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33 Results Found

  • Article
  • Open Access
18 Citations
3,313 Views
14 Pages

Enhancement of Room-Temperature Low-Field Magnetoresistance in Nanostructured Lanthanum Manganite Films for Magnetic Sensor Applications

  • Nerija Zurauskiene,
  • Voitech Stankevic,
  • Skirmantas Kersulis,
  • Milita Vagner,
  • Valentina Plausinaitiene,
  • Jorunas Dobilas,
  • Remigijus Vasiliauskas,
  • Martynas Skapas,
  • Mykola Koliada and
  • Andrzej Wisniewski
  • + 1 author

25 May 2022

The results of colossal magnetoresistance (CMR) properties of La1-xSrxMnyO3 (LSMO) films grown by the pulsed injection MOCVD technique onto an Al2O3 substrate are presented. The grown films with different Sr (0.05 ≤ x ≤ 0.3) and Mn excess (y &g...

  • Article
  • Open Access
8 Citations
4,193 Views
15 Pages

Measurement System for Short-Pulsed Magnetic Fields

  • Voitech Stankevič,
  • Skirmantas Keršulis,
  • Justas Dilys,
  • Vytautas Bleizgys,
  • Mindaugas Viliūnas,
  • Vilius Vertelis,
  • Andrius Maneikis,
  • Vakaris Rudokas,
  • Valentina Plaušinaitienė and
  • Nerija Žurauskienė

28 January 2023

A measurement system based on the colossal magnetoresistance CMR-B-scalar sensor was developed for the measurement of short-duration high-amplitude magnetic fields. The system consists of a magnetic field sensor made from thin nanostructured manganit...

  • Article
  • Open Access
2 Citations
2,273 Views
16 Pages

6 June 2023

The results of magnetoresistance (MR) and resistance relaxation of nanostructured La1−xSrxMnyO3 (LSMO) films with different film thicknesses (60–480 nm) grown on Si/SiO2 substrate by the pulsed-injection MOCVD technique are presented and...

  • Article
  • Open Access
9 Citations
2,699 Views
16 Pages

Nanostructured Manganite Films Grown by Pulsed Injection MOCVD: Tuning Low- and High-Field Magnetoresistive Properties for Sensors Applications

  • Voitech Stankevic,
  • Nerija Zurauskiene,
  • Skirmantas Kersulis,
  • Valentina Plausinaitiene,
  • Rasuole Lukose,
  • Jonas Klimantavicius,
  • Sonata Tolvaišienė,
  • Martynas Skapas,
  • Algirdas Selskis and
  • Saulius Balevicius

13 January 2022

The results of colossal magnetoresistance (CMR) properties of La0.83Sr0.17Mn1.21O3 (LSMO) films grown by pulsed injection MOCVD technique onto various substrates are presented. The films with thicknesses of 360 nm and 60 nm grown on AT-cut single cry...

  • Review
  • Open Access
540 Views
32 Pages

MOCVD Growth of Next-Generation III–V Semiconductor Devices: In Review

  • Zoya Noor,
  • Muhammad Usman,
  • Shazma Ali,
  • Anis Naveed,
  • Amina Hafeez and
  • Ahmed Ali

Metal–organic chemical vapor deposition (MOCVD) is a crystal growth technique used to achieve high-purity thin films, especially III–V materials, for fabricating semiconductor devices. It allows for thickness tunability, controlled doping...

  • Review
  • Open Access
6 Citations
4,202 Views
12 Pages

24 February 2023

This paper reviews some of the basic issues in homoepitaxial growth of III-nitrides to enable a vertical device technology. It focuses on the use of metal organic chemical vapor deposition (MOCVD) to grow GaN and explores the effects of the native su...

  • Article
  • Open Access
10 Citations
3,953 Views
20 Pages

1 March 2023

Scandium complexes with β-diketonate ligands are valuable precursors for the metal–organic chemical vapor deposition (MOCVD) of scandia based materials, but data on their volatilization thermodynamics crucial to MOCVD technology are in a h...

  • Article
  • Open Access
13 Citations
4,718 Views
9 Pages

24 February 2020

The progress of nitride technology is widely limited and hindered by the lack of high-quality gallium nitride (GaN) wafers. Therefore, a large number of GaN epitaxial devices are grown on heterogeneous substrates. Although various additional treatmen...

  • Article
  • Open Access
14 Citations
9,893 Views
16 Pages

MOCVD Growth of InGaAs/GaAs/AlGaAs Laser Structures with Quantum Wells on Ge/Si Substrates

  • Nikolay Baidus,
  • Vladimir Aleshkin,
  • Alexander Dubinov,
  • Konstantin Kudryavtsev,
  • Sergei Nekorkin,
  • Alexey Novikov,
  • Dmiriy Pavlov,
  • Artem Rykov,
  • Artem Sushkov and
  • Zakhariy Krasilnik
  • + 3 authors

31 July 2018

The paper presents the results of the application of MOCVD growth technique for formation of the GaAs/AlAs laser structures with InGaAs quantum wells on Si substrates with a relaxed Ge buffer. The fabricated laser diodes were of micro-striped type de...

  • Review
  • Open Access
20 Citations
8,707 Views
17 Pages

Research Progress and Development Prospects of Enhanced GaN HEMTs

  • Lili Han,
  • Xiansheng Tang,
  • Zhaowei Wang,
  • Weihua Gong,
  • Ruizhan Zhai,
  • Zhongqing Jia and
  • Wei Zhang

4 June 2023

With the development of energy efficiency technologies such as 5G communication and electric vehicles, Si-based GaN microelectronics has entered a stage of rapid industrialization. As a new generation of microwave and millimeter wave devices, High El...

  • Article
  • Open Access
18 Citations
5,554 Views
8 Pages

Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition

  • Heli Seppänen,
  • Iurii Kim,
  • Jarkko Etula,
  • Evgeniy Ubyivovk,
  • Alexei Bouravleuv and
  • Harri Lipsanen

28 January 2019

Aluminum nitride (AlN) films have been grown using novel technological approaches based on plasma-enhanced atomic layer deposition (PEALD) and in situ atomic layer annealing (ALA). The growth of AlN layers was carried out on Si<100> and Si<1...

  • Article
  • Open Access
11 Citations
4,009 Views
8 Pages

Quality-Improved GaN Epitaxial Layers Grown on Striped Patterned Sapphire Substrates Ablated by Femtosecond Laser

  • Yichao Xu,
  • Jun Zou,
  • Xiaoyan Lin,
  • Wenjuan Wu,
  • Wenbo Li,
  • Bobo Yang and
  • Mingming Shi

8 October 2018

In this work, we propose a new approach to create striped patterned sapphire substrate (PSS) under the circumstance that grooved patterned sapphire substrate technology exhibits more potential to reduce dislocation density in GaN (gallium nitride) ep...

  • Review
  • Open Access
23 Citations
9,733 Views
25 Pages

Recent Progress of Electrically Pumped AlGaN Diode Lasers in the UV-B and -C Bands

  • Syed M. N. Hasan,
  • Weicheng You,
  • Md Saiful Islam Sumon and
  • Shamsul Arafin

The development of electrically pumped semiconductor diode lasers emitting at the ultraviolet (UV)-B and -C spectral bands has been an active area of research over the past several years, motivated by a wide range of emerging applications. III-Nitrid...

  • Article
  • Open Access
6 Citations
2,306 Views
13 Pages

In the present energetic scenario, the development of materials with high potentiality in the technological fields of energy conversion processes, production and storage of hydrogen, are of great interest in the scientific community. In particular, w...

  • Article
  • Open Access
2,056 Views
11 Pages

Highly Tunable MOCVD Process of Vanadium Dioxide Thin Films: Relationship between Structural/Morphological Features and Electrodynamic Properties

  • Anna Lucia Pellegrino,
  • Francesca Lo Presti,
  • Gian Paolo Papari,
  • Can Koral,
  • Antonello Andreone and
  • Graziella Malandrino

19 August 2023

The monoclinic structures of vanadium dioxide are widely studied as appealing systems due to a plethora of functional properties in several technological fields. In particular, the possibility to obtain the VO2 material in the form of thin film with...

  • Article
  • Open Access
18 Citations
5,391 Views
13 Pages

MOCVD Grown HgCdTe Heterostructures for Medium Wave Infrared Detectors

  • Waldemar Gawron,
  • Jan Sobieski,
  • Tetiana Manyk,
  • Małgorzata Kopytko,
  • Paweł Madejczyk and
  • Jarosław Rutkowski

This paper presents the current status of medium-wave infrared (MWIR) detectors at the Military University of Technology’s Institute of Applied Physics and VIGO System S.A. The metal–organic chemical vapor deposition (MOCVD) technique is a very conve...

  • Review
  • Open Access
49 Citations
13,998 Views
26 Pages

Review of GaN Thin Film and Nanorod Growth Using Magnetron Sputter Epitaxy

  • Aditya Prabaswara,
  • Jens Birch,
  • Muhammad Junaid,
  • Elena Alexandra Serban,
  • Lars Hultman and
  • Ching-Lien Hsiao

27 April 2020

Magnetron sputter epitaxy (MSE) offers several advantages compared to alternative GaN epitaxy growth methods, including mature sputtering technology, the possibility for very large area deposition, and low-temperature growth of high-quality electroni...

  • Article
  • Open Access
6 Citations
3,021 Views
13 Pages

Monitoring the Vital Activity of Microalgae Cells Using a Fiber-Optical Refractometer

  • Dmitriy P. Sudas,
  • Petr I. Kuznetsov,
  • Evgeny A. Savelyev and
  • Konstantin M. Golant

24 December 2022

Using the technology of metalorganic chemical vapor deposition (MOCVD), fully fiber refractometers based on the lossy mode resonance (LMR) were obtained and investigated. The sensors are made on the basis of a section of optical fiber etched to the c...

  • Review
  • Open Access
33 Citations
9,732 Views
21 Pages

29 March 2023

In this paper, we will discuss the rapid progress of third-generation semiconductors with wide bandgap, with a special focus on the gallium nitride (GaN) on silicon (Si). This architecture has high mass-production potential due to its low cost, large...

  • Feature Paper
  • Article
  • Open Access
13 Citations
3,776 Views
12 Pages

Structural and Electrical Characterization of 2” Ammonothermal Free-Standing GaN Wafers. Progress toward Pilot Production

  • Daryl Key,
  • Edward Letts,
  • Chuan-Wei Tsou,
  • Mi-Hee Ji,
  • Marzieh Bakhtiary-Noodeh,
  • Theeradetch Detchprohm,
  • Shyh-Chiang Shen,
  • Russell Dupuis and
  • Tadao Hashimoto

14 June 2019

Free-standing gallium nitride (GaN) substrates are in high demand for power devices, laser diodes, and high-power light emitting diodes (LEDs). SixPoint Materials Inc. has begun producing 2” GaN substrates through our proprietary Near Equilibri...

  • Article
  • Open Access
5 Citations
2,144 Views
10 Pages

On Decorating a Honeycomb AlN Monolayer with Hydrogen and Fluorine Atoms: Ab Initio and Experimental Aspects

  • Edward Ferraz de Almeida,
  • Anelia Kakanakova-Georgieva and
  • Gueorgui Kostov Gueorguiev

27 January 2024

Mono- and few-layer hexagonal AlN (h-AlN) has emerged as an alternative “beyond graphene” and “beyond h-BN” 2D material, especially in the context of its verification in ultra-high vacuum Scanning Tunneling Microscopy and Mole...

  • Article
  • Open Access
11 Citations
4,122 Views
13 Pages

A Low Temperature Growth of Cu2O Thin Films as Hole Transporting Material for Perovskite Solar Cells

  • Anna L. Pellegrino,
  • Francesca Lo Presti,
  • Emanuele Smecca,
  • Salvatore Valastro,
  • Giuseppe Greco,
  • Salvatore Di Franco,
  • Fabrizio Roccaforte,
  • Alessandra Alberti and
  • Graziella Malandrino

4 November 2022

Copper oxide thin films have been successfully synthesized through a metal–organic chemical vapor deposition (MOCVD) approach starting from the copper bis(2,2,6,6-tetramethyl-3,5-heptanedionate), Cu(tmhd)2, complex. Operative conditions of fabr...

  • Article
  • Open Access
7 Citations
2,937 Views
11 Pages

Optimization of Layer Transfer and Photolithography for Device Integration of 2D-TMDC

  • Amir Ghiami,
  • Tianyishan Sun,
  • Hleb Fiadziushkin,
  • Songyao Tang,
  • Annika Grundmann,
  • Michael Heuken,
  • Holger Kalisch and
  • Andrei Vescan

10 October 2023

Extensive research into two-dimensional transition metal dichalcogenides (2D-TMDCs) over the past decade has paved the way for the development of (opto)electronic devices with enhanced performance and novel capabilities. To realize devices based on 2...

  • Article
  • Open Access
1 Citations
2,121 Views
15 Pages

Impact of the Interruption Duration on Photoluminescence Properties of MOCVD-Grown GaAsP/InAlGaAs Quantum Well Structures

  • Bin Wang,
  • Yugang Zeng,
  • Xuezhe Yu,
  • Weijie Gao,
  • Wei Chen,
  • Haoyu Shen,
  • Li Qin,
  • Yongqiang Ning and
  • Lijun Wang

10 September 2024

The growth interruption technology is introduced to the growth of GaAsP/InAlGaAs quantum well (QW) structure using metal–organic chemical vapor deposition (MOCVD). The effect of growth interruption time (GIT) on the crystalline quality and opti...

  • Article
  • Open Access
3 Citations
2,581 Views
17 Pages

MOCVD Grown InGaAs/InAlAs Quantum Cascade Lasers Emitting at 7.7 μm

  • Maciej Bugajski,
  • Andrzej Kolek,
  • Grzegorz Hałdaś,
  • Włodzimierz Strupiński,
  • Iwona Pasternak,
  • Walery Kołkowski and
  • Kamil Pierściński

20 December 2024

In this paper, we report the growth of high-quality In0.59Ga0.41As/In0.37Al0.63As strain-balanced quantum cascade lasers (QCLs) in the low-pressure MOCVD production type multi-wafer planetary reactor addressing, in particular, quality and scaled manu...

  • Article
  • Open Access
3 Citations
2,578 Views
14 Pages

16 June 2023

This paper investigates the mechanical properties and creep behavior of undoped and Mg-doped GaN thin films grown on sapphire substrates using metal–organic chemical vapor deposition (MOCVD) with trimethylgallium (TMG) and bis(cyclopentadienyl)...

  • Article
  • Open Access
6 Citations
11,438 Views
8 Pages

TiCl4 Barrier Process Engineering in Semiconductor Manufacturing

  • Tuung Luoh,
  • Yu-Kai Huang,
  • Yung-Tai Hung,
  • Ling-Wuu Yang,
  • Ta-Hone Yang and
  • Kuang-Chao Chen

12 January 2016

Titanium nitride (TiN) not only was utilized in the wear-resistant coatings industry but it was also adopted in barrier processes for semiconductor manufacturing. Barrier processes include the titanium (Ti) and TiN processes, which are commonly used...

  • Article
  • Open Access
31 Citations
5,717 Views
6 Pages

InGaAs FinFETs Directly Integrated on Silicon by Selective Growth in Oxide Cavities

  • Clarissa Convertino,
  • Cezar Zota,
  • Heinz Schmid,
  • Daniele Caimi,
  • Marilyne Sousa,
  • Kirsten Moselund and
  • Lukas Czornomaz

27 December 2018

III-V semiconductors are being considered as promising candidates to replace silicon channel for low-power logic and RF applications in advanced technology nodes. InGaAs is particularly suitable as the channel material in n-type metal-oxide-semicondu...

  • Brief Report
  • Open Access
7 Citations
2,998 Views
12 Pages

High-Performance ε-Ga2O3 Solar-Blind Photodetectors Grown by MOCVD with Post-Thermal Annealing

  • Zeyuan Fei,
  • Zimin Chen,
  • Weiqu Chen,
  • Tiecheng Luo,
  • Shujian Chen,
  • Jun Liang,
  • Xinzhong Wang,
  • Xing Lu,
  • Gang Wang and
  • Yanli Pei

23 November 2023

High-temperature annealing has been regarded as an effective technology to improve the performance of Ga2O3-based solar-blind photodetectors (SBPDs). However, as a metastable phase, ε-Ga2O3 thin film may undergo phase transformation during po...

  • Review
  • Open Access
12 Citations
7,184 Views
46 Pages

30 July 2019

At the time when many nonlinear optical (NLO) materials for frequency conversion of laser sources in the mid and long-wave infrared have achieved their fundamental or technological limits, we propose heteroepitaxy as a solution to develop novel NLO m...

  • Article
  • Open Access
15 Citations
5,106 Views
17 Pages

25 January 2022

The trend related to reach the high operating temperature condition (HOT, temperature, T > 190 K) achieved by thermoelectric (TE) coolers has been observed in infrared (IR) technology recently. That is directly related to the attempts to reduce th...

  • Article
  • Open Access
4 Citations
1,213 Views
16 Pages

Impact of KOH Wet Treatment on the Electrical and Optical Characteristics of GaN-Based Red μLEDs

  • Shuhan Zhang,
  • Yun Zhang,
  • Hongyu Qin,
  • Qian Fan,
  • Xianfeng Ni,
  • Li Tao and
  • Xing Gu

22 March 2025

Micro-size light-emitting diodes (μLEDs) are high-brightness, low-power optoelectronic devices with significant potential in display technology, lighting, and biomedical applications. AlGaInP-based red LEDs experience severe size-dependent effects...