- Article
TiN Films Deposited on Uranium by High Power Pulsed Magnetron Sputtering under Low Temperature
- Jingjing Ding,
- Xixi Yin,
- Liping Fang,
- Xiandong Meng and
- Anyi Yin
Depleted uranium (DU) is oxidized readily due to its chemical activities, which limits its applications in nuclear industry. TiN film has been applied widely due to its good mechanical properties and its excellent corrosion resistance. In this work,...