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Application of Advanced Plasma Technology in Coatings, Films and Etching

This special issue belongs to the section “Plasma Coatings, Surfaces & Interfaces“.

Special Issue Information

Dear Colleagues,

Plasma techniques have revolutionized the fields of materials science, enabling coatings, films and etching in a wide range of areas in surface engineering. The advanced plasma techniques have greatly contributed to the field of nanofabrication by allowing the precise control of nano-scale materials. With these plasma-based techniques, it is possible to deposite or etch thin films of various nano-scale materials for applications of nanoelectronics, photovoltaic and biosensors. Spurred primarily by the growing applications ranging from advanced logic devices, flash memory and magnetoresistive random access memory, nano-electromechanical systems, energy devices, etc., new processes, instruments, diagnostic techniques, and deposition and etching mechanisms are required. Accordingly, we are launching this Special Issue of Coatings that will focus on the fundamentals and applications of advanced plasma techniques for coating, films and etching in addressing the covered subjects.

This Special Issue will collect original research articles and review papers that include, but are not limited to, the following areas:

  • Theoretical, modeling and experimental research, knowledge and new ideas in plasma source, pulsed plasma techniques and radiation sources;
  • Atomic layer processing (ALD/ALE);
  • Dry etching technologies with low-pressure and atmospheric plasmas;
  • Plasma deposition of functional coatings and finishings;
  • High-pressure and thermal plasma processing;
  • Surface reaction and damage with plasma;
  • Nanofabrication and nanodevices using plasma-based techniques;
  • Plasma processing for biomaterial, medical, energy and sensor applications;
  • Plasma processing for new material devices (MRAM, power devices, organics, etc.).

Dr. Shih-Nan Hsiao
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 250 words) can be sent to the Editorial Office for assessment.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • advanced plasma process for coatings
  • atomic layer etching and high-aspect ratio contact etching
  • plasma-induced damage
  • plasma diagnostics
  • etching modeling

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Published Papers

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Coatings - ISSN 2079-6412