Surface Engineering of Thin Films

A special issue of Surfaces (ISSN 2571-9637).

Deadline for manuscript submissions: 30 April 2026 | Viewed by 4526

Special Issue Editor


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Guest Editor
Department of Materials, University of Manchester, Manchester M13 9PL, UK
Interests: surface engineering; coatings and thin films; performance and degradation; corrosion; wear; light alloys
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Special Issue Information

Dear Colleagues,

Many advanced applications in technology rely upon thin and ultrathin films carefully designed, engineered and deposited on the surfaces of solid substrates. Optoelectronic and magnetic devices, nano-electronics and MEMS, biomedical, catalytic and photocatalytic surfaces, tribological, anticorrosion and other protective coatings—to cite just a few examples—are all based on surface films with a thickness ranging from a single atomic layer to several microns, featuring a nanoscale structure and specific properties that provide the desired functionality. Besides this, the emergence of a wide family of new and exotic 2D materials is opening various innovative scenarios and application possibilities. In all these cases, the formation of thin films, their interaction with the substrate material and the external environment as well as the physics and chemistry underpinning film properties require an in-depth fundamental understanding.

The aim of this Special Issue of Surfaces is to offer a broad open access forum for all groups across the surface science community and gather together a collection of original fundamental, applied research articles and review papers in the context of “Surface Engineering of Thin Films”. Special emphasis will be given to, but not limited by, the following topics:

  1. New and emerging thin-film fabrication strategies and techniques that provide tangible benefits in versatility, environmental sustainability, processing efficiency and scalability;
  2. Advanced gas and liquid phase methods for thin-film deposition, self-assembly and epitaxial growth (e.g., assisted with pulsed plasmas, laser or electron beams);
  3. Smart and multifunctional thin-film materials systems with stimuli-responsive and adaptive behaviour for demanding applications;
  4. Green, sustainable and bio-compatible thin-film systems and associated fabrication methods;
  5. Advanced thin-film materials, including compositionally and functionally graded nanostructures, superlattices, nanolaminates and 2D materials;
  6. Organic thin films, molecular layers and polymeric systems (e.g., hydrated bio/polymers) with new and enhanced properties.

Advanced characterisation and evaluation techniques for thin-film materials systems that provide a new understanding of relationships between their characteristics (e.g., structural, chemical, topological), protective (e.g., mechanical, tribological, corrosion- and oxidation-resistant) and functional (e.g., electronic, optical, magnetic, biological, catalytic) properties, adhesion and in-service behaviour.

Dr. Aleksey Yerokhin
Guest Editor

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Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Surfaces is an international peer-reviewed open access quarterly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • surface engineering
  • coatings
  • thin films
  • surface characteristics
  • properties

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Published Papers (4 papers)

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Research

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15 pages, 4691 KiB  
Article
Comparison of Continuous and Pulsed Low-Power DC Sputtered Ti Thin Films Deposited at Room Temperature
by Anna Maria Reider, Ariane Kronthaler, Fabio Zappa, Alexander Menzel, Felix Laimer and Paul Scheier
Surfaces 2025, 8(2), 36; https://doi.org/10.3390/surfaces8020036 - 31 May 2025
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Abstract
Titanium thin films with thicknesses of up to 105 nm were deposited on borosilicate glass implementing low-power continuous (25 W) and pulsed (85 W, with an ultra-low duty cycle) DC magnetron sputtering. The characteristics of the resulting films were studied via atomic force [...] Read more.
Titanium thin films with thicknesses of up to 105 nm were deposited on borosilicate glass implementing low-power continuous (25 W) and pulsed (85 W, with an ultra-low duty cycle) DC magnetron sputtering. The characteristics of the resulting films were studied via atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), VIS spectroscopy, and four-point-probe measurements. Both deposition modes yield films with low surface roughness, and AFM analysis showed no topographical features indicative of columnar-and-void structures. The films exhibited high optical reflectivity and stable transmittance and reflectance across the visible spectrum. The electric resistivity could be measured even at single nanometer thickness, emphasizing the metallic character of the films and approaching the bulk titanium value at higher film thicknesses. The low power regime of magnetron sputter deposition not only offers the possibility of studying the development of physical characteristics during the growth of ultra-thin films but also provides the advantage of extremely low heat development and no evident mechanical stress on the substrate during the coating process. These results outline a path for low-power DC sputtering as a reliable approach for studying the evolution of functional properties in ultra-thin films and for the gentle fabrication of coatings where thermal stress must be avoided, making the method compatible with temperature-sensitive applications. Full article
(This article belongs to the Special Issue Surface Engineering of Thin Films)
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16 pages, 48638 KiB  
Article
Epitaxial Growth of Ni-Mn-Ga on Al2O3(112¯0) Single-Crystal Substrates by Pulsed Laser Deposition
by Manuel G. Pinedo-Cuba, José M. Caicedo-Roque, Jessica Padilla-Pantoja, Justiniano Quispe-Marcatoma, Carlos V. Landauro, Víctor A. Peña-Rodríguez and José Santiso
Surfaces 2025, 8(2), 35; https://doi.org/10.3390/surfaces8020035 - 30 May 2025
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Abstract
Magnetic shape memory alloys have attracted considerable attention due to their multifunctional properties. Among these materials, Ni-Mn-Ga alloys are distinguished by their ability to achieve up to 10% strain when exposed to a magnetic field, a characteristic predominantly observed in single-crystal samples. Consequently, [...] Read more.
Magnetic shape memory alloys have attracted considerable attention due to their multifunctional properties. Among these materials, Ni-Mn-Ga alloys are distinguished by their ability to achieve up to 10% strain when exposed to a magnetic field, a characteristic predominantly observed in single-crystal samples. Consequently, it is essential to develop nanomaterials with a crystal structure closely resembling that of a single crystal. In this study, an epitaxial Ni-Mn-Ga thin film was fabricated using Pulsed Laser Deposition on an Al2O3 (112¯0) single-crystal substrate. The crystal structure was characterised through X-ray diffraction methodologies, such as symmetrical 2θω scans, pole figures, and reciprocal space maps. The results indicated that the sample was mainly in a slightly distorted cubic austenite phase, and some incipient martensite phase also appeared. A detailed microstructural analysis, performed by transmission electron microscopy, confirmed that certain regions of the sample exhibited an incipient transformation to the martensite phase. Regions closer to the substrate retained the austenite phase, suggesting that the constraint imposed by the substrate inhibits the phase transition. These results indicate that it is possible to grow high crystalline quality thin films of Ni-Mn-Ga by Pulsed Laser Deposition. Full article
(This article belongs to the Special Issue Surface Engineering of Thin Films)
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17 pages, 3451 KiB  
Article
TPA and PET Photo-Degradation by Heterogeneous Catalysis Using a (Al2O3)0.75TiO2 Coating
by Mónica A. Camacho-González, Alberto Hernández-Reyes, Aristeo Garrido-Hernández, Octavio Olivares-Xometl, Natalya V. Likhanova and Irina V. Lijanova
Surfaces 2025, 8(2), 34; https://doi.org/10.3390/surfaces8020034 - 21 May 2025
Cited by 1 | Viewed by 769
Abstract
The combination of the catalytic properties of Al2O3/TiO2 formed an efficient system to degrade the ubiquitous pollutants TPA and PET. The coating (Al2O3)0.75TiO2 was characterized by X-ray diffraction. Stainless steel disks [...] Read more.
The combination of the catalytic properties of Al2O3/TiO2 formed an efficient system to degrade the ubiquitous pollutants TPA and PET. The coating (Al2O3)0.75TiO2 was characterized by X-ray diffraction. Stainless steel disks with photo-catalyst coating were placed transversely in a 3.0 L vertical glass reactor with ascending airflow for supplying oxygen to the reaction medium and visible light lamps for photo-activation. The analysis of the coating homogeneity, morphology and particle size distribution of the TiO2 coatings and (Al2O3)0.75TiO2 system were confirmed by SEM. Optical properties and band-gap energy were calculated by using the Tauc equation. UV–Vis spectrophotometry (UV–Vis) and chemical oxygen demand (COD) were the quantitative techniques to measure the reduction in the initial TPA and PET concentrations. Full article
(This article belongs to the Special Issue Surface Engineering of Thin Films)
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Review

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17 pages, 5351 KiB  
Review
Thin Epitaxial Ionic Fluoride Films for Electronics Applications
by Giulia Giovanelli, Mauro Borghi, Alessandro Lodi, Tibor Grasser and Luca Pasquali
Surfaces 2025, 8(2), 22; https://doi.org/10.3390/surfaces8020022 - 27 Mar 2025
Viewed by 501
Abstract
The realization of novel electronic devices based on 2D materials, i.e., field-effect transistors, has recently stimulated a renewed interest regarding ultrathin fluoride epitaxial films. Thanks to their chemical and dielectric properties, ionic fluorides could have the potential to be used as insulators in [...] Read more.
The realization of novel electronic devices based on 2D materials, i.e., field-effect transistors, has recently stimulated a renewed interest regarding ultrathin fluoride epitaxial films. Thanks to their chemical and dielectric properties, ionic fluorides could have the potential to be used as insulators in many applications that require high processing control down to the nanoscale. Here we provide a review of some of the principal results that have been achieved in the past decades regarding the controlled growth of epitaxial fluorides on different types of materials relevant for electronics. The aim is to provide a concise summary of the growth modes, crystallinity, film morphologies, and chemical interactions of different types of fluorides on different type of substrates, highlighting the possibilities of applications and the future perspectives. Full article
(This article belongs to the Special Issue Surface Engineering of Thin Films)
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