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Article

Cell Culture on Low-Fluorescence and High-Resolution Photoresist

1
Division of Mechanical Science and Technology, Gunma University, Kiryu 376-8515, Japan
2
Health and Medical Research Institute, National Institute of Advanced Industrial Science and Technology, 2217-14 Hayashi-cho, Takamatsu 761-0395, Japan
3
Innovation Park, Daicel Corporation, Himeji 671-1283, Japan
4
Division of Intelligent Mechanical Systems Engineering, Kagawa University, Takamatsu 761-0396, Japan
5
RIKEN, Wako 351-0198, Japan
*
Author to whom correspondence should be addressed.
Micromachines 2020, 11(6), 571; https://doi.org/10.3390/mi11060571
Received: 25 April 2020 / Revised: 26 May 2020 / Accepted: 28 May 2020 / Published: 4 June 2020
(This article belongs to the Special Issue Micro and Nano Devices for Cell Analysis)
2D and 3D topographic cues made of photoresist, a polymer, are used for cell culture and cell analysis. Photoresists used for cell analysis provide the surface conditions necessary for proper cell growth, along with patterning properties of a wide range and high precision, and low auto-fluorescence that does not affect fluorescence imaging. In this study, we developed a thick negative photoresist SJI-001 possessing the aforementioned properties. We evaluated the surface conditions of SJI-001 affecting cell culture. First, we studied the wettability of SJI-001, which was changed by plasma treatment, conducted as a pretreatment on a plastic substrate before cell seeding. SJI-001 was more chemically stable than SU-8 used for fabricating the micro-electromechanical systems (MEMS). Furthermore, the doubling time and adhesion rate of adherent HeLa cells cultured on untreated SJI-001 were 25.2 h and 74%, respectively, thus indicating its suitability for cell culture over SU-8. In addition, we fabricated a cell culture plate with a 3D lattice structure, three micrometers in size, using SJI-001. HeLa cells seeded on this plate remained attached over five days. Therefore, SJI-001 exhibits surface conditions suitable for cell culture and has several bioapplications including microstructures and cell chips for cell culture and cell analysis. View Full-Text
Keywords: low-fluorescence; high resolution; photoresist; cell analysis; cell chip; micro and nanotechnology low-fluorescence; high resolution; photoresist; cell analysis; cell chip; micro and nanotechnology
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MDPI and ACS Style

Ueno, H.; Maruo, K.; Inoue, M.; Kotera, H.; Suzuki, T. Cell Culture on Low-Fluorescence and High-Resolution Photoresist. Micromachines 2020, 11, 571. https://doi.org/10.3390/mi11060571

AMA Style

Ueno H, Maruo K, Inoue M, Kotera H, Suzuki T. Cell Culture on Low-Fluorescence and High-Resolution Photoresist. Micromachines. 2020; 11(6):571. https://doi.org/10.3390/mi11060571

Chicago/Turabian Style

Ueno, Hidetaka, Katsuya Maruo, Masatoshi Inoue, Hidetoshi Kotera, and Takaaki Suzuki. 2020. "Cell Culture on Low-Fluorescence and High-Resolution Photoresist" Micromachines 11, no. 6: 571. https://doi.org/10.3390/mi11060571

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