Highly (0002)-oriented Al
1−xSc
xN thin films with different Sc doping concentrations (
x = 0, 0.2, 0.25, 0.3, and 0.43) were prepared via a magnetron sputtering system. The effects of Sc doping on the crystal structure and electrical property
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Highly (0002)-oriented Al
1−xSc
xN thin films with different Sc doping concentrations (
x = 0, 0.2, 0.25, 0.3, and 0.43) were prepared via a magnetron sputtering system. The effects of Sc doping on the crystal structure and electrical property of the as-prepared thin films were investigated experimentally. The results of synchrotron radiation grazing-incidence wide-angle X-ray scattering (GIWAXS) and X-ray diffraction (XRD) demonstrated that the Sc
3+ substitution for Al
3+ induced asymmetric lattice distortion: the
a-axis exhibited monotonic expansion (reaching 3.46 Å at
x = 0.43) due to the larger atomic radius of Sc (~0.87 Å), while the
c-axis attained a maximum value of 5.14 Å at
x = 0.2 and subsequently contracted as the bond angle reduction became dominant. The dielectric constant increased to 34.67 (225% enhancement) at
x = 0.43, attributed to the enhanced polarization of Sc-N bonds and interfacial charge accumulation effects. Simultaneously, the dielectric loss increased from 0.15% (
x = 0) to 6.7% (
x = 0.43). Leakage current studies revealed that high Sc doping (
x = 0.43) elevated the leakage current density to 10
−6 A/cm
2 under an electric field of 0.2 MV/cm, accompanied by a transition from Ohmic conduction to space-charge-limited current (SCLC) at a low electric field strength (<0.072 MV/cm).
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