193 Results Found

Fe-O-N films were successfully deposited by magnetron sputtering of an iron target in Ar-N2-O2 reactive mixtures at high nitrogen partial pressure 1.11 Pa (Q(N2) = 8 sccm) using a constant flow rate of argon and an oxygen flow rate Q(O2) varying from...

We explored the effect of magnetic field strength | B | and geometry (degree of balancing) on the deposition rate and ionized flux fraction F flux in dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS)...

In the present study, the AlCoCrNi high-entropy metallic film was deposited on a Si wafer using a magnetron sputtering system. To capture the effects of the sputtering parameters on the microstructure and mechanical properties of the film, the flow r...

Thin-Film Thermocouples (TFTCs) are characterized by their high spatial resolutions, low cost, high efficiency and low interference on the air flow. However, the thermal stability of TFTCs should be further improved for application since their accura...

Water vapor-impermeable AlON/HfOx bilayer films were constructed through a hybrid high-power impulse magnetron sputtering (HiPIMS) and radio-frequency magnetron sputtering process (RFMS), applied as an encapsulation of flexible electronics such as or...

This paper reports on the deposition and characterization of piezoelectric AlXSc1-XN (further: AlScN) films on Si substrates using AlSc alloy targets with 30 at.% Sc. Films were deposited on a Ø200 mm area with deposition rates of 200 nm/min u...

Plasma nitriding (PN) is often used to enhance the mechanical properties (surface hardness, wear and corrosion resistance) of bulk alloys. High-quality AlCrN hard coatings were obtained using high-power pulsed magnetron sputtering (HiPIMS) technology...

This work compares the deposition of aluminum nitride by magnetron sputtering on silicon to multilayer ceramic substrates. The variation of sputter parameters in a wide range following a fractional factorial experimental design generates diverse crys...

Magnetron Sputter Vacuum Deposition (MSVD) has undergone significant advancements since its inception. This review explores the evolution of MSVD, encompassing its fundamental principles, various techniques (including reactive sputtering, pulsed magn...

An ionized physical vapor deposition technique for thin ferromagnetic films is proposed. The technique is based on high power impulse magnetron sputtering (HiPIMS) with positive discharge polarity. A gapped-target was employed as the cathode of the m...

Traditional dc magnetron sputtering has a low ionization rate when preparing metallic thin films. With the development of thin film science and the market demand for thin film material applications, it is necessary to improve the density of magnetron...

High-power pulse magnetron sputtering is a new type of magnetron sputtering technology that has advantages such as high peak power density and a high ionization rate compared to DC magnetron sputtering. In this paper, we report the effects of differe...

AlN is a wide band gap semiconductor that is of growing industrial interest due to its piezoelectric properties, high breakdown voltage and thermal conductivity. Using magnetron sputtering to grow AlN thin films allows for high deposition rates and u...

Solar light is a renewable source of energy that can be used and transformed into electricity using clean energy technology. In this study, we used direct current magnetron sputtering (DCMS) to sputter p-type cuprous oxide (Cu2O) films with different...

Zr–Si–N films were fabricated through the co-deposition of high-power impulse magnetron sputtering (HiPIMS) and radio-frequency magnetron sputtering (RFMS). The mechanical properties of the films fabricated using various nitrogen flow rat...

During the operation of multi-electric aircraft, the polytetrafluoroethylene (PTFE) material used to insulate the aviation cable is subjected to a high electric field while working under the extreme conditions of high temperatures for a long time, wh...

Thermal barrier coatings have been used to protect superalloys under extremely harsh conditions. The durability of TBCs with a NiCoCrAlY bond layer prepared via the air plasma spray process and an ultrathin dense layer prepared via magnetron sputteri...

The field of gas sensors has been developing for the last year due to the necessity of characterizing compounds and, in particular, volatile organic compounds whose detection can be of special interest in a vast range of applications that extend from...

This paper aims to investigate the quality of thin alumina films deposited on glass samples using magnetron sputtering in the reactive modulated pulsed power mode (MPPMS) and evaluate the process productivity. The aluminum target was sputtered in Ar/...

Platinum coatings produced by magnetron sputtering are highly valued due to their exceptional properties, including excellent electrical conductivity, high catalytic activity, and superior corrosion resistance. The quality of these coatings, however,...

High Power Impulse Magnetron Sputtering (HiPIMS) has generated a great deal of interest by offering significant advantages such as high target ionization rate, high plasma density, and the smooth surface of the sputtered films. This study discusses t...

Hydrogen-free diamond-like carbon (DLC) thin films are attractive for a wide range of industrial applications. One of the challenges related to the use of hard DLC lies in the high intrinsic compressive stresses that limit the film adhesion. Here, we...

To improve the deposition rate of thin films, a novel oscillating pulse magnetron sputtering technology (OPMS) was developed to substitute the traditional high-power impulse magnetron sputtering (HiPIMS). Meanwhile, the relative density and the mecha...

Highly bismuth-substituted iron garnet thin films are prepared on quartz substrates by using a radio frequency (RF) magnetron sputtering technique. We study the factors (process parameters associated with the RF magnetron sputter deposition technique...

The present study investigates Mg (0 ÷ 17.5 wt %), Cu (0 ÷ 21 wt %) and Ni (0 ÷ 20.2 wt %) dopants (M-doped) influence on photocatalytic activity of amorphous TiO2 thin films. Magnetron sputtering was used for the deposition of M...

Antibacterial metalized poly(vinylidene fluoride) (PVDF) porous membranes with a nano-layer were obtained via the method of vapor-induced phase separation combined with magnetron sputtering of copper. Magnetron sputtering has such advantages as high...

Using a top-down magnetron sputtering technique with a high deposition-rate, a one-step method for preparing germanium (Ge) hybrid film is presented. At present, graphite film is used as a current collector because it is flexible, self lubricating, a...

Tungsten-modified hydrogenated amorphous carbon coatings (a-C:H:W) were deposited on high speed steel by reactive magnetron sputtering of a tungsten carbide target in an argon-ethine atmosphere. The deposition parameters, sputtering power, bias volta...

In parabolic trough technology, the development of thermally and structurally stable solar coatings plays a key role in determining the efficiency, durability, and economic feasibility of tube receivers. A cermet-based solar coating is typically cons...

Magnetron-sputtered WS2 composite thin films are solid lubricants with excellent performances. However, the low hardness of the WS2 thin films necessitates the further improvement of their wear resistance. For this purpose, an effective strategy is t...

The use of high-power impulse magnetron sputtering (HIPIMS) to deposit chromium-based thin films on brass substrates for the purpose of corrosion-protective coating was investigated. By varying the process parameters (pulse frequency, pulse width and...

A reactive high-power impulse magnetron sputtering system (HiPIMS) working in Ar + H2S gas mixture was investigated as a source for the deposition of iron sulfide thin films. As a sputtering material, a pure Fe target was used. Plasma parameters in t...

Multilayer films with high-density layer interfaces have been studied widely because of the unique mechanical and functional properties. Magnetron sputtering is widely chosen to fabricate multilayer films because of the convenience in controlling the...

Titanium-copper (Ti–Cu) coatings have attracted extensive attention in the surface modification of industrial and biomedical materials due to their excellent physical and chemical properties and biocompatibility. Here, Ti–Cu coatings are...

Environmentally-safe high-power impulse magnetron sputtering (HiPIMS) technology was utilized to deposit chromium films. This research focused on the influences of the HiPIMS pulse widths on the microstructure of films deposited at different depositi...

The cytocompatibility of titanium oxides (TiO2) and oxynitrides (N-TiO2, TiOxNy) thin films depends heavily on the surface topography. Considering that the initial relief of the substrate and the coating are summed up in the final topography of the s...

An experimental method for preparing high-entropy thin films with gradient changes of alloying elements by magnetron sputtering co-deposition is proposed in this work to evaluate the effect of alloying element composition changes on the properties of...

In this study, hard wear-resistant Ti-Si-C coatings were deposited on Cu-Cr materials to improve their performance as sliding electrical contact materials. A ceramic disk composed of Ti3SiC2 and TiC phases was used as a target for DC magnetron sputte...

The layered cobaltates AxCoO2 (A: alkali metals and alkaline earth metals) are of interest in the area of energy harvesting and electronic applications, due to their good electronic and thermoelectric properties. However, their future widespread appl...

In this study, Mo-(Y,Zr)-Si-B coatings were obtained by direct current magnetron sputtering (DCMS) and high-power impulse magnetron sputtering (HIPIMS) using mosaic targets. The results showed that the addition of Y and Zr into the composition of Mo-...

TiNi shape-memory-alloy thin films can be used as small high-speed actuators or sensors because they exhibit a rapid response rate. In recent years, the transformation temperature of these films, manufactured via a magnetron sputtering method, was fo...

For the first time in the literature, the material properties of gallium-doped zinc oxide, grown from a high impulse magnetron sputtering system (HiPIMS), are reported. These material properties are compared to those of a typical radio frequency (RF)...

Practical experience in the use of high power impulse magnetron sputtering (HiPIMS) technology has revealed that output bias current depends on the total energy output of the cathodes, which means that bias voltage settings do not necessarily match t...

In this study, vanadium oxynitride thin films were deposited by reactive magnetron sputtering using pure vanadium targets, Ar as a plasma carrier, and a mix of N2 and O2 as reactive gases. Various ratios of mass flow rates between two reactive gases...

In this study, we investigate the role of film thickness in modulating the properties of Cu films deposited on BaTiO3 ceramic substrates using direct current magnetron sputtering (DCMS) and high-power pulsed magnetron sputtering (HiPIMS). While HiPIM...

The high-power impulse magnetron sputtering (HiPIMS) technique is widely used owing to the high degree of ionization and the ability to synthesize high-quality coatings with a dense structure and smooth morphology. However, limited efforts have been...

Duplex stainless steels are being used on applications that require high corrosion resistance and excellent mechanical properties, such as the naval and oil-gas exploration industry. The components employed in these industries are usually obtained by...

The paper deals with the (Cr1−xAlx)N coating containing 17 to 54 % Al which is deposited on AISI 430 stainless steel stationary substrates by short-pulse high-power dual magnetron sputtering of Al and Cr targets. The Al/Cr ratio in the coating...

The influence of the O2 flow rate on the properties of gallium oxide (Ga2O3) by RF magnetron sputtering was studied. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), transmittance spectra, and photoluminesce...

TiO2 and TiO2 films modified with Ag (Ag/TiO2) were prepared via the DC magnetron sputtering method and the degree of modification was controlled via the sputtering power and time of Ag. The microstructures and properties of these films were characte...