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46 Results Found

  • Article
  • Open Access
15 Citations
3,661 Views
13 Pages

21 February 2023

With the increasing number of inputs and outputs, and the decreasing interconnection spacing, electrical interconnection failures caused by electromigration (EM) have attracted more and more attention. The electromigration reliability and failure mec...

  • Review
  • Open Access
13 Citations
3,838 Views
31 Pages

11 June 2024

Due to the continuous miniaturization and high current-carrying demands in the field of integrated circuits, as well as the desire to save space and improve computational capabilities, there is a constant drive to reduce the size of integrated circui...

  • Article
  • Open Access
2 Citations
3,532 Views
15 Pages

Analysis of Degradation of Electromigration Reliability of Au-Al and OPM Wire Bonded Contacts at 250 °C Using Resistance Monitoring Method

  • Xueqin Li,
  • Linchun Gao,
  • Tao Ni,
  • Jingnan Zhou,
  • Xiaojing Li,
  • Yifan Li,
  • Lida Xu,
  • Runjian Wang,
  • Chuanbin Zeng and
  • Jing Li
  • + 2 authors

12 March 2023

The ongoing trend towards miniaturization and increased packaging density has exacerbated the reliability problem of Au-Al heterogeneous metal bonding structures in high-temperature environments, where extreme temperatures and high current pose a ser...

  • Review
  • Open Access
644 Views
16 Pages

12 December 2025

Electromigration (EM) presents a major reliability challenge in advanced electronic packaging as device scaling and rising power demands lead to higher current densities in solder joints. While eutectic Sn-58Bi solder is widely adopted as a low-tempe...

  • Article
  • Open Access
4 Citations
2,917 Views
23 Pages

26 July 2024

This paper presents a hybrid modelling approach that combines physics-based electromigration modelling (PEM) and statistical methods to evaluate the electromigration (EM) limits of nano-interconnects in mesh networks. The approach, which is also comp...

  • Feature Paper
  • Review
  • Open Access
22 Citations
7,770 Views
31 Pages

The advance of semiconductor technology not only enables integrated circuits with higher density and better performance but also increases their vulnerability to various aging mechanisms which occur from front-end to back-end. Analysis on the impact...

  • Article
  • Open Access
4 Citations
4,180 Views
18 Pages

Reliability is a fundamental requirement in microprocessors that guarantees correct execution over their lifetimes. The reliability-related design rules depend on the process technology and device operating conditions. To meet reliability requirement...

  • Article
  • Open Access
3 Citations
2,611 Views
15 Pages

New mission-critical applications, such as autonomous vehicles and life-support systems, set a high bar for the reliability of modern microprocessors that operate in highly challenging conditions. However, while cutting-edge integrated circuit (IC) t...

  • Review
  • Open Access
10 Citations
5,185 Views
21 Pages

12 January 2024

With the technological scaling of metal–oxide–semiconductor field-effect transistors (MOSFETs) and the scarcity of circuit design margins, the characteristics of device reliability have garnered widespread attention. Traditional single-mo...

  • Review
  • Open Access
6 Citations
9,166 Views
45 Pages

Electromigration (EM), current-driven atomic diffusion in interconnect metals, critically threatens integrated circuit (IC) reliability via void-induced open circuits and hillock-induced short circuits. This review examines EM’s physical mechan...

  • Article
  • Open Access
7 Citations
3,919 Views
15 Pages

15 June 2023

To meet the demands for miniaturization and multi-functional and high-performance electronics applications, the semiconductor industry has shifted its packaging approach to multi-chip vertical stacking. Among the advanced packaging technologies for h...

  • Communication
  • Open Access
331 Views
14 Pages

17 December 2025

This study systematically investigates the influence of Bi content on the electromigration (EM) lifetime of low-temperature Cu/Sn-xBi-1Ag (600 μm)/Cu interconnects, where x = 57, 47 and 40 wt.%. The intrinsically higher product of diffusivity and...

  • Article
  • Open Access
1 Citations
1,082 Views
19 Pages

Fast Electromigration Analysis via Asymmetric Krylov-Based Model Reduction

  • Pavlos Stoikos,
  • Dimitrios Garyfallou,
  • George Floros,
  • Nestor Evmorfopoulos and
  • George Stamoulis

As semiconductor technologies continue to scale aggressively, electromigration (EM) has become critical in modern VLSI design. Since traditional EM assessment methods fail to accurately capture the complex behavior of multi-segment interconnects, rec...

  • Review
  • Open Access
10 Citations
4,175 Views
16 Pages

Role of Crystallographic Orientation of β-Sn Grain on Electromigration Failures in Lead-Free Solder Joint: An Overview

  • Muhammad Nasir Bashir,
  • Sajid Ullah Butt,
  • Muhammad Adil Mansoor,
  • Niaz Bahadur Khan,
  • Shahid Bashir,
  • Yew Hoong Wong,
  • Turki Alamro,
  • Sayed Mohamed Eldin and
  • Mohammed Jameel

15 November 2022

Due to the miniaturization of electronic devices, electromigration became one of the serious reliability issues in lead-free solder joints. The orientation of the β-Sn grain plays an important role in electromigration failures. Several studies h...

  • Review
  • Open Access
14 Citations
5,492 Views
21 Pages

A Review of Silver Wire Bonding Techniques

  • Bin An,
  • Hongliang Zhou,
  • Jun Cao,
  • Pingmei Ming,
  • John Persic,
  • Jingguang Yao and
  • Andong Chang

20 November 2023

The replacement of gold bonding wire with silver bonding wire can significantly reduce the cost of wire bonding. This paper provides a comprehensive overview of silver wire bonding technology. Firstly, it introduces various types of silver-based bond...

  • Article
  • Open Access
1 Citations
1,537 Views
17 Pages

16 January 2025

In this study, we designed and manufactured an ideal electromigration testing device for soldering joints to solve the reliability problems caused by temperature and current density changes in the electromigration processes of micro solder joints. We...

  • Article
  • Open Access
1,126 Views
12 Pages

8 August 2025

Electromigration (EM) is a critical reliability concern in electronic solder joints due to increasing current densities in modern electronic packaging. EM-induced failures often manifest as void formation and microstructural degradation, particularly...

  • Article
  • Open Access
5 Citations
3,849 Views
8 Pages

16 June 2022

The development of advanced electronic devices leads to highly miniaturized interconnect circuits (ICs), which significantly increases the electromigration (EM) phenomenon of solder and circuits due to higher current density. The electromigration of...

  • Article
  • Open Access
6,695 Views
30 Pages

22 October 2013

The dimensions of microbumps in three-dimensional integration reach microscopic scales and thus necessitate a study of the multiscale microstructures in microbumps. Here, we present simulated mesoscale and atomic-scale microstructures of microbumps u...

  • Review
  • Open Access
39 Citations
11,955 Views
23 Pages

Delamination-and Electromigration-Related Failures in Solar Panels—A Review

  • Abdulwahab A. Q. Hasan,
  • Ammar Ahmed Alkahtani,
  • Seyed Ahmad Shahahmadi,
  • Mohammad Nur E. Alam,
  • Mohammad Aminul Islam and
  • Nowshad Amin

18 June 2021

The reliability of photovoltaic (PV) modules operating under various weather conditions attracts the manufacturer’s concern since several studies reveal a degradation rate higher than 0.8% per year for the silicon-based technology and reached up to 2...

  • Article
  • Open Access
7 Citations
3,355 Views
13 Pages

16 August 2023

Electromigration is one of the most important research issues affecting the reliability of solder joints. Current-induced Joule heating affects the electromigration behavior of solder joints. Solder joints with different cross-sectional areas were de...

  • Article
  • Open Access
12 Citations
2,912 Views
11 Pages

Current-Induced Changes of Surface Morphology in Printed Ag Thin Wires

  • Quan Sun,
  • Yebo Lu,
  • Chengli Tang,
  • Haijun Song,
  • Chao Li and
  • Chuncheng Zuo

10 October 2019

Current-induced changes of surface morphology in printed Ag thin wires were investigated by current stressing tests and numerical simulation. The samples were printed Ag thin wires on a flexible substrate with input and output pads. Different experim...

  • Article
  • Open Access
13 Citations
4,034 Views
17 Pages

Effect of Electromigration and Thermal Ageing on the Tin Whiskers’ Formation in Thin Sn–0.7Cu–0.05Ga Lead (Pb)-Free Solder Joints

  • Noor Zaimah Mohd Mokhtar,
  • Mohd Arif Anuar Mohd Salleh,
  • Andrei Victor Sandu,
  • Muhammad Mahyiddin Ramli,
  • Jitrin Chaiprapa,
  • Petrica Vizureanu and
  • Mohd Izrul Izwan Ramli

4 August 2021

The investigation on tin (Sn) whiskers formation has been widely applied in the field of lead-free electronic packaging. This is due to the fact that use of the Sn–Pb finishes has converted to Pb-free finishes in the electronic industry. Sn whiskers...

  • Article
  • Open Access
5 Citations
3,256 Views
15 Pages

11 April 2022

A transient three-dimensional comprehensive numerical model was established to study ion transport caused by diffusion, convection, and electro-migration in the electro-refining process for scrap-metal recycling. The Poisson–Nernst–Planck...

  • Article
  • Open Access
1 Citations
2,157 Views
14 Pages

18 August 2024

Electromigration (EM) is a critical reliability issue in integrated circuits and is becoming increasingly significant as fabrication technology nodes continue to advance. The analysis of the hydrostatic stress, which is paramount in electromigration...

  • Article
  • Open Access
6 Citations
1,798 Views
15 Pages

16 November 2024

As electronic devices continue to shrink in size and increase in complexity, the current densities in interconnects drastically increase, intensifying the effects of electromigration (EM). This renders the understanding of EM crucial, due to its sign...

  • Article
  • Open Access
577 Views
15 Pages

Investigation of an Accelerated Deterioration Method for Subsea Tunnel RC Linings via Electromigration and Its Associated Test Parameters

  • Jiguo Liu,
  • Qinglong Cui,
  • Shengbin Zhang,
  • Xin Li,
  • Longhai Wei,
  • Huimin Gong,
  • Yiguo Xue and
  • Min Han

17 September 2025

Appropriate accelerated deterioration methods are crucial for studying the deterioration behavior of reinforced concrete linings in subsea tunnels. To investigate the deterioration mechanisms of reinforced concrete (RC) structures in marine environme...

  • Article
  • Open Access
1 Citations
589 Views
19 Pages

Unified Hybrid Censoring Samples from Power Pratibha Distribution and Its Applications

  • Hebatalla H. Mohammad,
  • Khalaf S. Sultan and
  • Mahmoud M. M. Mansour

8 July 2025

This paper suggests an extensive inferential method for the Power Pratibha Distribution (PPD) under Unified Hybrid Censoring Schemes (UHCSs), since there is a growing interest in flexible models in both reliability and service operations. This work s...

  • Feature Paper
  • Article
  • Open Access
3 Citations
2,636 Views
11 Pages

Study on the Solder Joint Reliability of New Diamond Chip Resistors for Power Devices

  • Wenyu Wu,
  • Geng Li,
  • Shang Wang,
  • Yiping Wang,
  • Jiayun Feng,
  • Xiaowei Sun and
  • Yanhong Tian

7 April 2023

New diamond chip resistors have been used in high-power devices widely due to excellent heat dissipation and high-frequency performance. However, systematic research about their solder joint reliability is rare. In this paper, a related study was con...

  • Review
  • Open Access
19 Citations
4,741 Views
20 Pages

21 July 2022

Sn-rich solder joints in three-dimensional integrated circuits and their reliability issues, such as the electromigration (EM), thermomigration (TM), and thermomechanical fatigue (TMF), have drawn attention related to their use in electronic packagin...

  • Article
  • Open Access
294 Views
14 Pages

Study on the IMC Growth Mechanism of Cu/Sn-58Bi/Cu Joint Under Electromigration with Alternating Current

  • Bo Wang,
  • Peiying Zhu,
  • Guopei Zhang,
  • Chunyuan Deng,
  • Kaixuan He,
  • Wei Huang and
  • Kailin Pan

9 February 2026

With the ongoing miniaturization of solder joints in three-dimensional integrated electronic packaging, electromigration reliability has become a pressing concern. This study systematically examines the interfacial intermetallic compound (IMC) growth...

  • Article
  • Open Access
1,021 Views
21 Pages

1 November 2025

Schmitt Triggers are essential building blocks in noise-resilient systems and are useful in managing switching behavior in low-power designs. Yet, as CMOS technologies scale down, their designs become increasingly challenging. This paper presents a c...

  • Review
  • Open Access
6 Citations
2,750 Views
21 Pages

Application of Capillary Electromigration Methods in the Analysis of Textile Dyes—Review

  • Anna Sałdan,
  • Małgorzata Król,
  • Michał Woźniakiewicz and
  • Paweł Kościelniak

26 April 2022

Fiber traces are one of (micro)traces that can be found at a crime scene. They are easily transferable and, like other forms of evidence, can provide a link between a suspect and a victim. The main purpose of this review is to present methods develop...

  • Article
  • Open Access
1 Citations
2,852 Views
20 Pages

5 December 2023

With the increasing power density of electronic devices, solder joints are prone to electromigration under high currents, which results in a significant threat to reliability. In this study, the molecular dynamics method is used to study the diffusio...

  • Review
  • Open Access
34 Citations
9,596 Views
27 Pages

Research Progress of Electroplated Nanotwinned Copper in Microelectronic Packaging

  • Ke-Xin Chen,
  • Li-Yin Gao,
  • Zhe Li,
  • Rong Sun and
  • Zhi-Quan Liu

26 June 2023

Copper is the most common interconnecting material in the field of microelectronic packaging, which is widely used in advanced electronic packaging technologies. However, with the trend of the miniaturization of electronic devices, the dimensions of...

  • Article
  • Open Access
8 Citations
2,276 Views
8 Pages

11 May 2021

The crystallographic characteristic effect of Cu substrate on cathode dissolution behavior in line-type Cu/Sn–3.0Ag–0.5Cu (SAC305)/Cu solder joints during electromigration (EM) was investigated by scanning electron microscope (SEM), electron backscat...

  • Article
  • Open Access
1,058 Views
16 Pages

15 May 2025

High-temperature micro-electro-mechanical systems (MEMSs) are critical for applications in extreme environments and applications where the operating temperature can exceed 1000 °C, but their long-term performance is limited by complex failure mec...

  • Article
  • Open Access
4 Citations
2,571 Views
11 Pages

The Effect of Bi Addition on the Electromigration Properties of Sn-3.0Ag-0.5Cu Lead-Free Solder

  • Huihui Zhang,
  • Zhefeng Xu,
  • Yan Wang,
  • Caili Tian,
  • Changzeng Fan,
  • Satoshi Motozuka and
  • Jinku Yu

8 October 2024

As electronic packaging technology advances towards miniaturization and integration, the issue of electromigration (EM) in lead-free solder joints has become a significant factor affecting solder joint reliability. In this study, a Sn-3.0Ag-0.5Cu (SA...

  • Article
  • Open Access
2 Citations
2,124 Views
12 Pages

13 April 2025

Aluminum–copper alloy (AlCu) is commonly utilized as interconnect material in low-power devices. However, as the size of electronic devices continues to decrease and current density increases, electromigration (EM) has emerged as a significant...

  • Article
  • Open Access
1,078 Views
29 Pages

18 November 2025

Ruggedized computers are the core of modern communication, guidance, control, and data-processing systems, and typically operate under extreme environmental conditions. However, under extreme service conditions such as temperature cycling, vibration,...

  • Article
  • Open Access
4 Citations
2,246 Views
14 Pages

Diffusion Barrier Performance of Ni-W Layer at Sn/Cu Interfacial Reaction

  • Jinye Yao,
  • Chenyu Li,
  • Min Shang,
  • Xiangxu Chen,
  • Yunpeng Wang,
  • Haoran Ma,
  • Haitao Ma and
  • Xiaoying Liu

25 July 2024

As the integration of chips in 3D integrated circuits (ICs) increases and the size of micro-bumps reduces, issues with the reliability of service due to electromigration and thermomigration are becoming more prevalent. In the practical application of...

  • Feature Paper
  • Review
  • Open Access
22 Citations
9,531 Views
16 Pages

Potassium Sodium Niobate-Based Lead-Free Piezoelectric Multilayer Ceramics Co-Fired with Nickel Electrodes

  • Shinichiro Kawada,
  • Hiroyuki Hayashi,
  • Hideki Ishii,
  • Masahiko Kimura,
  • Akira Ando,
  • Suetake Omiya and
  • Noriyuki Kubodera 

3 November 2015

Although lead-free piezoelectric ceramics have been extensively studied, many problems must still be overcome before they are suitable for practical use. One of the main problems is fabricating a multilayer structure, and one solution attracting grow...

  • Article
  • Open Access
9 Citations
3,165 Views
26 Pages

13 February 2023

Sustainability of products that seek to maintain ecosystem balance, such as electric vehicles or solar system inverters, often require extensive testing during their developmental stages in a manner that minimizes wastage and drives creativity. Multi...

  • Article
  • Open Access
591 Views
16 Pages

11 November 2025

Silicon-Based Physical Unclonable Functions (PUFs) exploit inherent manufacturing variations to produce a unique, random, and ideally unclonable secret key. As electronic devices are decommissioned and sent for End of Life (EOL) recycling, the encryp...

  • Article
  • Open Access
2 Citations
5,495 Views
25 Pages

24 June 2020

Due to the rapid increase in current density encountered in new chips, the phenomena of thermomigration and electromigration in the solder bump become a serious reliability issue. Currently, Ni or TiN, as a barrier layer, is widely academically studi...