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15 Results Found

  • Article
  • Open Access
1 Citations
3,812 Views
14 Pages

Random Telegraph Noise Degradation Caused by Hot Carrier Injection in a 0.8 μm-Pitch 8.3Mpixel Stacked CMOS Image Sensor

  • Calvin Yi-Ping Chao,
  • Thomas Meng-Hsiu Wu,
  • Shang-Fu Yeh,
  • Chih-Lin Lee,
  • Honyih Tu,
  • Joey Chiao-Yi Huang and
  • Chin-Hao Chang

18 September 2023

In this work, the degradation of the random telegraph noise (RTN) and the threshold voltage (Vt) shift of an 8.3Mpixel stacked CMOS image sensor (CIS) under hot carrier injection (HCI) stress are investigated. We report for the first time the signifi...

  • Review
  • Open Access
10 Citations
8,538 Views
16 Pages

4 November 2022

Hot carrier injection (HCI) can generate interface traps or oxide traps mainly by dissociating the Si-H or Si-O bond, thus affecting device performances such as threshold voltage and saturation current. It is one of the most significant reliability i...

  • Article
  • Open Access
5 Citations
2,518 Views
8 Pages

13 January 2022

Device guidelines for reducing power with punch-through current annealing in gate-all-around (GAA) FETs were investigated based on three-dimensional (3D) simulations. We studied and compared how different geometric dimensions and materials of GAA FET...

  • Article
  • Open Access
1 Citations
2,004 Views
14 Pages

13 October 2023

Many silicon-on-insulator (SOI) metal–oxide–semiconductor field-effect transistors (MOSFETs) are used in deep space detection systems because they have higher radiation resistance than bulk silicon devices. However, SOI devices have to fa...

  • Article
  • Open Access
2 Citations
4,625 Views
6 Pages

A gate all around with back-gate (GAAB) structure was proposed for 3D NAND Flash memory technology. We demonstrated the excellent characteristics of the GAAB NAND structure, especially in the self-boosting operation. Channel potential of GAAB shows a...

  • Article
  • Open Access
1,060 Views
13 Pages

Total Ionizing Dose Effects on Lifetime of NMOSFETs Due to Hot Carrier-Induced Stress

  • Yujuan He,
  • Rui Gao,
  • Teng Ma,
  • Xiaowen Zhang,
  • Xianyu Zhang and
  • Yintang Yang

This study systematically investigates the mechanism by which total ionizing dose (TID) affects the lifetime degradation of NMOS devices induced by hot-carrier injection (HCI). Experiments involved Cobalt-60 (Co-60) gamma-ray irradiation to a cumulat...

  • Communication
  • Open Access
8 Citations
3,080 Views
11 Pages

An Investigation into the Comprehensive Impact of Self-Heating and Hot Carrier Injection

  • Yan Liu,
  • Yanhua Ma,
  • Zhaojie Yu,
  • Shanshan Lou,
  • Yang Qu and
  • Yuchun Chang

1 September 2022

As the device feature size shrinks, the dissipation of power increases and further raises the carrier and lattice temperature, which finally affects device performance. In this paper, we analyze the comprehensive influence of the self-heating effect...

  • Article
  • Open Access
2 Citations
1,805 Views
18 Pages

Degradation Induced by Total Ionizing Dose and Hot Carrier Injection in SOI FinFET Devices

  • Hao Yu,
  • Wei Zhou,
  • Hongxia Liu,
  • Shulong Wang,
  • Shupeng Chen and
  • Chang Liu

11 August 2024

The working environment of electronic devices in the aerospace field is harsh. In order to ensure the reliable application of the SOI FinFET, the total ionizing dose (TID) and hot carrier injecting (HCI) reliability of an SOI FinFET were investigated...

  • Article
  • Open Access
1 Citations
1,364 Views
12 Pages

17 February 2025

Despite the advantages of fin field-effect transistors (FinFETs), there are hidden issues such as electric field enhancement and exacerbated self-heating effects, which will intensify device aging effects. Due to the escalating costs associated with...

  • Review
  • Open Access
22 Citations
12,528 Views
20 Pages

13 February 2024

The gate-all-around (GAA) nanosheet (NS) field-effect-transistor (FET) is poised to replace FinFET in the 3 nm CMOS technology node and beyond, marking the second seminal shift in device architecture across the extensive 60-plus-year history of MOSFE...

  • Article
  • Open Access
2 Citations
3,425 Views
25 Pages

2 December 2019

As semiconductor processes enter the nanoscale, system-on-chip (SoC) interconnects suffer from link aging owing to negative bias temperature instability (NBTI), hot carrier injection (HCI), and electromigration. In network-on-chip (NoC) for heterogen...

  • Article
  • Open Access
4 Citations
2,545 Views
15 Pages

The rapid progress of artificial neural networks (ANN) is largely attributed to the development of the rectified linear unit (ReLU) activation function. However, the implementation of software-based ANNs, such as convolutional neural networks (CNN),...

  • Article
  • Open Access
3 Citations
3,525 Views
14 Pages

Leakage and Thermal Reliability Optimization of Stacked Nanosheet Field-Effect Transistors with SiC Layers

  • Cong Li,
  • Yali Shao,
  • Fengyu Kuang,
  • Fang Liu,
  • Yunqi Wang,
  • Xiaoming Li and
  • Yiqi Zhuang

22 March 2024

In this work, we propose a SiC-NSFET structure that uses a PTS scheme only under the gate, with SiC layers under the source and drain, to improve the leakage current and thermal reliability. Punch-through stopper (PTS) doping is widely used to suppre...

  • Article
  • Open Access
271 Views
16 Pages

11 November 2025

Silicon-Based Physical Unclonable Functions (PUFs) exploit inherent manufacturing variations to produce a unique, random, and ideally unclonable secret key. As electronic devices are decommissioned and sent for End of Life (EOL) recycling, the encryp...

  • Article
  • Open Access
7,339 Views
23 Pages

Optimally Fortifying Logic Reliability through Criticality Ranking

  • Yu Bai,
  • Mohammed Alawad,
  • Ronald F. DeMara and
  • Mingjie Lin

13 February 2015

With CMOS technology aggressively scaling towards the 22-nm node, modern FPGA devices face tremendous aging-induced reliability challenges due to bias temperature instability (BTI) and hot carrier injection (HCI). This paper presents a novel anti-agi...