Iron–cobalt (FeCo) alloys are highly desirable for their exceptional and adjustable physicochemical properties, particularly in the form of thin films. This study focuses on the growth of iron–cobalt (FeCo) alloy thin films using potentio...
Nanocrystalline diamond (NCD) films are attractive for many applications due to their smooth surfaces while holding the properties of diamond. However, their growth rate is generally low using common Ar/CH4 with or without H2 chemistry and strongly d...
A search through the literature reveals that the vast majority of studies about aluminum anodizing were conducted at the macroscale (i.e., from cm2 up to m2), while those focused on local anodizing (i.e., on surfaces of less than 1 mm2) are rare. The...
A numerical procedure was performed to simplify the complicated mechanism of an epitaxial thin-film growth process. In this study, three numerical mechanism models are presented for verifying the growth rate of the gallium nitride (GaN) mechanism. Th...
Environmentally assisted cracking (EAC) is essential in predicting light water reactors’ structural integrity and service life. Alloy 600 (equivalent to Inconel 600) has excellent corrosion resistance and is often used as a welding material in welded...
The improvement in ALD growth rate has always been challenging due to its slow atomic-scale depositions. Although Al2O3 ALD is one of the most widely used ALD processes, the effects of its process parameters on growth rate have not been systematicall...
A numerical verification procedure and the effects of operating conditions in a large, vertical, and close-spaced reactor for metalorganic chemical vapor deposition are investigated through simulation and analysis. A set of epitaxy experiments are pr...
Silica core-shell nanoparticles of about 60–120 nm with a closed outer layer of bismuth or molybdenum oxide of 1–10 nm were synthesized by an integrated chemical vapor synthesis/chemical vapor deposition process at atmospheric pressure. Film growth r...
Drying experiments with varying air temperature and humidity were conducted to investigate the influence of the drying process on the crystallization of thin sucrose films. For the first time, the effects of the nucleation onset, nucleation rate, and...
The wetting behavior of ionic liquids (ILs) on the mesoscopic scale considerably impacts a wide range of scientific fields and technologies. Particularly under vacuum conditions, these materials exhibit unique characteristics. This work explores the...
Indium oxide (In2O3) film has excellent optical and electrical properties, which makes it useful for a multitude of applications. The preparation of In2O3 film via atomic layer deposition (ALD) method remains an issue as most of the available In-prec...
In this work, the impact of translation rates in fluorine doped tin oxide (FTO) thin films using atmospheric pressure chemical vapour deposition (APCVD) were studied. We demonstrated that by adjusting the translation speeds of the susceptor, the grow...
Atomic layer deposition (ALD) of Y2O3 thin films was investigated using Y(MeCp)2(iPr-nPrAMD) precursor and H2O reactant. The self-limiting reaction mechanism of ALD-Y2O3 thin films was confirmed at a growth temperature of 260 °C. And, the saturat...
α-Ga2O3 films were grown on a c-plane sapphire substrate by HCl-supported mist chemical vapor deposition with multiple solution chambers, and the effect of HCl support on α-Ga2O3 film quality was investigated. The growth rate monotonicall...
The Laser Direct Synthesis and Patterning (LDSP) technology has advantages in terms of processing time and cost compared to nanomaterials-based laser additive microfabrication processes. In LDSP, a scanning laser on the substrate surface induces chem...
Recently, indium oxide (In2O3) thin films have emerged as a promising electron transport layer (ETL) for perovskite solar cells; however, solution-processed In2O3 ETL suffered from poor morphology, pinholes, and required annealing at high temperature...
Recently, carbon nanomaterials have attracted significant attention due to their remarkable physical and chemical properties. The preparation methods and applications of the carbon nanomaterials have developed rapidly. In this study, the flame synthe...
The effects of medium and flow rate on the film-forming structures of B10 Cu-Ni alloys and their resistance to corrosion caused by sulfate-reducing bacteria are investigated in this article. Combined with a predicted cloud map of pipeline corrosion a...
Heteroepitaxial growth of Ge films on Si is necessary for the progress of integrated Si photonics technology. In this work, an in-house assembled plasma enhanced chemical vapor deposition reactor was used to grow high quality epitaxial Ge films on Si...
The morphology of aluminum co-doped scandium stabilized zirconia (ScAlSZ) thin films formed by e-beam deposition system was investigated experimentally and theoretically. The dependencies of surface roughness, and the films’ structure on deposi...
Hafnium oxide (HfOx) films have a wide range of applications in solid-state devices, including metal–oxide–semiconductor field-effect transistors (MOSFETs). The growth of HfOx films from the metal precursor tetrakis(ethylmethylamino) hafn...
In recent years, the application of (In, Al, Ga)N materials in photovoltaic devices has attracted much attention. Like InGaN, it is a direct band gap material with high absorption at the band edge, suitable for high efficiency photovoltaic devices. N...
A dynamic magnetic field (DMF) with different angular frequencies (50, 100, and 150 π rad/s) was introduced during diamond growth via hot filament chemical vapor deposition (HFCVD). The effects of the dynamic magnetic field on the growth rate, dia...
The possibility that charged nanoparticles (CNPs) are generated in the gas phase during direct current (DC) magnetron sputtering of Ag is studied. Sputtered Ag particles could be captured on an ultrathin amorphous carbon membrane for transmission ele...
Cr2O3 thin films were grown on a Si (1 0 0) substrate using Cr(thd)3 and O3 by atomic layer deposition (ALD) at substrate temperatures (TG) from 200 to 300 °C. X-ray amorphous films were deposited at a TG ≤ 225 °C, whereas at higher temper...
This study investigates the impact of vapour-phase precursor flow rates—specifically those of trimethylaluminum (TMA) and deionized water (H2O)—on the deposition of aluminum oxide (Al2O3) thin films through atomic layer deposition (ALD)....
Nanostructured diamond (NSD) films were grown on silicon and Ti–6Al–4V alloy substrates by microwave plasma chemical vapor deposition (MPCVD). NSD Growth rates of 5 µm/h on silicon, and 4 µm/h on Ti–6Al–4V were achieved. In a chemistry of H2/CH4/N2,...
Hafnium oxide (HfO2) thin films have been made by atomic vapor deposition (AVD) onto Si substrates under different growth temperature and oxygen flow. The effect of different growth conditions on the structure and optical characteristics of deposited...
In recent years, polybutylene adipate-co-terephthalate (PBAT) mulch film has become one of the most commonly used biodegradable mulch films in agriculture in an attempt to combat plastic film pollution. However, its degradation characteristics and im...
TiNi shape-memory-alloy thin films can be used as small high-speed actuators or sensors because they exhibit a rapid response rate. In recent years, the transformation temperature of these films, manufactured via a magnetron sputtering method, was fo...
Aluminum gallium nitride (AlGaN) is a nanohybrid semiconductor material with a wide bandgap, high electron mobility, and high thermal stability for various applications including high-power electronics and deep ultraviolet light-emitting diodes. The...
In this study, we assessed the physical and chemical properties of HfO2 thin films deposited by plasma-enhanced atomic layer deposition (PEALD). We confirmed the self-limiting nature of the surface reactions involved in the HfO2 thin film’s gro...
This paper developed a three-dimensional model to simulate the process of atomization and liquid film formation during the air-blast spray cooling technological process. The model was solved using the discrete phase model method. Several factors incl...
Micro-arc oxidation (MAO) is a promising technology for enhancing the wear resistance of engine cylinders by growing a high hardness alumina ceramic film on the surface of light aluminum engine cylinders. However, the positive and negative pulse coor...
Layer-by-layer (LbL) modification of porous membranes for water filtration has become an active research field in the past few years. Different mechanisms regarding polyelectrolyte film growth, swelling and smoothing, transport through these films, e...
Silicon nitride (SiNx) thin films using 1,3-di-isopropylamino-2,4-dimethylcyclosilazane (CSN-2) and N2 plasma were investigated. The growth rate of SiNx thin films was saturated in the range of 200–500 °C, yielding approximately 0.38 Å...
The growth of oxide film, which results from the inward oxygen diffusion from a corrosive environment, is a critical consideration for the corrosion resistance of zirconium alloys. This work calculates the oxygen diffusion coefficients in the oxide f...
This study investigates the synergistic effects of co-doping with ultralow-concentration nitrogen and trace carbon dioxide on the growth of polycrystalline diamond films via microwave plasma chemical vapor deposition (MPCVD). The films were character...
Polycrystalline diamond (PCD) films are usually grown by chemical vapor deposition (CVD) in hydrogen–methane mixtures. The synthesis conditions determine the structure and quality of the grown material. Here, we report the complex effect of the...
AlN thin films were deposited on flexible Hastelloy tapes and Si (100) substrate by middle-frequency magnetron sputtering. A layer of Y2O3 films was used as a buffer layer for the Hastelloy tapes. A two-step deposition technique was used to prepare t...
Plastic film mulching has been widely used to improve crop yield and water use efficiency, although the effects of plastic film mulching on water, heat, nitrogen dynamics, and crop growth are rarely presented comprehensively. This study investigated...
Metal organic frameworks have emerged as an important new class of materials with many applications, such as sensing, gas separation, drug delivery. In many cases, their performance is limited by structural defects, including vacancies and domain bou...
MoSN/MoS2 multilayer films were deposited by a sputtering MoS2 target in alternate Ar and Ar/N2 mixed atmospheres with different nitrogen flow rates. The influence of nitrogen flow rates on the microstructure, mechanical and tribological properties o...
Plasmonic metal nanoparticle (NP)-decorated thin films of biobased and biocompatible polymers provide significant opportunities in various biomedical applications. Inspired from the adhesive proteins of the marine mussels, polydopamine (PDA) serves a...
Epitaxial growth can be used to guide the controllable growth of one metal on the surface of another substrate by matching the interface lattice, thus improving the dendrite tendency of metal growth. The atomic arrangement of the Cu (111) crystal pla...
Silicon carbide is successfully implemented in semiconductor technology; it is also used in systems operating under aggressive environmental conditions, including high temperatures and radiation exposure. In the present work, molecular dynamics model...
Film mulching technology has greatly improved the efficiency of agricultural production. However, it also causes environmental problems such as soil contamination. Biodegradable mulch films, which represent environmentally friendly alternatives, pres...
The homoepitaxial growth of 4H-SiC films was conducted on 4H-SiC 150 mm 4° off-axis substrates by using a home-made hot-wall chemical vapor deposition (CVD) reactor. Special attention was paid to the influence of the growth temperature on the sur...
The Zr film microstructure is highly influenced by the energy of the plasma species during the deposition process. The influences of the discharge pulse width, which is the key factor affecting ionization of sputtered species in the high-power impuls...
The isothermal oxidation behavior of single crystal DD6 film-cooling blades was investigated. The isothermal oxidation tests were conducted at 1050 °C, and the phase analysis was performed by XRD, while SEM (EDS) was employed to observe the mater...
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