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Open AccessArticle

Micropatterning Method for Porous Materials Using the Difference of the Glass Transition Temperature between Exposed and Unexposed Areas of a Thick-Photoresist

1
Division of Mechanical Science and Technology, Gunma University, Kiryu 376-8515, Japan
2
Division of Molecular Science, Gunma University, Kiryu 376-8515, Japan
*
Author to whom correspondence should be addressed.
Micromachines 2020, 11(1), 54; https://doi.org/10.3390/mi11010054
Received: 1 December 2019 / Revised: 19 December 2019 / Accepted: 29 December 2019 / Published: 31 December 2019
(This article belongs to the Special Issue Nano/Micropatterning for Tissue Engineering and Regenerative Medicine)
A cell culture on a scaffold has the advantages of functionality and easy handling, because the geometry of the cellular tissue is controlled by designing the scaffold. To create complex cellular tissue, scaffolds should be complex two-dimensional (2D) and three-dimensional (3D) structures. However, it is difficult to fabricate a scaffold with a 2D and 3D structure because the shape, size, and fabrication processes of a 2D structure in creating a cell layer, and a 3D structure containing cells, are different. In this research, we propose a micropatterning method for porous materials using the difference of the glass transition temperature between exposed and unexposed areas of a thick-photoresist. Since the proposed method does not require a vacuum, high temperature, or high voltage, it can be used for fabricating various structures with a wide range of scales, regardless of the materials used. Additionally, the patterning area can be fabricated accurately by photolithography. To evaluate the proposed method, a membrane integrated scaffold (MIS) with a 2D porous membrane and 3D porous material was fabricated. The MIS had a porous membrane with a pore size of 4 μm or less, which was impermeable to cells, and a porous material which was capable of containing cells. By seeding HUVECs and HeLa cells on each side of the MIS, the cellular tissue was formed with the designed geometry. View Full-Text
Keywords: thick photoresist; glass transition temperature; backside exposure; scaffold; micropatterning thick photoresist; glass transition temperature; backside exposure; scaffold; micropatterning
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MDPI and ACS Style

Ueno, H.; Sato, K.; Yamada, K.; Suzuki, T. Micropatterning Method for Porous Materials Using the Difference of the Glass Transition Temperature between Exposed and Unexposed Areas of a Thick-Photoresist. Micromachines 2020, 11, 54.

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