In this study, thin molybdenum nitride (MoN
x) layers were directly synthesized on molybdenum foil via thermal treatment under an NH
3 atmosphere, and their phase evolution, structural characteristics, and electrochemical performance were investigated. The thickness and morphology of the MoN
x
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In this study, thin molybdenum nitride (MoN
x) layers were directly synthesized on molybdenum foil via thermal treatment under an NH
3 atmosphere, and their phase evolution, structural characteristics, and electrochemical performance were investigated. The thickness and morphology of the MoN
x layers were controlled by varying ammonolysis time and temperature, while subsequent annealing in N
2 converted the nitride layer into MoO
2. Meanwhile, oxidation in air yielded crystalline MoO
3 layers. X-ray diffraction and X-ray photoelectron spectroscopy confirmed progressive oxidation of molybdenum, with Mo 3
d binding energies increasing in the sequence of Mo < MoN
x < MoO
2 < MoO
3, consistent with their nominal oxidation states. Electrochemical characterization revealed that both MoN
x/Mo and MoO
2/Mo electrodes exhibit notable pseudocapacitive behavior in 0.5 M H
2SO
4 electrolyte, with areal specific capacitances reaching up to 520 mF cm
−2 at 10 mV s
−1. Increasing layer thickness led to enhanced capacitance, likely due to an increase in the electrochemically accessible surface area and the extension of ion diffusion pathways. MoO
2-coated samples showed stronger faradaic contribution and superior rate capability compared to MoN
x counterparts, along with a gradual shift from predominantly electric double-layer capacitance toward hybrid pseudocapacitive charge storage mechanisms.
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