Special Issue "Advanced Techniques for Ultrafast Laser Nano/Micro Patterning"

A special issue of Micromachines (ISSN 2072-666X).

Deadline for manuscript submissions: 15 December 2020.

Special Issue Editors

Dr. Cyril Mauclair
Website
Guest Editor
Hubert Curien Laboratory, Jean Monnet University, 18 Rue Professeur Benoît Lauras, 42100 Saint-Etienne, France
Interests: ultrafast laser surface machining; spatial beam shaping; ultrafast laser bulk machining; temporal pulse shaping
Dr. Xxx Sedao
Website
Guest Editor
Hubert Curien Laboratory, Jean Monnet University, 18 Rue Professeur Benoît Lauras, 42100 Saint-Etienne, France
Interests: surface functionalization; laser induced periodic surface structures (LIPSS); lasers for biomimetics; surface characterization

Special Issue Information

Dear Colleagues,

Ultrafast lasers are becoming a powerful tool for surface and bulk processing at the micro- and nanometric realms. The recent developments of ultrashort laser sources towards higher-power, higher-repetition rates, enhanced robustness with reduced costs make ultrafast laser processing an enabling technology for a vast variety of applications where the low onset of thermal side effects associated with these ultrafast timescales is a key advantage. Notwithstanding successful examples in, e.g., the renewable energy, telecommunication, and biomedical fields, the horizon of ultrafast laser applications can still be extended if the full potential of ultrafast laser pulses can offer is taken advantage of. To this extent, advanced light control techniques are required to master the interactions between ultrafast laser light and the material being illuminated.

This Special Issue “Advanced Techniques for Ultrafast Laser Nano/Micro Patterning” of Micromachines seeks to showcase research papers, short communications, and review articles that focus on advanced techniques for the control of ultrashort laser pulses that lead to more advanced laser–material interaction control, and hence, better performances for micro/nanopatterning. We hope that the papers will encompass the next key technological leaps that will further extend applications of femtosecond laser pulses. Suitable contributions can be related but are not restricted to, for instance, spatial and temporal laser shaping, polarization/wavelength and pulse duration control, tuning of pulse overlap, repetition rate and burst parameters, and combination with other processing means (etching, longer laser pulses, etc.).

Dr. Cyril Mauclair
Dr. Xxx Sedao
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Micromachines is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • ultrafast laser processing
  • temporal/spatial beam shaping
  • polarization control
  • burst mode
  • micro/nano patterning

Published Papers (1 paper)

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Research

Open AccessArticle
Performance and Accuracy of the Shifted Laser Surface Texturing Method
Micromachines 2020, 11(5), 520; https://doi.org/10.3390/mi11050520 - 20 May 2020
Abstract
A shifted laser surface texturing method (sLST) was developed for the improvement of the production speed of functional surface textures to enable their industrial applicability. This paper compares the shifted method to classic methods using a practical texturing example, with a focus on [...] Read more.
A shifted laser surface texturing method (sLST) was developed for the improvement of the production speed of functional surface textures to enable their industrial applicability. This paper compares the shifted method to classic methods using a practical texturing example, with a focus on delivering the highest processing speed. The accuracy of the texture is assessed by size and circularity measurements with the use of LabIR paint and by a depth profile measurement using a contact surface profiler. The heat accumulation temperature increase and laser usage efficiency were also calculated. The classic methods (path filling and hatch) performed well (deviation ≤ 5%) up to a certain scanning speed (0.15 and 0.7 m/s). For the shifted method, no scanning speed limit was identified within the maximum of the system (8 m/s). The depth profile shapes showed similar deviations (6% to 10%) for all methods. The shifted method in its burst variant achieved the highest processing speed (11 times faster, 146 mm2/min). The shifted method in its path filling variant achieved the highest processing efficiency per needed laser power (64 mm2/(min·W)), lowest heat accumulation temperature increase (3 K) and highest laser usage efficiency (99%). The advantages of the combination of the shifted method with GHz burst machining and the multispot approach were described. Full article
(This article belongs to the Special Issue Advanced Techniques for Ultrafast Laser Nano/Micro Patterning)
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