Photoresists are fundamental materials in photolithography and are crucial for precise patterning in microelectronic devices, MEMS, and nanostructures. This paper provides an in-depth review of recent advancements in positive photoresist research and...
Advanced lithography requires highly sensitive photoresists to improve the lithographic efficiency, and it is critical, yet challenging, to develop high-sensitivity photoresists and imaging strategies. Here, we report a novel strategy for ultra-high...
With the establishment of a global carbon-neutral target, green and sustainable design concepts, materials, and processes have become the key to scientific and technological innovation, which highlights the development and utilization of environmenta...
The quality of high aspect ratio microstructures fabricated by deep X-ray lithography is highly dependent on the photoresist material used and the process parameters applied. Even with photoresists more suitable to this process, it is common to face...
This paper offers a comprehensive overview of the polyhedral oligomeric silsesquioxane (POSS) and POSS-based composites within the realm of photoresist resin. The study involves a systematic exploration and discussion of the contributions made by POS...
Extreme ultraviolet lithography (EUVL) is a leading technology in semiconductor manufacturing, enabling the creation of high-resolution patterns essential for advanced microelectronics. This review highlights recent progress in inorganic metal-oxide-...
Novel pyrolyzed photoresist carbon electrodes for electroanalytical applications have been produced by photolithographic technology followed by pyrolysis of the photoresist. A study of the determination of Ni(II) dimethylglyoximate (Ni-DMG) through a...
The paper describes the synthesis and properties of a tetra-component phenolic resin as a candidate resin for further investigation in photoresist formulations, and its oligomer was synthesized via addition, condensation, and polycondensation reactio...
Photoresist is the key material in the fabrication of micropatterns or microstructures. Tuning the surface wettability of photoresist film is a critical consideration in its application of microfluidics. In this work, the surface wettability tuning o...
Silicon solar cells have the advantages of non-toxicity, reliability, low price, and stability. Microlens arrays (MLAs) are widely used in solar cells to improve photoelectrical conversion efficiency (PCE). In this research, different MLAs mold was d...
2D and 3D topographic cues made of photoresist, a polymer, are used for cell culture and cell analysis. Photoresists used for cell analysis provide the surface conditions necessary for proper cell growth, along with patterning properties of a wide ra...
Dry film photoresists are widely employed to fabricate high-aspect-ratio microstructures, such as molds for microfluidic devices. Unlike liquid resists, such as SU-8, dry films do not require a cleanroom facility, and it is straightforward to prepare...
Patterning of lines of holes on a layer of positive photoresist SX AR-P 3500/6 (Allresist GmbH, Strausberg, Germany) spin-coated on a quartz substrate is carried out by using scanning near-field optical lithography. A green 532 nm-wavelength laser, f...
Thick SU-8 photoresist has been a popular photoresist material to fabricate various mechanical, biological, and chemical devices for many years. The accuracy and precision of the ultraviolet (UV) lithography process of thick SU-8 depend on key parame...
This paper presents a novel fabrication method based on dry film photoresists to realize waveguides and waveguide-based passive components operating at the millimeter-wave frequency (30–300 GHz). We demonstrate that the proposed fabrication method ha...
One hundred ninety three-nanometer candidate photoresist materials were synthesized by nitroxide-mediated polymerization (NMP). Statistical copolymerizations of 5-methacryloyloxy-2,6-norboranecarbolactone (NLAM) with 5–10 mol% of controlling co-monom...
We experimentally modulate the refractive index and the absorption coefficient of an SU-8 dry film in the terahertz region by UV light (362 nm) exposure with time dependency. Consequently, the refractive index of SU-8 film is increased by approximate...
The microstructures of living creatures are widely used in bionics, and some can generate structural colors on biological surfaces and enable the process of dynamic camouflage. This study presents the hydrogel photoresist synthesized by polymerizing...
Photoresists (or photo-resins) are the main and most important raw material used for lithography techniques such as deep X-ray (DXRL), ultraviolet (UVL), deep-UV (DUVL), and extreme UV (EUVL). In previous work, we showed how complicated could be the...
A random copolymer (PTBM), utilized as deep ultra-violet (DUV) photoresist, was prepared by reversible addition-fragmentation chain transfer (RAFT) polymerization with tert-butyl methacrylate (tBMA), methyl methacrylate (MMA), triphenylsulfonium p-st...
This letter proposes a method for utilizing a positive photoresist, Shipley 1805, as a sacrificial layer for sub-180 °C fabrication process flows. In the proposed process, the sacrificial layer is etched at the end to release the structures using...
With the advancement of High-NA EUV lithography and the continued evolution of transistor architectures toward GAA and CFET, semiconductor manufacturing has entered the sub-3 nm technology node era. At advanced nodes, photon shot noise becomes increa...
In this paper, a chemically amplified (CA) i-line photoresist system is described including a phenolic resin modified with glycidyl methacrylate (GMA) addition and protected with di-tert-butyl dicarbonate (BOC group), here called JB resin. JB resin w...
Extreme ultraviolet lithography (EUVL) is a leading-edge technology for pattern miniaturization and the production of advanced electronic devices. One of the current critical challenges for further scaling down the technology is reducing the line-edg...
Carbon containing materials, such as graphene, carbon-nanotubes (CNT), and graphene oxide, have gained prominence as possible electrodes in implantable neural interfaces due to their excellent conductive properties. While carbon is a promising electr...
Fabrication of microfluidic devices by soft lithography is by far the most popular approach due to simplicity and low cost. In this approach PDMS (polydimethylsiloxane) is cast on a photoresist master to generate replicas that are then sealed against...
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Aerobic treatment of wastewater containing Tetramethylammonium hydroxide (TMAH) and photoresist was investigated using a lab scale reactor inoculated with activated sludge coming from urban wastewater treatment that never received TMAH before. The co...
We report a laser-pyrolyzed carbon (LPC) electrode prepared from a black photoresist for an on-chip microsupercapacitor (MSC). An interdigitated LPC electrode was fabricated by direct laser writing using a high-power carbon dioxide (CO2) laser to sim...
A novel plastic packaging of a piezoresistive pressure sensor using a patterned ultra-thick photoresist is experimentally and theoretically investigated. Two pressure sensor packages of the sacrifice-replacement and dam-ring type were used in this st...
Hundred-micron-sized microdroplets are widely used in microbial culture, chemical investigations and industrial processes. The size, velocity and frequency of microdroplets significantly affect the cultivation and processing effects. The detections o...
A cell culture on a scaffold has the advantages of functionality and easy handling, because the geometry of the cellular tissue is controlled by designing the scaffold. To create complex cellular tissue, scaffolds should be complex two-dimensional (2...
Dry-film photoresists (DFRs) are susceptible to pattern collapse arising from hydrophilic water–DFR interactions after the development process. Although wet surface treatment (rinsing) has been proposed to increase the hydrophobicity and preven...
A major breakthrough in UV-LIGA (Lithographie, Galvanoformung and Abformung) started with the use of epoxy-based EPON® SU-8 photoresist in the mid-1990s. Using this photoresist has enabled the fabrication of tall and high aspect ratio structures wit...
We present a comparative study of three optical sensing platforms based on surface plasmon resonance (SPR) in plastic optical fibers (POFs). The proposed sensors consist of a D–shaped POF sensing area, where the exposed core is covered by a pho...
In nature, engineering technology and daily life, wetting phenomena are widespread and have essential roles and significance. Bionics is becoming increasingly important nowadays and exploring the mechanism that influences biomimetic surface microstru...
Two different azosulphonate dyes were synthesised and purified for the preparation of a water-based photoreactive azosulphonate-doped poly(vinyl alcohol). The aim was the investigation of a novel azosulphonate-poly(vinyl alcohol) photoresist with dec...
Electrowetting with a dielectric layer is commonly preferred in practical applications. However, its potential is often limited by factors like the properties of the dielectric layer and its breakdown, along with the complexity of the deposition meth...
The quality of graphene intended for use in biosensors was assessed on manufactured chips using a set of methods including atomic force microscopy (AFM), Raman spectroscopy, and low-frequency noise investigation. It is shown that local areas of resid...
The development of photonic-integrated circuits (PICs) for data communication, sensing, and quantum computing is hindered by the high complexity and cost of traditional fabrication methods, which rely on expensive equipment, limiting accessibility fo...
A significant decrease in resistivity by 55% under blue lighting with ~0.4 J·mm−2 energy density is demonstrated in amorphous film of metal-insulator NdNiO3 at room temperature. This large negative photoresistivity contrasts with a small positive pho...
Replacing petroleum-based polymers with biopolymers such as polysaccharides is essential for protecting our environment by saving fossil resources. A research field that can benefit from the application of more sustainable and renewable materials is...
In this study, white organic light-emitting diodes (OLEDs) consisting of red quantum dots (RQD) and green quantum dots (GQD) were investigated. These are the most exciting new lighting technologies that have grown rapidly in recent years. The white O...
Iron(III) cross-linked alginate hydrogel incorporating sodium lactate undergoes photoinduced degradation, thus serving as a biocompatible positive photoresist suitable for photochemical patterning. Alternatively, surface etching of iron(III) cross-li...
Aromatic polyazides are widely used as starting materials in organic synthesis and photochemical studies, as well as photoresists in microelectronics and as cross-linking agents in polymer chemistry. Some aromatic polyazides possess high antitumor ac...
Due to the increasing complexity of microelectromechanical system (MEMS) devices, the accuracy and precision of two-dimensional microstructures of SU-8 negative thick photoresist have drawn more attention with the rapid development of UV lithography...
One of the types of negative tone photoresists is composed of at least a catalyst, a solvent, and epoxy resin. This is the primary raw material for lithography technology. To ensure high-quality pattern transfer in the lithography process, it is cruc...
In the era of lab-on-chip (LOC) devices, two-photon polymerization (TPP) is gaining more and more interest due to its capability of producing micrometer-sized 3D structures. With TPP, one may integrate functional structures into microfluidic systems...
This paper proposes a method for improving the patterning resolution of conventional contact photolithography from the micrometer, down to the sub-micrometer scale. The key element is a soft polydimethylsiloxane (PDMS) photomask, which is first repli...
We present a simple, rapid and low-cost multi-layer mold fabrication method for production of polydimethylsiloxane (PDMS) lab-on-chip (LOC) devices. The new approach offers resource-strained researchers access to microfluidic lab-on-chip fabrication...
Imaging the interaction between the laser pulse and photoresist mixture on the ultrafast time scale can track the path of the light pulse and reveal the procedure of the microstructure machining. However, most existing imaging technologies suffer fro...
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