- Article
Controlling the Dissolution Behavior of (Meth)acrylate-Based Photoresist Polymers in Tetramethylammonium Hydroxide by Introducing Adamantyl Groups
- Jinyoung Kim,
- Choong-Jae Lee,
- Dong-Gun Lee,
- Geon-Ho Lee,
- Jayoung Hyeon,
- Yura Choi and
- Namchul Cho
(Meth)acrylate polymers are commonly used as photoresist materials in photolithography. However, these polymers encounter the problem of swelling during the development process. To address this, we explored the use of a hydrophobic group to control t...