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Surfaces
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Surface Engineering of Thin Films
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Surface Engineering of Thin Films

A special issue of Surfaces (ISSN 2571-9637).

Deadline for manuscript submissions: 30 April 2026 | Viewed by 9080

Special Issue Editor

Dr. Aleksey Yerokhin

E-Mail Website
Guest Editor
Department of Materials, University of Manchester, Manchester M13 9PL, UK
Interests: surface engineering; coatings and thin films; performance and degradation; corrosion; wear; light alloys
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Many advanced applications in technology rely upon thin and ultrathin films carefully designed, engineered and deposited on the surfaces of solid substrates. Optoelectronic and magnetic devices, nano-electronics and MEMS, biomedical, catalytic and photocatalytic surfaces, tribological, anticorrosion and other protective coatings—to cite just a few examples—are all based on surface films with a thickness ranging from a single atomic layer to several microns, featuring a nanoscale structure and specific properties that provide the desired functionality. Besides this, the emergence of a wide family of new and exotic 2D materials is opening various innovative scenarios and application possibilities. In all these cases, the formation of thin films, their interaction with the substrate material and the external environment as well as the physics and chemistry underpinning film properties require an in-depth fundamental understanding.

The aim of this Special Issue of Surfaces is to offer a broad open access forum for all groups across the surface science community and gather together a collection of original fundamental, applied research articles and review papers in the context of “Surface Engineering of Thin Films”. Special emphasis will be given to, but not limited by, the following topics:

  1. New and emerging thin-film fabrication strategies and techniques that provide tangible benefits in versatility, environmental sustainability, processing efficiency and scalability;
  2. Advanced gas and liquid phase methods for thin-film deposition, self-assembly and epitaxial growth (e.g., assisted with pulsed plasmas, laser or electron beams);
  3. Smart and multifunctional thin-film materials systems with stimuli-responsive and adaptive behaviour for demanding applications;
  4. Green, sustainable and bio-compatible thin-film systems and associated fabrication methods;
  5. Advanced thin-film materials, including compositionally and functionally graded nanostructures, superlattices, nanolaminates and 2D materials;
  6. Organic thin films, molecular layers and polymeric systems (e.g., hydrated bio/polymers) with new and enhanced properties.

Advanced characterisation and evaluation techniques for thin-film materials systems that provide a new understanding of relationships between their characteristics (e.g., structural, chemical, topological), protective (e.g., mechanical, tribological, corrosion- and oxidation-resistant) and functional (e.g., electronic, optical, magnetic, biological, catalytic) properties, adhesion and in-service behaviour.

Dr. Aleksey Yerokhin
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Surfaces is an international peer-reviewed open access quarterly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • surface engineering
  • coatings
  • thin films
  • surface characteristics
  • properties

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Published Papers (8 papers)

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Research

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22 pages, 10488 KiB  
Article
Morphological and Functional Evolution of Amorphous AlN Thin Films Deposited by RF-Magnetron Sputtering
by Maria-Iulia Zai, Ioana Lalau, Marina Manica, Lucia Chiriacescu, Vlad-Andrei Antohe, Cristina C. Gheorghiu, Sorina Iftimie, Ovidiu Toma, Mirela Petruta Suchea and Ștefan Antohe
Surfaces 2025, 8(3), 51; https://doi.org/10.3390/surfaces8030051 - 17 Jul 2025
Viewed by 178
Abstract
Aluminum nitride (AlN) thin films were deposited on SiO2 substrates by RF-magnetron sputtering at varying powers (110–140 W) and subsequently subjected to thermal annealing at 450 °C under nitrogen atmosphere. A comprehensive multi-technique investigation—including X-ray reflectometry (XRR), X-ray diffraction (XRD), scanning electron [...] Read more.
Aluminum nitride (AlN) thin films were deposited on SiO2 substrates by RF-magnetron sputtering at varying powers (110–140 W) and subsequently subjected to thermal annealing at 450 °C under nitrogen atmosphere. A comprehensive multi-technique investigation—including X-ray reflectometry (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), optical profilometry, spectroscopic ellipsometry (SE), and electrical measurements—was performed to explore the physical structure, morphology, and optical and electrical properties of the films. The analysis of the film structure by XRR revealed that increasing sputtering power resulted in thicker, denser AlN layers, while thermal treatment promoted densification by reducing density gradients but also induced surface roughening and the formation of island-like morphologies. Optical studies confirmed excellent transparency (>80% transmittance in the near-infrared region) and demonstrated the tunability of the refractive index with sputtering power, critical for optoelectronic applications. The electrical characterization of Au/AlN/Al sandwich structures revealed a transition from Ohmic to trap-controlled space charge limited current (SCLC) behavior under forward bias—a transport mechanism frequently present in a material with very low mobility, such as AlN—while Schottky conduction dominated under reverse bias. The systematic correlation between deposition parameters, thermal treatment, and the resulting physical properties offers valuable pathways to engineer AlN thin films for next-generation optoelectronic and high-frequency device applications. Full article
(This article belongs to the Special Issue Surface Engineering of Thin Films)
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17 pages, 2685 KiB  
Article
Co-Effect of pH Control Agent and pH Value on the Physical Properties of ZnO Thin Films Obtained by Chemical Bath Deposition for Potential Application in Dye-Sensitized Solar Cells
by Alphonse Déssoudji Gboglo, Mazabalo Baneto, Komlan Segbéya Gadedjisso-Tossou, Ognanmi Ako, Ayayi Claude Ahyi, Muthiah Haris, Muthusamy Senthilkumar, Kekeli N’konou, Bruno Grandidier, Katawoura Beltako, Komi Apélété Amou and Milohum Mikesokpo Dzagli
Surfaces 2025, 8(3), 46; https://doi.org/10.3390/surfaces8030046 - 1 Jul 2025
Viewed by 303
Abstract
This study presents the influence of pH control agents and pH value on the physical properties of ZnO thin films obtained by chemical bath deposition. ZnO thin films were synthesized on glass substrates using precursor solutions of different pHs prepared from two bases: [...] Read more.
This study presents the influence of pH control agents and pH value on the physical properties of ZnO thin films obtained by chemical bath deposition. ZnO thin films were synthesized on glass substrates using precursor solutions of different pHs prepared from two bases: sodium hydroxide (NaOH) and ammonia (NH3). The effect of pH values on the morphological, structural, and optical properties of ZnO thin films was investigated using X-ray diffraction (XRD), scanning electron microscopy (SEM), Fourier transform infrared spectroscopy (FTIR), and UV–Visible spectroscopy. XRD results showed that all the synthesized ZnO thin films are polycrystalline and crystallize in a hexagonal wurtzite structure. The crystallite size, calculated using the Debye–Scherrer formula, varied from 10.50 nm to 11.69 nm for ZnO thin films obtained with NH3 and from 20.79 nm to 27.76 nm for those obtained with NaOH. FTIR analysis confirmed the presence of functional groups. SEM images indicated that not only the base but also the pH affects the morphology of the films, giving rise to different granular shapes. Overall, the ZnO thin films obtained with NaOH looked more mesoporous compared to those obtained with NH3. Optical characterization results showed that whatever the base used, the pH of the precursor solution affected the ZnO thin film transmittance. Films synthesized with NH3 exhibited the best transmittance (80%) at pH 8.5, while the best transmittance (81%) of films synthesized with NaOH was obtained at pH 8 in the visible region. Based on optical and morphological properties, ZnO films obtained from NH3 at pH 8.5 are found to be more suitable as photoanodes in dye-sensitized solar cells. Full article
(This article belongs to the Special Issue Surface Engineering of Thin Films)
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12 pages, 2254 KiB  
Article
Hydrophobic Boron Nitride Nanoflower Coatings on Mild Steel Surfaces
by Aamir Nadeem, Muhammad Faheem Maqsood, Mohsin Ali Raza, Syed Muhammad Zain Mehdi and Shahbaz Ahmad
Surfaces 2025, 8(3), 42; https://doi.org/10.3390/surfaces8030042 - 25 Jun 2025
Viewed by 396
Abstract
Growing demand for chemically resistant, thermally stable, and anti-icing coatings has intensified interest in boron nitride (BN)-based materials and surface coatings. In this study, BN coatings were developed on mild steel (MS) via chemical vapour deposition (CVD) at 1200 °C for 15, 30, [...] Read more.
Growing demand for chemically resistant, thermally stable, and anti-icing coatings has intensified interest in boron nitride (BN)-based materials and surface coatings. In this study, BN coatings were developed on mild steel (MS) via chemical vapour deposition (CVD) at 1200 °C for 15, 30, and 60 min, and their structural, surface, and water-repellent characteristics were evaluated. X-ray diffraction (XRD) and Fourier-transform infrared (FTIR) spectroscopy confirmed the successful formation of BN, while water contact angle measurements indicated high hydrophobicity, demonstrating excellent barrier properties. Scanning electron microscopy (SEM) revealed morphological evolution from flower- and needle-like BN structures in the sample placed in the CVD furnace for 15 min to dense, coral-like, and tubular networks in the samples placed for 30 and 60 min. These findings highlight that BN coatings, particularly the one obtained after 30 min of deposition, have a high hydrophobic character following the Cassie–Baxter model and can be used for corrosion resistance and anti-icing on MS, making them ideal for industrial applications requiring long-lasting protection. Full article
(This article belongs to the Special Issue Surface Engineering of Thin Films)
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14 pages, 1673 KiB  
Article
Drying and Film Formation Processes of Graphene Oxide Suspension on Nonwoven Fibrous Membranes with Varying Wettability
by Zeman Liu, Jiaxing Fan, Jian Xue and Fei Guo
Surfaces 2025, 8(2), 39; https://doi.org/10.3390/surfaces8020039 - 18 Jun 2025
Viewed by 417
Abstract
Graphene oxide (GO) films have attracted significant attention due to their potential in separation and filtration applications. Based on their unique lamellar structure and ultrathin nature, GO films are difficult to maintain in a free-standing form and typically require substrate support. Consequently, understanding [...] Read more.
Graphene oxide (GO) films have attracted significant attention due to their potential in separation and filtration applications. Based on their unique lamellar structure and ultrathin nature, GO films are difficult to maintain in a free-standing form and typically require substrate support. Consequently, understanding their film formation behavior and mechanisms on substrates is of paramount importance. This work employs commonly used nonwoven fibrous membranes as substrates and guided by the coffee-ring theory, systematically investigates the film formation behaviors, film morphology, and underlying mechanisms of GO films on fibrous membranes with varying wettability. Fibrous membranes with different wetting properties—hydrophilic, hydrophobic, and superhydrophobic—were prepared via electrospinning and initiated chemical vapor deposition (iCVD) surface modification techniques. The spreading behaviors, deposition dynamics, capillary effects, and evaporation-induced film formation mechanisms of GO suspensions on these substrates were thoroughly examined. The results showed that GO formed belt-like, ring-like, and circular patterns on the three fibrous membranes, respectively. GO films encapsulated more than the upper half, approximately the upper half, and the top portion of fibers, respectively. Pronounced wrinkling of GO films was observed except for those on the hydrophilic fibrous membrane. This work demonstrates that tuning the wettability of fibrous substrates enables precise control over GO film morphology, including fiber encapsulation, wrinkling, and coverage area. Furthermore, it deepens the understanding of the interactions between 1D nanofibers and 2D GO sheets at low-dimensional scales, laying a foundational basis for the optimized design of membrane engineering. Full article
(This article belongs to the Special Issue Surface Engineering of Thin Films)
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15 pages, 4691 KiB  
Article
Comparison of Continuous and Pulsed Low-Power DC Sputtered Ti Thin Films Deposited at Room Temperature
by Anna Maria Reider, Ariane Kronthaler, Fabio Zappa, Alexander Menzel, Felix Laimer and Paul Scheier
Surfaces 2025, 8(2), 36; https://doi.org/10.3390/surfaces8020036 - 31 May 2025
Viewed by 641
Abstract
Titanium thin films with thicknesses of up to 105 nm were deposited on borosilicate glass implementing low-power continuous (25 W) and pulsed (85 W, with an ultra-low duty cycle) DC magnetron sputtering. The characteristics of the resulting films were studied via atomic force [...] Read more.
Titanium thin films with thicknesses of up to 105 nm were deposited on borosilicate glass implementing low-power continuous (25 W) and pulsed (85 W, with an ultra-low duty cycle) DC magnetron sputtering. The characteristics of the resulting films were studied via atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), VIS spectroscopy, and four-point-probe measurements. Both deposition modes yield films with low surface roughness, and AFM analysis showed no topographical features indicative of columnar-and-void structures. The films exhibited high optical reflectivity and stable transmittance and reflectance across the visible spectrum. The electric resistivity could be measured even at single nanometer thickness, emphasizing the metallic character of the films and approaching the bulk titanium value at higher film thicknesses. The low power regime of magnetron sputter deposition not only offers the possibility of studying the development of physical characteristics during the growth of ultra-thin films but also provides the advantage of extremely low heat development and no evident mechanical stress on the substrate during the coating process. These results outline a path for low-power DC sputtering as a reliable approach for studying the evolution of functional properties in ultra-thin films and for the gentle fabrication of coatings where thermal stress must be avoided, making the method compatible with temperature-sensitive applications. Full article
(This article belongs to the Special Issue Surface Engineering of Thin Films)
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16 pages, 48638 KiB  
Article
Epitaxial Growth of Ni-Mn-Ga on Al2O3(112¯0) Single-Crystal Substrates by Pulsed Laser Deposition
by Manuel G. Pinedo-Cuba, José M. Caicedo-Roque, Jessica Padilla-Pantoja, Justiniano Quispe-Marcatoma, Carlos V. Landauro, Víctor A. Peña-Rodríguez and José Santiso
Surfaces 2025, 8(2), 35; https://doi.org/10.3390/surfaces8020035 - 30 May 2025
Viewed by 2097
Abstract
Magnetic shape memory alloys have attracted considerable attention due to their multifunctional properties. Among these materials, Ni-Mn-Ga alloys are distinguished by their ability to achieve up to 10% strain when exposed to a magnetic field, a characteristic predominantly observed in single-crystal samples. Consequently, [...] Read more.
Magnetic shape memory alloys have attracted considerable attention due to their multifunctional properties. Among these materials, Ni-Mn-Ga alloys are distinguished by their ability to achieve up to 10% strain when exposed to a magnetic field, a characteristic predominantly observed in single-crystal samples. Consequently, it is essential to develop nanomaterials with a crystal structure closely resembling that of a single crystal. In this study, an epitaxial Ni-Mn-Ga thin film was fabricated using Pulsed Laser Deposition on an Al2O3 (112¯0) single-crystal substrate. The crystal structure was characterised through X-ray diffraction methodologies, such as symmetrical 2θ−ω scans, pole figures, and reciprocal space maps. The results indicated that the sample was mainly in a slightly distorted cubic austenite phase, and some incipient martensite phase also appeared. A detailed microstructural analysis, performed by transmission electron microscopy, confirmed that certain regions of the sample exhibited an incipient transformation to the martensite phase. Regions closer to the substrate retained the austenite phase, suggesting that the constraint imposed by the substrate inhibits the phase transition. These results indicate that it is possible to grow high crystalline quality thin films of Ni-Mn-Ga by Pulsed Laser Deposition. Full article
(This article belongs to the Special Issue Surface Engineering of Thin Films)
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17 pages, 3451 KiB  
Article
TPA and PET Photo-Degradation by Heterogeneous Catalysis Using a (Al2O3)0.75TiO2 Coating
by Mónica A. Camacho-González, Alberto Hernández-Reyes, Aristeo Garrido-Hernández, Octavio Olivares-Xometl, Natalya V. Likhanova and Irina V. Lijanova
Surfaces 2025, 8(2), 34; https://doi.org/10.3390/surfaces8020034 - 21 May 2025
Cited by 1 | Viewed by 1357
Abstract
The combination of the catalytic properties of Al2O3/TiO2 formed an efficient system to degrade the ubiquitous pollutants TPA and PET. The coating (Al2O3)0.75TiO2 was characterized by X-ray diffraction. Stainless steel disks [...] Read more.
The combination of the catalytic properties of Al2O3/TiO2 formed an efficient system to degrade the ubiquitous pollutants TPA and PET. The coating (Al2O3)0.75TiO2 was characterized by X-ray diffraction. Stainless steel disks with photo-catalyst coating were placed transversely in a 3.0 L vertical glass reactor with ascending airflow for supplying oxygen to the reaction medium and visible light lamps for photo-activation. The analysis of the coating homogeneity, morphology and particle size distribution of the TiO2 coatings and (Al2O3)0.75TiO2 system were confirmed by SEM. Optical properties and band-gap energy were calculated by using the Tauc equation. UV–Vis spectrophotometry (UV–Vis) and chemical oxygen demand (COD) were the quantitative techniques to measure the reduction in the initial TPA and PET concentrations. Full article
(This article belongs to the Special Issue Surface Engineering of Thin Films)
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Review

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17 pages, 5351 KiB  
Review
Thin Epitaxial Ionic Fluoride Films for Electronics Applications
by Giulia Giovanelli, Mauro Borghi, Alessandro Lodi, Tibor Grasser and Luca Pasquali
Surfaces 2025, 8(2), 22; https://doi.org/10.3390/surfaces8020022 - 27 Mar 2025
Viewed by 734
Abstract
The realization of novel electronic devices based on 2D materials, i.e., field-effect transistors, has recently stimulated a renewed interest regarding ultrathin fluoride epitaxial films. Thanks to their chemical and dielectric properties, ionic fluorides could have the potential to be used as insulators in [...] Read more.
The realization of novel electronic devices based on 2D materials, i.e., field-effect transistors, has recently stimulated a renewed interest regarding ultrathin fluoride epitaxial films. Thanks to their chemical and dielectric properties, ionic fluorides could have the potential to be used as insulators in many applications that require high processing control down to the nanoscale. Here we provide a review of some of the principal results that have been achieved in the past decades regarding the controlled growth of epitaxial fluorides on different types of materials relevant for electronics. The aim is to provide a concise summary of the growth modes, crystallinity, film morphologies, and chemical interactions of different types of fluorides on different type of substrates, highlighting the possibilities of applications and the future perspectives. Full article
(This article belongs to the Special Issue Surface Engineering of Thin Films)
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