Surfaces

A comprehensive study was conducted to develop structurally robust, crack-suppressed superhydrophilic nanocomposite coatings comprising poly(acrylic acid) (PAA) and silica nanoparticles. We systematically investigated the critical trade-off between particle loading, which drives surface wettability and stress-induced crack formation driven by capillary forces and shrinkage mismatch. Our findings identify a distinct structural failure threshold between 25 and 30 vol.% silica under conventional drying. By strategically optimizing drying kinetics (an initial flash-dry at 120 °C for 1 h followed by a 24 h ambient cure), we successfully fabricated transparent, crack-suppressed superhydrophilic coatings at elevated silica loadings up to 47 vol.%, establishing a practical, scalable framework for advanced functional surface engineering. The crack-suppressed mechanism was hypothesized to be related to internal stress.

MnO₂ is widely investigated for electrochemical capacitors; however, its practical performance is often limited by low electrical conductivity and inefficient charge utilization in thick films. In this work, we investigate the combined effects of controlled electrodeposition and ionic liquid (IL)-assisted growth of MnO₂ films onto nickel foam at 0.6 V vs. Ag/AgCl for supercapacitor applications. The deposition time revealed a non-linear structure–performance relationship, with optimal electrochemical response obtained at an intermediate deposition time (240 s). The incorporation of ILs (e.g., [TEA-PS][BF₄] and [BMIM][BF₄]) enabled direct modulation of nucleation and growth dynamics. While [TEA-PS][BF₄] resulted in decreased performance, adding [BMIM][BF₄] significantly enhanced the electrochemical response. Our results reveal that without additives the films were dense and cracked; with [BMIM][BF₄], they became more open and nanostructured. Consequently, the optimized electrode exhibited a 25% higher specific capacitance, totaling 149.83 F·g⁻¹ at 10 mV·s⁻¹, compared to 119.87 F·g⁻¹ for the unmodified electrode. These findings demonstrate that IL-assisted electrodeposition is an effective strategy for optimizing MnO₂-based supercapacitor electrodes.

This article reviews the state of the art of laser ablation and deposition techniques applied so far to more than 50 elements, including metals, metalloids and lanthanides, yielding a wide variety of compounds in the form of thin films. Laser deposition processes have been performed in high-vacuum (HV) reactors at pressure values ranging between 10⁻¹ and 10⁻⁵ Pa, namely pulsed laser deposition (PLD), or, under different reactive gas ambient (O₂, N₂, CH₄, NH₃ and many others), so-called reactive pulsed laser deposition (RPLD), with the aim to form thin films with desirable chemical compositions. While a few metals have not been deposited as pure metallic films because they have no immediate technological interest, others, like alkali and alkaline earth metals, cannot be deposited in pure metallic form due to their very strong reactivity with oxygen, water vapor and hydrogen molecules which are always present, even in ultra-high-vacuum (UHV) systems, at pressure values of 10⁻⁵–10⁻¹⁰ Pa. Furthermore, elements of the Mendeleev periodic table with an atomic number higher than 88, such as actinides and synthetic elements, are dangerous to handle and deposit in the form of thin films due to their high radioactivity; therefore, they are excluded from this review. The inclusion of the non-metal thin films of carbon (C) and related chemical compounds prepared by PLD and RPLD in the present review is justified by the extensive research and the numerous scientific articles reported in the field. All the results obtained by PLD and RPLD techniques so far are discussed and presented in tabular format to guide the reader.