- Article
Multi-Domain Data Integration for Plasma Diagnostics in Semiconductor Manufacturing Using Tri-CycleGAN
- Minji Kang,
- Sung Kyu Jang,
- Jihun Kim,
- Seongho Kim,
- Changmin Kim,
- Hyo-Chang Lee,
- Wooseok Kang,
- Min Sup Choi,
- Hyeongkeun Kim and
- Hyeong-U Kim
The precise monitoring of chemical reactions in plasma-based processes is crucial for advanced semiconductor manufacturing. This study integrates three diagnostic techniques—Optical Emission Spectroscopy (OES), Quadrupole Mass Spectrometry (QMS...