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Advanced Coating Technology by Physical Vapor Deposition and Applications, 2nd...
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Advanced Coating Technology by Physical Vapor Deposition and Applications, 2nd Edition

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".

Deadline for manuscript submissions: 15 August 2026 | Viewed by 809

Special Issue Editor

Prof. Dr. Chuen-Lin Tien

E-Mail Website
Guest Editor
Department of Electrical Engineering, Feng Chia University, Taichung 40724, Taiwan
Interests: optical design; optical thin film; residual stress; optical interferometry; fiber-optic sensors
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Physical vapor deposition (PVD) is widely used for the preparation of thin films and surface coatings and has been extensively utilized in industry and combined with different methods to produce film components with excellent performance. Uniform PVD coatings provide hard surfaces that can be applied to a variety of materials and substrates, and PVD can facilitate the formation of multilayer, composite, and oblique coatings and unique structures. Furthermore, the PVD multilayered film structure can improve oxidation resistance, mechanical properties, and fracture toughness and reduce internal stress and crack propagation. We would like to invite you to contribute an original paper to this Special Issue. Topics of interest include (but are not limited to) the following:

- Thin-film coating techniques;
- The characterization of thin films for micro-components;
- Advanced sputtering coatings;
- Multilayer thin-film preparation and applications;
- Novel PVD coating techniques;
- Optical interference coatings;
- Mechanical stress in thin films and coatings;
- Simulation and modeling in PVD processes.

Prof. Dr. Chuen-Lin Tien
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 250 words) can be sent to the Editorial Office for assessment.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • physical vapor deposition
  • coating technology
  • thin film
  • multilayer coatings
  • optical interference coatings
  • sputtering
  • evaporation

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Related Special Issue

Published Papers (1 paper)

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Research

22 pages, 6305 KB  
Article
Effects of Si Target Power on the Mechanical Properties and Antioxidation and Antiablation Properties of Magnetron-Sputtered (WMoTaNb)SiN Refractory High-Entropy Nitride Films
by Xiangyu Wu, Shangkun Wu, Wenting Shao, Jian Chen and Wei Yang
Coatings 2026, 16(3), 309; https://doi.org/10.3390/coatings16030309 - 2 Mar 2026
Viewed by 446
Abstract
(WMoTaNb)SiN refractory high-entropy nitride films were deposited via magnetron cosputtering, and the Si content was systematically regulated by varying the Si target power to investigate its influence on the microstructure, mechanical properties, oxidation resistance, and oxyhydrogen-flame ablation behavior. All the films exhibited dense [...] Read more.
(WMoTaNb)SiN refractory high-entropy nitride films were deposited via magnetron cosputtering, and the Si content was systematically regulated by varying the Si target power to investigate its influence on the microstructure, mechanical properties, oxidation resistance, and oxyhydrogen-flame ablation behavior. All the films exhibited dense columnar architectures with a distinct FCC + BCC dual-phase structure, whereas increasing the Si target power led to a gradual increase in the deposition rate and Si incorporation. The mechanical properties displayed a non-monotonic relationship with the Si target power, with film applied at an intermediate level of Si target power showing the highest hardness, approximately 28.5 GPa, and improved elastic recovery. Tribological evaluations using a GCr15 steel ball revealed that this film exhibited the lowest wear rate of 4.1 × 10−6 mm3·N−1·m−1 and a narrower wear track, which was attributed to reduced plastic deformation and the development of an oxygen-enriched tribofilm during sliding. High-temperature oxidation at 1000 °C in air revealed that Si incorporation significantly modified oxide-scale evolution by refining the oxidation products and altering the scale architecture, while the protection of the scale was governed by its continuity and compactness rather than its thickness alone. Oxyhydrogen-flame ablation tests revealed that the degradation behavior was primarily driven by the competition between oxidation-induced mass increase and ablation-induced material loss, with localized film disruption and substrate exposure playing a decisive role. In summary, the findings illustrate that an optimal Si target power establishes a favorable equilibrium between mechanical strength, tribological efficiency, oxidation resistance, and ablation performance, underscoring the potential of (WMoTaNb)SiN films for protective applications in complex mechanical and extreme thermal environments. Full article
(This article belongs to the Special Issue Advanced Coating Technology by Physical Vapor Deposition and Applications, 2nd Edition)
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