refractive index sensing based on the transverse magnetic (TM) modes in the photonic crystal (PhC) nanobeam (NB) cavity with a horizontal air gap. The electric field of the resonant TM mode is strongly confined within the hor...
Inverted pyramid-texturing of silicon surface has been proven to have great application potential in silicon solar cells. In this paper, we utilized Ag-assisted chemical etching (Ag–ACE) technology combing with polyvinylpyrrolidone (PVP) to fabricate...
We report on the fabrication and characterization of InGaN-based ridge-waveguide laser diodes employing spin-on-glass (SOG) as the insulation and planarization layer. In contrast to conventional silicon dioxide (SiO2) isolation deposited by PECVD, th...
In this study, needle-like and pyramidal hybrid black silicon structures were prepared by performing metal-assisted chemical etching (MACE) on alkaline-etched silicon wafers. Effects of the MACE time on properties of the black silicon wafers were inv...
This paper reports on a facile bottom-up method for the direct integration of a silicon (Si)-magnesium silicide (Mg2Si) heterojunction solar cell (HSC) with a textured rear reflector made of stainless steel (SS). Modified wet chemical etching and pos...
In this work, we discuss the effects of component ratios on plasma characteristics, chemistry of active species, and silicon etching kinetics in CF4 + O2, CHF3 + O2, and C4F8 + O2 gas mixtures. It was shown that the addition of O2 changes electrons-...
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