PVD Coatings: Synthesis, Materials and Properties
This special issue belongs to the section "Thin Films and Interfaces".
Special Issue Information
Dear Colleagues,
Physical vapor deposition techniques play a key role in today's ever-accelerating world. First, they are very effective for preparing brand new nanostructured thin film materials with unique physical properties. Second, unlike many other thin film preparation methods, they can be easily scaled up. Last, but not least, they are environmentally friendly technologies. For the reasons mentioned above, they are widely used in the automotive industry, in electronics, for the production of renewable energy sources, for energy saving, and in the glass industry and many others.
This Special Issue of Materials aims to present the latest contributions focusing on various aspects of PVD coating, such as research into new thin film materials or their applications. Contributions explaining the phenomena related to the preparation of thin film materials using PVD techniques (discharge plasma modeling and/or diagnostics, atomic-scale computer simulations of materials, etc.) are also welcome. We believe that this collection can help to share new inspirational ideas across the PVD community.
Dr. Jiří Rezek
Guest Editor
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Keywords
- PVD technologies
- new nanostructured thin films
- magnetron sputtering
- plasma discharge modeling
- glow discharge diagnostics
- growth mechanisms of thin films
- high-power impulse magnetron sputtering
- reactive sputtering process control
- large area coating
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Published Papers
Materials - ISSN 1996-1944