Gallium Nitride (GaN)-Based Power Electronic Devices and Systems

A special issue of Electronics (ISSN 2079-9292). This special issue belongs to the section "Power Electronics".

Deadline for manuscript submissions: 15 May 2025 | Viewed by 579

Special Issue Editors


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Guest Editor
Guangzhou Institute of Technology, Xidian University, Guangzhou 510555, China
Interests: (Al)GaN semiconductor materials; GaN HEMTs; power electronics; radio frequency devices; reliability; power IC

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Guest Editor
Guangzhou Institute of Technology, Xidian University, Guangzhou 510555, China
Interests: compound semiconductor materials; GaN HEMTs; solid state RF devices and IC; heterogeneous integration; advanced processing technology

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Guest Editor
School of Microelectronics, Xidian University, Xi’an 710126, China
Interests: GaN-based material; GaN SBD; GaN PFET

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Guest Editor
ZJU—Hangzhou Global Scientific and Technological Innovation Center, Hangzhou 311215, China
Interests: high-efficiency high-power density power converter; control optimization; magnetics integration

Special Issue Information

Dear Colleagues, 

GaN HEMTs with an excellent factor of RG × QG have initiated a new era for solid-state power electronics, owing to their superior material properties such as high electric breakdown field, high electron mobility, and high thermal stability. The high-density and high-mobility two-dimensional electron gas (2DEG) enables a significantly low conduction loss and switching loss, which not only improves the energy conversion efficiency but also boosts the system’s power density. GaN HEMTs have achieved great success in consumer electronics, especially fast chargers. Since 2023, GaN HEMTs have also been adopted for other consumer applications such as Class D-Audio, e-tools, and home appliances. Industrial and vehicle applications are expected to be accelerated since 2024.

Recently, some new trends have emerged and are promising to further unlock the potential of GaN HEMTs. First, novel substrates of QST, bulk GaN, and sapphire are bound to improve the stability of the devices fundamentally. Second, novel device structures such as junction field-effect transistor (JFET), active passivation-HEMTs, ohmic/Schottky hybrid gate contact, gate-source bridge, pFET, etc. have been proposed to promote electrical performance and stability. Third, manifest progresses in reliability including high temperature operating life (HTOL), unclamped inductive switching (UIS), short circuit (SC), and avalanche have also been reported recently.

The Special Issue "Gallium Nitride (GaN)-Based Power Electronic Devices and Systems" of the Journal Electronics aims to present recent advantages in the design, fabrication, reliability, systems, and applications of GaN-based power electronic devices and systems. The scope of this Special Issue includes, but is not limited to, the following:     

  • Epitaxy of novel substrates such as QST, bulk GaN, bulk AlN, sapphire, etc.
  • Reliability including BTI, TDDB, dynamic RON, aging test, etc.      
  • Novel concepts for device structure design.
  • Novel power architecture and circuit design for high power systems.       
  • Monolithic integration.
  • Advanced applications in industry, EVs, renewable energy, etc.

 We look forward to receiving your submissions for this Special Issue! 

Dr. Xiangdong Li
Dr. Weichuan Xing
Dr. Tao Zhang
Dr. Jinxu Yang
Guest Editors

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Keywords

  • GaN HEMTs
  • heterostructure epitaxy
  • fabrication
  • power electronics
  • reliability
  • power integrated circuits

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Published Papers (1 paper)

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Research

15 pages, 4508 KiB  
Article
Three-Channel Fully Integrated Galvanic Isolation Interface in GaN Technology
by Katia Samperi, Nunzio Spina, Alessandro Castorina and Giuseppe Palmisano
Electronics 2025, 14(7), 1403; https://doi.org/10.3390/electronics14071403 - 31 Mar 2025
Viewed by 322
Abstract
This paper presents a three-channel galvanic isolation interface in GaN technology. Driver, diagnostic, and control channels have been implemented in a two-die integrated system to perform an isolation interface for a high-performance power switching system. Chip-to-chip communication has been used, which is based [...] Read more.
This paper presents a three-channel galvanic isolation interface in GaN technology. Driver, diagnostic, and control channels have been implemented in a two-die integrated system to perform an isolation interface for a high-performance power switching system. Chip-to-chip communication has been used, which is based on planar micro-antennas with on–off keying modulated RF carriers. This approach provides a high isolation rating by properly setting the distance between chips. Various innovation aspects are adopted with respect to previously published works. They mainly involve the receiver robustness thanks to the switched-capacitor bias control, a bidirectional data channel implementation for power section diagnostic, and a duty cycle distortion compensation for accurate PWM signal. Driver and control channels use RF carriers of about 2 GHz and 0.9 GHz and achieve 2 MHz and 0.5 MHz measured pulse width modulation signals, respectively. The bidirectional channel adopts an RF carrier of about 400 MHz and exhibits a maximum measured data rate as high as 10 Mb/s. Thanks to the extensive use of switched-capacitor circuit solutions, well-controlled behavior is achieved against the large process tolerances and temperature drifts of the GaN technology. The isolation interface is supplied at 6 V and occupies a die area of 7.6 mm2 for each chip. Full article
(This article belongs to the Special Issue Gallium Nitride (GaN)-Based Power Electronic Devices and Systems)
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