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Mechanical Properties of Zr–Si–N Films Fabricated through HiPIMS/RFMS Co-Sputtering

Department of Materials Engineering, Ming Chi University of Technology, New Taipei City 24301, Taiwan
Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei City 24301, Taiwan
Institute of Materials Engineering, National Taiwan Ocean University, Keelung 20224, Taiwan
Author to whom correspondence should be addressed.
Coatings 2018, 8(8), 263;
Received: 1 July 2018 / Revised: 21 July 2018 / Accepted: 26 July 2018 / Published: 27 July 2018
(This article belongs to the Special Issue Design and Synthesis of Hard Coatings)
PDF [5681 KB, uploaded 27 July 2018]


Zr–Si–N films were fabricated through the co-deposition of high-power impulse magnetron sputtering (HiPIMS) and radio-frequency magnetron sputtering (RFMS). The mechanical properties of the films fabricated using various nitrogen flow rates and radio-frequency powers were investigated. The HiPIMS/RFMS co-sputtered Zr–Si–N films were under-stoichiometric. These films with Si content of less than 9 at.%, and N content of less than 43 at.% displayed a face-centered cubic structure. The films’ hardness and Young’s modulus exhibited an evident relationship to their compressive residual stresses. The films with 2–6 at.% Si exhibited high hardness of 33–34 GPa and high Young’s moduli of 346–373 GPa, which was accompanied with compressive residual stresses from −4.4 to −5.0 GPa. View Full-Text
Keywords: HiPIMS; mechanical properties; residual stress; RFMS HiPIMS; mechanical properties; residual stress; RFMS

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Chang, L.-C.; Zheng, Y.-Z.; Chen, Y.-I. Mechanical Properties of Zr–Si–N Films Fabricated through HiPIMS/RFMS Co-Sputtering. Coatings 2018, 8, 263.

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