Direct Ultrafast Laser Writing in Photonics and Optoelectronics

Dear Colleagues,

Ultrafast lasers, characterized by their extraordinarily high peak power and ultrashort pulse durations, manifest highly distinctive and pronounced advantages in direct energy deposition at material interfaces and within internal regions. Leveraging these unique features, ultrafast lasers enable exquisitely precise manipulation of physical and chemical properties such as refractive index, density, phase, elemental distribution, and ionic valence states at the micro–nano scale, both at material interfaces and in the material interior. In recent years, the exploration of applications of direct ultrafast laser writing technology has emerged as a research hotspot across diverse fields, including optical computing, optical storage, optical sensing, and photodetection.

This Special Issue aims to provide a comprehensive overview of the current state-of-the-art in direct ultrafast laser writing technology, ranging from underlying mechanisms to applications. We welcome a wide range of topics, including fundamental research on the mechanisms of material modification induced by ultrafast lasers, the extreme control of material modification through laser temporal and spatial parameters, and applied research involving the fabrication of optical computing/optical quantum chips, optical storage devices, optical sensors, and photodetection devices.

We hope to offer a forward-looking perspective on the fundamental challenges within the field of direct ultrafast laser writing in photonics and optoelectronics and identify key areas for future research. We look forward to receiving your contributions.

Dr. Guodong Zhang
Dr. Xu Wang
Guest Editors

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