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Advanced Coating Technology by Physical Vapor Deposition and Applications

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A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".

Deadline for manuscript submissions: 30 April 2024 | Viewed by 7143

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Special Issue Editor

Prof. Dr. Chuen-Lin Tien

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Guest Editor

Department of Electrical Engineering, Feng Chia University, Taichung 40724, Taiwan
Interests: optical design; optical thin film; residual stress; optical interferometry; fiber-optic sensors
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Physical vapor deposition (PVD) is a widely used technique used for the preparation of thin films and surface coatings. PVD has been widely used in industry and combined with different methods to produce film components with excellent performance. Uniform PVD coatings provide hard surfaces that can be applied to a variety of materials and substrates. The PVD process can also be used to form multilayer coatings, composite coatings, oblique coatings, and unique structures. The PVD multilayered film structure is beneficial for improving oxidation resistance, enhancing mechanical properties, reducing internal stress, inhibiting crack propagation, and improving fracture toughness. We sincerely invite you to contribute your original papers to this Special Issue. The topics of interest include (but are not limited to) the following topics:

Thin film coating techniques;
Characterization of thin films for micro-components;
Advanced sputtering coatings;
-Multilayer thin film preparation and applications;
Novel PVD coating techniques;
Optical interference coatings;
Mechanical stress in thin films and coatings;
Simulation and modeling in PVD processes.

Prof. Dr. Chuen-Lin Tien
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

physical vapor deposition
coating technology
thin film
multilayer coatings
optical interference coatings
sputtering
evaporation

Published Papers (4 papers)

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Editorial

Jump to: Research

5 pages, 214 KiB

Open AccessEditorial

Special Issue “Advanced Coating Technology by Physical Vapor Deposition and Applications”

by Chuen-Lin Tien

Coatings 2023, 13(2), 467; https://doi.org/10.3390/coatings13020467 - 18 Feb 2023

Cited by 2 | Viewed by 2242

Abstract

Coating technology covers a wide range of fields [...] Full article

(This article belongs to the Special Issue Advanced Coating Technology by Physical Vapor Deposition and Applications)

Research

Jump to: Editorial

14 pages, 3669 KiB

Open AccessFeature PaperArticle

Optical Interference Filters Combined with Thin Film Residual Stress Compensation for Image Contrast Enhancement

by Chuen-Lin Tien, Shu-Hui Su, Ching-Ying Cheng, Yuan-Ming Chang and Dong-Han Mo

Coatings 2023, 13(5), 857; https://doi.org/10.3390/coatings13050857 - 30 Apr 2023

Cited by 1 | Viewed by 1274

Abstract

We propose two single-wavelength notch filters and one dual-wavelength (480 and 620 nm) notch filter to enhance image contrast. The stack structure of the notch filters was designed as (Ta₂O₅/SiO₂)⁴Ta₂O₅ in Essential Macleod thin film simulation software. Dual-electron-beam evaporation with ion beam-assisted deposition was used to prepare optical interference filters with different center wavelengths. A multilayer notch filter with a center wavelength of 620 nm was deposited on the front surface of the glass, and then a notch filter with a center wavelength of 480 nm was coated on the rear surface of the same glass. The proposed dual-wavelength (480 and 620 nm) notch filter is a combination of two single-wavelength notch filters coated on a double-sided glass substrate to compensate for residual stress. The transmittance, residual stress, and surface roughness of the proposed notch filter were evaluated using different measuring instruments. The experimental results show that the residual stress of the dual-wavelength notch filter could be reduced to 10.8 MPa by using a double-sided coating technique. The root-mean-square (RMS) surface roughness of the notch filters was measured by using a Linnik microscopic interferometer. The RMS surface roughness was 1.80 for the 620 nm notch filter and 2.09 for the 480 nm notch filter. The image contrast obtained with the three different notch filters was measured using an optical microscope and a CMOS camera. The contrast value could be increased from 0.328 (without a filter) to 0.696 (dual-wavelength notch filter). Full article

(This article belongs to the Special Issue Advanced Coating Technology by Physical Vapor Deposition and Applications)

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16 pages, 5290 KiB

Open AccessArticle

Effect of Gradient Multilayer Design on Tribological Performance of TiN/TiSiN Coatings Prepared by Cathodic Arc Ion Plating

by Rong Tu, Jiao Jiao, Mingquan Jiang, Mai Yang, Baifeng Ji, Tenghua Gao, Qizhong Li, Song Zhang and Lianmeng Zhang

Coatings 2023, 13(5), 836; https://doi.org/10.3390/coatings13050836 - 26 Apr 2023

Viewed by 1598

Abstract

Hard coatings, such as transition metal nitrides, have been widely applied to improve the mechanical properties and tribological performance of cutting tools. The coatings in various multilayered or gradient structures have been designed to meet the demands of more severe service environments and more precise processing requirements. In this work, TiN/TiSiN coatings in several gradient and multilayered structures were deposited on cemented carbides by cathodic arc ion plating using Ti and TiSi alloy targets. The modulation period (Λ) of the multilayer gradually varies with thickness, ranging from 6 to 46 nm. The gradient multilayer coatings consist of a nanocrystalline-amorphous composite with compact growth. The coating with a modulation period first increasing and then decreasing has the highest hardness of 38 GPa, and the maximum residual compressive stress of −2.71 GPa, as well as the minimum coefficient of friction (COF) and wear rate. Gradient and multilayer structures moderate the brittleness caused by the presence of amorphous SiNx phase and optimize the mechanical properties and tribological performances of the coatings. Full article

(This article belongs to the Special Issue Advanced Coating Technology by Physical Vapor Deposition and Applications)

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Graphical abstract

9 pages, 4431 KiB

Open AccessArticle

Direct Current Reactive Sputtering Deposition and Plasma Annealing of an Epitaxial TiHfN Film on Si (001)

by Ping-Hsun Wu, Kun-An Chiu, Fu-Han Shih, Yu-Siang Fang, Thi-Hien Do, Wei-Chun Chen and Li Chang

Coatings 2023, 13(1), 183; https://doi.org/10.3390/coatings13010183 - 14 Jan 2023

Cited by 1 | Viewed by 1367

Abstract

Deposition of a heteroepitaxial TiHfN film with a growth rate of about 1 μm/h was successfully achieved on a Si (001) substrate at a temperature above 700 °C by direct current magnetron reactive sputtering of a Ti_0.6Hf_0.4 (in atomic fraction) target with an Ar/N₂ gas mixture. Annealing of the as-deposited TiHfN/Si sample at a temperature above 1000 °C using microwave plasma with H₂/N₂ gas was performed to further improve the TiHfN film’s quality. X-ray diffraction results show that the heteroepitaxial TiHfN film on Si exhibits a cube-on-cube relationship as {001}_TiHfN//{001}_Si and <110>_TiHfN//<110>_Si. X-ray rocking curve measurements show that the full width at half maximum of (200)_TiHfN is 1.36° for the as-deposited TiHfN film, while it is significantly reduced to 0.53° after microwave plasma annealing. The surface morphologies of the as-deposited and annealed TiHfN films are smooth, with a surface roughness of around ~2 nm. Cross-sectional scanning/transmission electron microscopy (S/TEM) shows a reduction in defects in the annealed film, and X-ray photoelectron spectroscopy shows that the film composition remains unchanged. Additionally, S/TEM examinations with atomic resolution illustrate domain matching epitaxy (DME) between TiHfN and Si at the interface. The TiHfN films have good electrical conducting properties with resistivities of 40–45 μΩ·cm. Full article

(This article belongs to the Special Issue Advanced Coating Technology by Physical Vapor Deposition and Applications)

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