Monolayer MoS
2 can be used for various applications such as flexible optoelectronics and electronics due to its exceptional optical and electronic properties. For these applications, large-area synthesis of high-quality monolayer MoS
2 is highly desirable. However, the conventional chemical vapor deposition (CVD)
[...] Read more.
Monolayer MoS
2 can be used for various applications such as flexible optoelectronics and electronics due to its exceptional optical and electronic properties. For these applications, large-area synthesis of high-quality monolayer MoS
2 is highly desirable. However, the conventional chemical vapor deposition (CVD) method using MoO
3 and S powder has shown limitations in synthesizing high-quality monolayer MoS
2 over a large area on a substrate. In this study, we present a novel carbon cloth-assisted CVD method for large-area uniform synthesis of high-quality monolayer MoS
2. While the conventional CVD method produces thick MoS
2 films in the center of the substrate and forms MoS
2 monolayers at the edge of the thick MoS
2 films, our carbon cloth-assisted CVD method uniformly grows high-quality monolayer MoS
2 in the center of the substrate. The as-synthesized monolayer MoS
2 was characterized in detail by Raman/photoluminescence spectroscopy, atomic force microscopy, and transmission electron microscopy. We reveal the growth process of monolayer MoS
2 initiated from MoS
2 seeds by synthesizing monolayer MoS
2 with varying reaction times. In addition, we show that the CVD method employing carbon powder also produces uniform monolayer MoS
2 without forming thick MoS
2 films in the center of the substrate. This confirms that the large-area growth of monolayer MoS
2 using the carbon cloth-assisted CVD method is mainly due to reducing properties of the carbon material, rather than the effect of covering the carbon cloth. Furthermore, we demonstrate that our carbon cloth-assisted CVD method is generally applicable to large-area uniform synthesis of other monolayer transition metal dichalcogenides, including monolayer WS
2.
Full article