- Article
Chemical Composition, Structure, and Physical Properties of AlN Films Produced via Pulsed DC Reactive Magnetron Sputtering
- Vladimir R. Shayapov,
- Alena L. Bogoslovtseva,
- Sergey Yu. Chepkasov,
- Igor P. Asanov,
- Evgeny A. Maksimovskiy,
- Aleksandr V. Kapishnikov,
- Maria I. Mironova,
- Alina V. Lapega and
- Pavel V. Geydt
The chemical composition, structure, and physical properties of aluminum nitride (AlN) films obtained using pulsed DC reactive magnetron sputtering in asymmetric bipolar mode have been studied. X-ray diffraction and electron diffraction confirmed the...

