- Article
Feature Comparison and Process Optimization of Multiple Dry Etching Techniques Applied in Inner Spacer Cavity Formation of GAA NSFET
- Meng Wang,
- Xinlong Guo,
- Ziqiang Huang,
- Meicheng Liao,
- Tao Liu and
- Min Xu
The inner spacer module, which profoundly affects the final performance of a device, is a critical component in GAA NSFET (Gate-all-around Nanosheet Field Effect Transistor) manufacturing and necessitates systematic optimization and fundamental innov...

