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Article

Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS)

1
Faculty of Engineering, Tokyo Polytechnic University, Atsugi Kanagawa 243-0297, Japan
2
Ayabo Corporation, Anjo Aichi 446-0052, Japan
3
Department of Chemistry, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan
4
Toyota Physical and Chemical Research Institute, Nagakute Aichi 480-1192, Japan
*
Author to whom correspondence should be addressed.
Academic Editor: Andrey Starikovskiy
Plasma 2021, 4(2), 269-280; https://doi.org/10.3390/plasma4020018
Received: 29 April 2021 / Revised: 14 May 2021 / Accepted: 17 May 2021 / Published: 19 May 2021
(This article belongs to the Special Issue Feature Papers in Plasma Sciences)
Modulated pulsed power magnetron sputtering (MPPMS) of titanium was investigated as a function of argon gas pressure using optical emission spectroscopy (OES). Delays in discharge and the formation of comb-like discharge current waveforms due to splitting and pulsing were observed with a decrease in pressure. This observation corresponds to the evolution from MPPMS condition to deep-oscillation-magnetron-sputtering (DOMS)-like condition by changing discharge gas pressure. The optical emission intensities of the ionic species (Ar+ and Ti+) increased as the comb-like current waveforms were formed with decreasing Ar pressure. This behavior showed a marked contrast to that of the neutral species (Ar and Ti). The Ar pressure dependence of OES was revealed to be due to the plasma build-up stage, which is the initial generation process of plasma discharge in pulsed dc magnetron sputtering, from the temporal profile for the atomic-line intensities of the optically emitting species in MPPMS and DOMS-like plasmas. View Full-Text
Keywords: magnetron sputtering; HPPMS; MPPMS; DOMS; optical emission spectroscopy; delayed discharge; plasma diagnostics magnetron sputtering; HPPMS; MPPMS; DOMS; optical emission spectroscopy; delayed discharge; plasma diagnostics
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MDPI and ACS Style

Sanekata, M.; Nishida, H.; Nakagomi, Y.; Hirai, Y.; Nishimiya, N.; Tona, M.; Hirata, N.; Yamamoto, H.; Tsukamoto, K.; Ohshimo, K.; Misaizu, F.; Fuke, K. Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS). Plasma 2021, 4, 269-280. https://doi.org/10.3390/plasma4020018

AMA Style

Sanekata M, Nishida H, Nakagomi Y, Hirai Y, Nishimiya N, Tona M, Hirata N, Yamamoto H, Tsukamoto K, Ohshimo K, Misaizu F, Fuke K. Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS). Plasma. 2021; 4(2):269-280. https://doi.org/10.3390/plasma4020018

Chicago/Turabian Style

Sanekata, Masaomi, Hiroshi Nishida, Yuki Nakagomi, Yoshihiro Hirai, Nobuo Nishimiya, Masahide Tona, Naoyuki Hirata, Hiroaki Yamamoto, Keizo Tsukamoto, Keijiro Ohshimo, Fuminori Misaizu, and Kiyokazu Fuke. 2021. "Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS)" Plasma 4, no. 2: 269-280. https://doi.org/10.3390/plasma4020018

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