Atomic Layer Deposition: Recent Developments and Future Challenges

Dear Colleagues,

The aim of this Special Issue is to publish as well as original research papers reviews from leading groups around the world, both experimental and theoretical, with achievements in the new field of ultrathin coatings.

More specifically, this Special Issue of Coatings on ultra-thin atomic layer deposition aims to: (i) Collect in one place fundamental research findings on ALD obtained at different groups, sometimes in exotic fields; to give an example, ALD was applied recently to RF cavities of high-gradient accelerators to resolve a nearly 100-year-old vacuum breakdown problem; (ii) facilitate dissemination of the science and technology of ALD among universities, teachers and students; (iii) transfer the results of fundamental and applied work conducted in many leading laboratories recently to industry.

Traditional CVD and PVD processes are also planned to be covered for comparison.

The Special Issue plans to cover coatings, surfaces, and interfaces in the broader sense.

• Ultrathin films—Atomic Layer Deposition;
• Surfaces passivated by carbon atoms;
• Coatings using CNT, fullerenes, graphene, GO, MoS2, BN;
• Characterization techniques (SPM; SEM, TEM; XPS; AFM, STM);
• Applied surface science;
• Adsorption, adhesion, functionalization;
• Fundamental and functional properties of surface and interfaces;
• Theoretical and computational modeling of surfaces and interfaces;
• Super-hydrophobicity;
• Super-hydrophilicity;
• Anti-icing coatings;
• Self-healing coating;
• Anti-corona coatings.

Prof. Dr. Zinetula Insepov
Dr. Maxim Yu. Maximov
Guest Editors

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