Physical Vapor Deposition Multilayer Thin Films for Photoelectric Devices

Dear Colleagues,

We would like to invite you to submit your work to this Special Issue on “Physical Vapor Deposition Multilayer Thin Films for Photoelectric Devices.” Physical vapor deposition (PVD) is used for a thin-film or multilayer coating process which produces coatings of pure metals, metallic oxides, metallic alloys, and ceramics with a thickness usually in the range of a few nanometers to several micrometers. The two most common PVD processes are thermal evaporation and sputtering. Thermal evaporation is a kind of deposition technology that depends on heating the source material in vacuum with appropriate methods to make it evaporate. Sputtering is a plasma-assisted technique that produces vapor from a source target by accelerating the bombardment of gaseous ions (typically argon). PVD is used in a variety of applications, including the fabrication of photoelectronic devices, optical interference filters, thin film sensors, microelectronic devices, light-emitting devices, fuel cell electrodes, nanostructured smart window coatings, optical and conductive coatings, decorative coatings, deposition optimization, surface modifications, etc. The PVD multilayered film structure is beneficial for improving oxidation resistance, enhancing mechanical properties, reducing internal stress, inhibiting crack propagation, and improving fracture toughness.

This Special Issue is seeking original and review articles presented by the leading groups and scientists of the world scientific community in the field of PVD multilayer coating technologies. The novel PVD multilayer processes and the results of their application are intended to be covered in the Special Issue.

Prof. Dr. Chuen-Lin Tien
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the Special Issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 250 words) can be sent to the Editorial Office for assessment.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-anonymized peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.