Special Issue "Advanced Thin Films Deposited by Magnetron Sputtering"

A special issue of Coatings (ISSN 2079-6412).

Deadline for manuscript submissions: 30 March 2019

Special Issue Editor

Guest Editor
Prof. Dr. Chuen-Lin Tien

Department of Electrical Engineering, Feng Chia University, Taichung 40724, Taiwan
E-Mail
Phone: +886-4-24517250 ext. 3809
Interests: optical coatings; thin film residual stress; optical interferometry; fiber-optic sensors

Special Issue Information

Dear Colleagues,

We invite researchers to submit original innovative research works to this Special Issue on "Advanced Thin Films Deposited by Magnetron Sputtering". Magnetron sputtering is an effective physical vapor deposition (PVD) method which allows the deposition of many types of materials, including metals, ceramics, alloys and compounds. Magnetron sputter deposition does not require melting and evaporation of the source material, leading to many advantages over other PVD technologies. With the development of magnetron sputtering technique, the precise control of surface physical properties is becoming increasingly critical in both fundamental scientific researches and industrial applications. The aim of this Special Issue is to highlight some of the most recent and most significant contributions to the thin-film coatings field, through a combination of original research papers and review articles from leading groups around the world.

In particular, the topics of interest include but are not limited to:

  • Key Technologies for Magnetron Sputtering
  • High Power Impulse Magnetron Sputtering (HiPIMS)
  • Modulated Pulse Power  Magnetron Sputtering
  • Multilayer Coatings and Nano-Coating Applications
  • Novel Transparent Oxide Films Grown by Magnetron Sputtering Techniques
  • Optical and Mechanical Properties of Magnetron Sputtering Films
  • Nanostructured Features of Advanced Thin Film Materials

Prof. Dr. Chuen-Lin Tien
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1200 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Published Papers (3 papers)

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Research

Open AccessArticle Magnetic Properties and Microstructure of FePt(BN, Ag, C) Films
Coatings 2018, 8(10), 358; https://doi.org/10.3390/coatings8100358
Received: 24 August 2018 / Revised: 1 October 2018 / Accepted: 4 October 2018 / Published: 9 October 2018
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Abstract
The microstructure and magnetic properties of FePt(BN, Ag, C) granular films grown on the MgTiON intermediate layer with and without the MoC inserting layer were studied. Without the MoC inserting layer, the 6 nm thick FePt film is continuous, which favors the domain
[...] Read more.
The microstructure and magnetic properties of FePt(BN, Ag, C) granular films grown on the MgTiON intermediate layer with and without the MoC inserting layer were studied. Without the MoC inserting layer, the 6 nm thick FePt film is continuous, which favors the domain wall motion magnetization reversal process and shows a lower out-of-plane coercivity (Hc) value of 6.7 kOe. The FePt(BN, Ag, C) granular film was grown in ball- and square-like grains with an almost vertical contact angle, and the out-of-plane coercivity (Hc) was increased to 15.5 kOe. When the MoC with a thickness of 3 nm was capped on the MgTiON intermediate layer, the FePt grains with and without (BN, Ag, C) segregants were both formed in large trapezoidal islands with a low contact angle morphology. The out-of-plane Hc value changed from 14.9 to 13.2 kOe and the reduced coercivity was due to larger grain sizes and a lower ordering degree of the FePt(BN, Ag, C) film. Full article
(This article belongs to the Special Issue Advanced Thin Films Deposited by Magnetron Sputtering)
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Open AccessArticle Mechanical Properties and Oxidation Behavior of Multilayered Hf–Si–N Coatings
Coatings 2018, 8(10), 354; https://doi.org/10.3390/coatings8100354
Received: 6 September 2018 / Revised: 21 September 2018 / Accepted: 2 October 2018 / Published: 3 October 2018
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Abstract
Monolithic Hf–Si–N coatings and multilayered Hf–Si–N coatings with cyclical gradient concentration were fabricated using reactive direct current magnetron cosputtering. The structure of the Hf–Si–N coatings varied from a crystalline HfN phase, to a mixture of HfN and amorphous phases and to an amorphous
[...] Read more.
Monolithic Hf–Si–N coatings and multilayered Hf–Si–N coatings with cyclical gradient concentration were fabricated using reactive direct current magnetron cosputtering. The structure of the Hf–Si–N coatings varied from a crystalline HfN phase, to a mixture of HfN and amorphous phases and to an amorphous phase with continuously increasing the Si content. The multilayered Hf48Si3N49 coatings exhibited a mixture of face-centered cubic and near-amorphous phases with a maximal hardness of 22.5 GPa, a Young’s modulus of 244 GPa and a residual stress of −1.5 GPa. The crystalline phase-dominant coatings exhibited a linear relationship between the hardness and compressive residual stress, whereas the amorphous phase-dominant coatings exhibited a low hardness level of 15–16 GPa; this hardness is close to that of Si3N4. Various oxides were formed after annealing of the Hf–Si–N coatings at 600 °C in a 1% O2–99% Ar atmosphere. Monoclinic HfO2 formed after Hf54N46 annealing and amorphous oxide formed for the oxidation-resistant Hf32Si19N49 coatings. The oxidation behavior with respect to the Si content was investigated by using transmission electron microscopy and X-ray photoelectron spectroscopy. Full article
(This article belongs to the Special Issue Advanced Thin Films Deposited by Magnetron Sputtering)
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Open AccessArticle Surface Analysis and Optical Properties of Cu-Doped ZnO Thin Films Deposited by Radio Frequency Magnetron Sputtering
Coatings 2018, 8(8), 266; https://doi.org/10.3390/coatings8080266
Received: 19 June 2018 / Revised: 16 July 2018 / Accepted: 29 July 2018 / Published: 31 July 2018
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Abstract
In this study, Cu-doped ZnO (CZO) thin films were grown on glass substrates by using the radio frequency magnetron sputtering technique. The effects of Cu doping on the structural, surface morphological, optical properties, and wettability behaviors of CZO thin films were investigated by
[...] Read more.
In this study, Cu-doped ZnO (CZO) thin films were grown on glass substrates by using the radio frequency magnetron sputtering technique. The effects of Cu doping on the structural, surface morphological, optical properties, and wettability behaviors of CZO thin films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), UV-Visible spectroscopy, and contact angle measurement, respectively. The XRD results indicated that all CZO thin films were textured, having a preferential crystallographic orientation along the hexagonal wurtzite (002) axis. The average transmittance in the visible wavelength region was above 80% for all CZO thin films. The optical band gap of the CZO films decreased from 3.18 to 2.85 eV when the Cu-doping was increased from 2% to 10%. In addition, the water contact angle measurements were carried out to delineate the Cu-doping effects on the changes in the surface energy and wettability of the films. Full article
(This article belongs to the Special Issue Advanced Thin Films Deposited by Magnetron Sputtering)
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