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Open AccessFeature PaperArticle

Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture

1
Institute of Physics, Czech Academy of Sciences, Na Slovance 2, 182 00 Prague, Czech Republic
2
Charles University, Faculty of Mathematics and Physics, V Holešovičkách 2, 180 00 Prague, Czech Republic
*
Authors to whom correspondence should be addressed.
Coatings 2020, 10(3), 246; https://doi.org/10.3390/coatings10030246
Received: 23 January 2020 / Revised: 3 March 2020 / Accepted: 4 March 2020 / Published: 6 March 2020
(This article belongs to the Special Issue Thin Film Coatings for Multifunctional Applications)
A reactive high-power impulse magnetron sputtering system (HiPIMS) working in Ar + H2S gas mixture was investigated as a source for the deposition of iron sulfide thin films. As a sputtering material, a pure Fe target was used. Plasma parameters in this system were investigated by a time-resolved Langmuir probe, radio-frequency (RF) ion flux probe, quartz crystal monitor modified for measurement of the ionized fraction of depositing particles, and by optical emission spectroscopy. A wide range of mass flow rates of reactive gas H2S was used for the investigation of the deposition process. It was found that the deposition rate of iron sulfide thin films is not influenced by the flow rate of H2S reactive gas fed into the magnetron discharge although the target is covered by iron sulfide compound. The ionized fraction of depositing particles decreases from r ≈ 40% to r ≈ 20% as the flow rate of H2S, QH2S, changes from 0 to 19 sccm at the gas pressure around p ≈ 1 Pa in the reactor chamber. The electron concentration ne measured by the Langmuir probe at the position of the substrate decreases over this change of QH2S from 1018 down to 1017 m−3 View Full-Text
Keywords: HiPIMS; Langmuir probe; optical emission spectrometry; time-resolved probe measurements; H2S, electron density; electron temperature; ionization fraction; SEM, XRD HiPIMS; Langmuir probe; optical emission spectrometry; time-resolved probe measurements; H2S, electron density; electron temperature; ionization fraction; SEM, XRD
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Hubička, Z.; Čada, M.; Kapran, A.; Olejníček, J.; Kšírová, P.; Zanáška, M.; Adámek, P.; Tichý, M. Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture. Coatings 2020, 10, 246.

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