Physical Vapor Deposition Multilayer Thin Films for Photoelectric Devices
A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".
Deadline for manuscript submissions: closed (30 June 2022) | Viewed by 8327
Special Issue Editor
Interests: optical design; optical thin film; residual stress; optical interferometry; fiber-optic sensors
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
We would like to invite you to submit your work to this Special Issue on “Physical Vapor Deposition Multilayer Thin Films for Photoelectric Devices.” Physical vapor deposition (PVD) is used for a thin-film or multilayer coating process which produces coatings of pure metals, metallic oxides, metallic alloys, and ceramics with a thickness usually in the range of a few nanometers to several micrometers. The two most common PVD processes are thermal evaporation and sputtering. Thermal evaporation is a kind of deposition technology that depends on heating the source material in vacuum with appropriate methods to make it evaporate. Sputtering is a plasma-assisted technique that produces vapor from a source target by accelerating the bombardment of gaseous ions (typically argon). PVD is used in a variety of applications, including the fabrication of photoelectronic devices, optical interference filters, thin film sensors, microelectronic devices, light-emitting devices, fuel cell electrodes, nanostructured smart window coatings, optical and conductive coatings, decorative coatings, deposition optimization, surface modifications, etc. The PVD multilayered film structure is beneficial for improving oxidation resistance, enhancing mechanical properties, reducing internal stress, inhibiting crack propagation, and improving fracture toughness.
This Special Issue is seeking original and review articles presented by the leading groups and scientists of the world scientific community in the field of PVD multilayer coating technologies. The novel PVD multilayer processes and the results of their application are intended to be covered in the Special Issue.
Prof. Dr. Chuen-Lin Tien
Guest Editor
Manuscript Submission Information
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Keywords
- various PVD coating techniques
- advanced sputtering coatings
- nano-structured coatings
- HiPIMS technique and applications
- ultra-violet/Visible /Infrared coatings
- novel coating techniques
- optical interference coatings
- functional coatings
- decorative coatings
- PVD coating applications
- residual stress analysis in PVD coatings
- simulation in PVD processes
- uniformity simulation in PVD coatings
- multi-layer thin film coatings
- reviews on PVD coating techniques
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