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Advances in Microelectronic Materials, Processes and Devices

This special issue belongs to the section "Electrical, Electronics and Communications Engineering".

Special Issue Information

Keywords

  • new materials (FEOL, BEOL…)
  • integration processes (growth, deposition, doping, etching, patterning, lithography…)
  • device architectures (bulk, thin film, nanoribbon, nanowire, 2D…)
  • physical characterization and metrology
  • electrical characterization and reliability
  • memories (SRAM, DRAM, NVM, MRAM, ReRAM…)
  • cryogenic CMOS
  • beyond CMOS
  • 3D VLSI
Graphical abstract

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Published Papers

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Appl. Sci. - ISSN 2076-3417