- Article
MoS2 Transistors with Low Schottky Barrier Contact by Optimizing the Interfacial Layer Thickness
- Jinbing Cheng,
- Junbao He,
- Chunying Pu,
- Congbin Liu,
- Xiaoyu Huang,
- Deyang Zhang,
- Hailong Yan and
- Paul K. Chu
Molybdenum disulfide (MoS2) has attracted great attention from researchers because of its large band gap, good mechanical toughness and stable physical properties; it has become the ideal material for the next-generation optoelectronic devices. Howev...