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Nanomaterials
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Plasma Based Nanomaterials and Their Applications
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Plasma Based Nanomaterials and Their Applications

A special issue of Nanomaterials (ISSN 2079-4991). This special issue belongs to the section "Biology and Medicines".

Deadline for manuscript submissions: closed (31 October 2021) | Viewed by 22854

Special Issue Editor

Prof. Dr. Gheorghe Dinescu

E-Mail Website1 Website2
Guest Editor
National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Street, Magurele, Ilfov country, Romania
Interests: plasma sources; electrical discharges; plasma processing; atmospheric pressure cold plasmas; plasma with liquids; synthesis; characterization and utilization of nanomaterials; composite materials; hybrid materials; thin films and multilayers; surface modification; nanomembranes; plasma decontamination

Special Issue Information

Dear Colleagues,

Processing materials at nanoscale requires tiny entities as atoms, molecules, electrons, ions, and photons, and plasma is a way to produce and control them. Accordingly, a large number of plasma-based procedures, techniques, and instruments have been developed, where plasma imparts reactivity, directionality, charging to species performing the processing. Plasma processing, traditionally performed in vacuum and gas phase, was extended successfully in recent decades to atmospheric pressure and liquid phase.

The goal of this issue is to explore the interrelation between plasma and materials across the atomic scale (plasma species, atoms, and molecules), nanoscale (individual nano-objects like nanoparticles, nanotubes, nanowires, nanosheets, nanocrystals, etc.), microscale (assembled nanostructures in thin films, layers, composites, hybrid nanomaterials), and macroscale (nanomaterial-based devices such as sensors, micro-actuators, electronic chips, micro-supercapacitors, membranes, etc.). A few examples of the envisaged topics are:

 - Plasma processes, systems and methods for nanomaterial fabrication and processing;
- Carbon nanostructure fabrication (graphene, carbon nanowalls, nanotubes, fullerene, diamond nanocrystals, nanoparticles, etc.) by plasma and its applications;
- Gas phase preparation of nanoparticles by plasma (PECVD and PVD methods, including laser ablation);
- Magnetron sputtering gas aggregation (MSGA) processes for cluster and particle fabrication;
 - Hybrid nanomaterials and nanocomposites by plasma and laser processing and their applications;
- Surface nanostructuration by plasma;
- Preparation and processing of nanomaterials by plasma in liquid;
- Fabrication and processing of nanomaterials and nanostructured materials by atmospheric pressure cold and thermal plasmas; 
- Devices and applications of plasma fabricated nanomaterials in engineering, energy, catalysis and photocatalysis, sensing, biology, medicine, and the environment.

We await your contribution in the topics above or other relevant topics with great interest.

Prof. Dr. Gheorghe Dinescu
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Nanomaterials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2900 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • Plasma synthesis of nanomaterials
  • Plasma in liquid
  • Cold atmospheric plasma
  • Magnetron sputtering gas aggregation
  • Pulsed laser ablation
  • Plasma deposition
  • Surface plasma modification
  • Nano structuration
  • Nanoparticles
  • Carbon nanomaterials
  • Nanomembranes
  • Supercapacitors
  • Sensors
  • Antimicrobial coatings

Published Papers (5 papers)

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Research

14 pages, 3512 KiB  
Article
Acetaldehyde Adsorption Characteristics of Ag/ACF Composite Prepared by Liquid Phase Plasma Method
by Byung-Joo Kim, Kay-Hyeok An, Wang-Geun Shim, Young-Kwon Park, Jaegu Park, Heon Lee and Sang-Chul Jung
Nanomaterials 2021, 11(9), 2344; https://doi.org/10.3390/nano11092344 - 9 Sep 2021
Cited by 1 | Viewed by 1904
Abstract
Ag particles were precipitated on an activated carbon fiber (ACF) surface using a liquid phase plasma (LPP) method to prepare a Ag/ACF composite. The efficiency was examined by applying it as an adsorbent in the acetaldehyde adsorption experiment. Field-emission scanning electron microscopy and [...] Read more.
Ag particles were precipitated on an activated carbon fiber (ACF) surface using a liquid phase plasma (LPP) method to prepare a Ag/ACF composite. The efficiency was examined by applying it as an adsorbent in the acetaldehyde adsorption experiment. Field-emission scanning electron microscopy and energy-dispersive X-ray spectrometry confirmed that Ag particles were distributed uniformly on an ACF surface. X-ray diffraction and X-ray photoelectron spectroscopy confirmed that metallic silver (Ag0) and silver oxide (Ag2O) precipitated simultaneously on the ACF surface. Although the precipitated Ag particles blocked the pores of the ACF, the specific surface area of the Ag/ACF composite material decreased, but the adsorption capacity of acetaldehyde was improved. The AA adsorption of ACF and Ag/ACF composites performed in this study was suitable for the Dose–Response model. Full article
(This article belongs to the Special Issue Plasma Based Nanomaterials and Their Applications)
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21 pages, 9779 KiB  
Article
Preparation of Metal Nitride Particles Using Arc Discharge in Liquid Nitrogen
by Yoon Sik Park, Satoshi Kodama and Hidetoshi Sekiguchi
Nanomaterials 2021, 11(9), 2214; https://doi.org/10.3390/nano11092214 - 28 Aug 2021
Cited by 9 | Viewed by 3243
Abstract
A simple process to synthesize metal nitride particles was proposed using submerged arc discharge plasma in liquid nitrogen. Gibbs standard free energy was considered for the selection of the nitride-forming materials. In this study, titanium (Ti) and aluminum (Al) electrodes were used as [...] Read more.
A simple process to synthesize metal nitride particles was proposed using submerged arc discharge plasma in liquid nitrogen. Gibbs standard free energy was considered for the selection of the nitride-forming materials. In this study, titanium (Ti) and aluminum (Al) electrodes were used as raw materials for nitride particle preparation. Liquid nitrogen acted as a dielectric medium as well as a nitridation source in this process. A copper electrode was also used as a non-reactive material for comparison with the reactive Ti and Al electrodes. As the operating conditions of the experiments, the arc discharge current was varied from 5 A (low-power mode) to 30 A (high-power mode). The formation of titanium nitride (TiN) and aluminum nitride (AlN) was confirmed in the particles prepared in all experimental conditions by X-ray powder diffraction (XRD). The observation using a field emission scanning electron microscope (FE-SEM) and a field emission transmission electron microscope (FE-TEM) indicated that the synthesized TiN particles showed a cubic morphology, whereas AlN particles containing unreacted Al showed a spherical morphology. The experiments using different metal electrode configurations showed that the anode generated most of the particles in this process. Based on the obtained results, a particle formation mechanism was proposed. Full article
(This article belongs to the Special Issue Plasma Based Nanomaterials and Their Applications)
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19 pages, 13452 KiB  
Article
Hybrid Nanostructures Obtained by Transport and Condensation of Tungsten Oxide Vapours onto CNW Templates
by Lavinia Gabriela Carpen, Tomy Acsente, Veronica Sătulu, Elena Matei, Sorin Vizireanu, Bogdan Ionuț Biță and Gheorghe Dinescu
Nanomaterials 2021, 11(4), 835; https://doi.org/10.3390/nano11040835 - 24 Mar 2021
Cited by 7 | Viewed by 2512
Abstract
We present hybrid nanomaterial architectures, consisting of carbon nanowalls (CNW) templates decorated with tungsten oxide nanoparticles, synthesized using a mechanism based on tungsten oxide sublimation, vapor transport, followed by vapor condensation, in the absence or presence of plasma. The key steps in the [...] Read more.
We present hybrid nanomaterial architectures, consisting of carbon nanowalls (CNW) templates decorated with tungsten oxide nanoparticles, synthesized using a mechanism based on tungsten oxide sublimation, vapor transport, followed by vapor condensation, in the absence or presence of plasma. The key steps in the decoration mechanism are the sublimation of tungsten oxides, when are exposed in vacuum at high temperature (800 °C), and their redeposition on colder surfaces (400–600 °C). The morphology and chemical composition of the hybrid architectures, as obtained from Scanning Electron Microscopy and X-ray Photoelectron Spectroscopy, are discussed with respect to substrate nature and the physical conditions of synthesis. We pointed out that the decoration process is strongly dependent on the temperature of the CNW templates and plasma presence. Thus, the decoration process performed with plasma was effective for a wider range of template temperatures, in contrast with the decoration process performed without plasma. The results are useful for applications using the sensing and photochemical properties of tungsten oxides, and have also relevance for fusion technology, tungsten walls erosion and material redeposition being widely observed in fusion machines. Full article
(This article belongs to the Special Issue Plasma Based Nanomaterials and Their Applications)
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17 pages, 4119 KiB  
Article
Plant Extracts Activated by Cold Atmospheric Pressure Plasmas as Suitable Tools for Synthesis of Gold Nanostructures with Catalytic Uses
by Anna Dzimitrowicz, Piotr Cyganowski, Pawel Pohl, Weronika Milkowska, Dorota Jermakowicz-Bartkowiak and Piotr Jamroz
Nanomaterials 2020, 10(6), 1088; https://doi.org/10.3390/nano10061088 - 1 Jun 2020
Cited by 7 | Viewed by 3145
Abstract
Because cold atmospheric pressure plasma (CAPP)-based technologies are very useful tools in nanomaterials synthesis, in this work we have connected two unique in their classes approaches—a CAPP-based protocol and a green synthesis method in order to obtain stable-in-time gold nanoparticles (AuNPs). To do [...] Read more.
Because cold atmospheric pressure plasma (CAPP)-based technologies are very useful tools in nanomaterials synthesis, in this work we have connected two unique in their classes approaches—a CAPP-based protocol and a green synthesis method in order to obtain stable-in-time gold nanoparticles (AuNPs). To do so, we have used an aqueous Gingko biloba leave extract and an aqueous Panax ginseng root extract (untreated or treated by CAPP) to produce AuNPs, suitable for catalytical uses. Firstly, we have adjusted the optical properties of resulted AuNPs, applying UV/Vis absorption spectrophotometry (UV/Vis). To reveal the morphology of Au nanostructures, transmission electron microscopy (TEM) in addition to energy dispersive X-ray scattering (EDX) and selected area X-ray diffraction (SAED) was utilized. Moreover, optical emission spectrometry (OES) in addition to a colorimetric method was used to identify and determine the concentration of selected RONS occurring at the liquid-CAPP interface. Additionally, attenuated total reflectance Fourier transform-infrared spectroscopy (ATR FT-IR) was applied to reveal the active compounds, which might be responsible for the AuNPs surface functionalization and stabilization. Within the performed research it was found that the smallest in size AuNPs were synthesized using the aqueous P. ginseng root extract, which was activated by direct current atmospheric pressure glow discharge (dc-APGD), generated in contact with a flowing liquid cathode (FLC). On the contrary, taking into account the aqueous G. biloba leave extract, the smallest in size AuNPs were synthesized when the untreated by CAPP aqueous G. biloba leave extract was involved in the Au nanostructures synthesis. For catalytical studies we have chosen AuNPs produced using the aqueous P. ginseng root extract activated by FLC-dc-APGD as well as AuNPs synthesized using the aqueous G. biloba leave extract also activated by FLC-dc-APGD. Those NPs were successfully used as homogenous catalysts for the reduction of 4-nitrophenol (4-NP) to 4-aminophenol (4-AP). Full article
(This article belongs to the Special Issue Plasma Based Nanomaterials and Their Applications)
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11 pages, 3331 KiB  
Article
Study of Silicon Nitride Inner Spacer Formation in Process of Gate-all-around Nano-Transistors
by Junjie Li, Yongliang Li, Na Zhou, Wenjuan Xiong, Guilei Wang, Qingzhu Zhang, Anyan Du, Jianfeng Gao, Zhenzhen Kong, Hongxiao Lin, Jinjuan Xiang, Chen Li, Xiaogen Yin, Xiaolei Wang, Hong Yang, Xueli Ma, Jianghao Han, Jing Zhang, Tairan Hu, Zhe Cao, Tao Yang, Junfeng Li, Huaxiang Yin, Huilong Zhu, Jun Luo, Wenwu Wang and Henry H. Radamsonadd Show full author list remove Hide full author list
Nanomaterials 2020, 10(4), 793; https://doi.org/10.3390/nano10040793 - 20 Apr 2020
Cited by 23 | Viewed by 11194
Abstract
Stacked SiGe/Si structures are widely used as the units for gate-all-around nanowire transistors (GAA NWTs) which are a promising candidate beyond fin field effective transistors (FinFETs) technologies in near future. These structures deal with a several challenges brought by the shrinking of device [...] Read more.
Stacked SiGe/Si structures are widely used as the units for gate-all-around nanowire transistors (GAA NWTs) which are a promising candidate beyond fin field effective transistors (FinFETs) technologies in near future. These structures deal with a several challenges brought by the shrinking of device dimensions. The preparation of inner spacers is one of the most critical processes for GAA nano-scale transistors. This study focuses on two key processes: inner spacer film conformal deposition and accurate etching. The results show that low pressure chemical vapor deposition (LPCVD) silicon nitride has a good film filling effect; a precise and controllable silicon nitride inner spacer structure is prepared by using an inductively coupled plasma (ICP) tool and a new gas mixtures of CH2F2/CH4/O2/Ar. Silicon nitride inner spacer etch has a high etch selectivity ratio, exceeding 100:1 to Si and more than 30:1 to SiO2. High anisotropy with an excellent vertical/lateral etch ratio exceeding 80:1 is successfully demonstrated. It also provides a solution to the key process challenges of nano-transistors beyond 5 nm node. Full article
(This article belongs to the Special Issue Plasma Based Nanomaterials and Their Applications)
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