Plasma Processing of Nanomaterials

Dear Colleagues,

Plasma Enhanced Deposition and/or Growth of nanomaterial films is the subject of this Special Issue. Substrates and deposited layers are solid at room temperature and can be either amorphous, polycrystalline or single-crystal, one-dimensional nanomaterials.  In general, the advantage of using Plasma Enhanced Deposition techniques are their lower process temperatures, which reduce unwanted impurity diffusion and unwanted reactions between components of the substrate or deposited layers.  They can also increase the deposition rate through the production of reactive species that are the precursors to film growth.  Plasma can also produce reactive species such as H free radicals, which can modify the growth surface to enhance the surface mobility of adatom species.  The ionic bombardment of the growth surface may also help to desorb chemical species that are impeding the adsorption and growth of the material film. These physical and chemical processes permit the deposition of new and improved electronic, optical and mechanical micro- and nanoscale devices.

This Special Issue aims to cover recent progress in the fabrication, material processing, resulting properties, and applications of micro- and nano-scale devices. Potential topics include, but are not limited to, the following:

• Various processing strategies and characterization methods of new and existing microelectronic materials;
• Transient and steady-state responses of optical, magnetic, electronic and catalytic properties;
• Various applications in optoelectronics, photovoltaics, biomedicine and quantum information processing.

Prof. Dr. Walter Varhue
Dr. Son Van Nguyen
Guest Editors

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