Coatings, Volume 15, Issue 10
2025 October - 119 articles
Cover Story: Advancing sustainable surface engineering is essential for next-generation energy harvesting, conversion, and storage technologies. This study presents a PFAS-free, water-developable photoresist derived from renewable sugar-based polymers, offering an environmentally responsible approach to lithographic surface engineering. By eliminating the need for organic solvents, the material enables microfabrication under environmentally benign and sustainable conditions while maintaining high resolution and sensitivity. This approach demonstrates a pathway toward circular, low-impact manufacturing. Such solvent-free, water-developable photolithography expands the potential for eco-conscious micro- and nanostructuring, supporting the transition toward greener surface technologies for energy harvesting, conversion, and storage systems. View this paper - Issues are regarded as officially published after their release is announced to the table of contents alert mailing list .
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