Next Article in Journal
On the Luminescence Properties and Surface Passivation Mechanism of III- and N-Polar Nanopillar Ultraviolet Multiple-Quantum-Well Light Emitting Diodes
Next Article in Special Issue
Recent Advances in Monitoring Cell Behavior Using Cell-Based Impedance Spectroscopy
Previous Article in Journal
Analysis of the Binding of Analyte-Receptor in a Micro-Fluidic Channel for a Biosensor Based on Brownian Motion
Previous Article in Special Issue
Recent Advances in Electrochemiluminescence-Based Systems for Mammalian Cell Analysis
Open AccessArticle

Cell Culture on Low-Fluorescence and High-Resolution Photoresist

Division of Mechanical Science and Technology, Gunma University, Kiryu 376-8515, Japan
Health and Medical Research Institute, National Institute of Advanced Industrial Science and Technology, 2217-14 Hayashi-cho, Takamatsu 761-0395, Japan
Innovation Park, Daicel Corporation, Himeji 671-1283, Japan
Division of Intelligent Mechanical Systems Engineering, Kagawa University, Takamatsu 761-0396, Japan
RIKEN, Wako 351-0198, Japan
Author to whom correspondence should be addressed.
Micromachines 2020, 11(6), 571;
Received: 25 April 2020 / Revised: 26 May 2020 / Accepted: 28 May 2020 / Published: 4 June 2020
(This article belongs to the Special Issue Micro and Nano Devices for Cell Analysis)
2D and 3D topographic cues made of photoresist, a polymer, are used for cell culture and cell analysis. Photoresists used for cell analysis provide the surface conditions necessary for proper cell growth, along with patterning properties of a wide range and high precision, and low auto-fluorescence that does not affect fluorescence imaging. In this study, we developed a thick negative photoresist SJI-001 possessing the aforementioned properties. We evaluated the surface conditions of SJI-001 affecting cell culture. First, we studied the wettability of SJI-001, which was changed by plasma treatment, conducted as a pretreatment on a plastic substrate before cell seeding. SJI-001 was more chemically stable than SU-8 used for fabricating the micro-electromechanical systems (MEMS). Furthermore, the doubling time and adhesion rate of adherent HeLa cells cultured on untreated SJI-001 were 25.2 h and 74%, respectively, thus indicating its suitability for cell culture over SU-8. In addition, we fabricated a cell culture plate with a 3D lattice structure, three micrometers in size, using SJI-001. HeLa cells seeded on this plate remained attached over five days. Therefore, SJI-001 exhibits surface conditions suitable for cell culture and has several bioapplications including microstructures and cell chips for cell culture and cell analysis. View Full-Text
Keywords: low-fluorescence; high resolution; photoresist; cell analysis; cell chip; micro and nanotechnology low-fluorescence; high resolution; photoresist; cell analysis; cell chip; micro and nanotechnology
Show Figures

Graphical abstract

MDPI and ACS Style

Ueno, H.; Maruo, K.; Inoue, M.; Kotera, H.; Suzuki, T. Cell Culture on Low-Fluorescence and High-Resolution Photoresist. Micromachines 2020, 11, 571.

Show more citation formats Show less citations formats
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Article Access Map by Country/Region

Search more from Scilit
Back to TopTop