Steep Switching Field Effect Transistor

A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "E:Engineering and Technology".

Deadline for manuscript submissions: closed (1 October 2021) | Viewed by 5943

Special Issue Editors


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Guest Editor
Department of Electronic Engineering, Myongji University, Yongin 17046, Republic of Korea
Interests: tunneling transistors; semiconductor memory devices; 3D transistors

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Guest Editor
Department of Electrical and Computer Engineering, Ajou University, Suwon 16499, Korea
Interests: design, fabrication, measurement, characterization, and modeling of nanoscale CMOS/CMOS compatible devices; neuromorphic devices

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Guest Editor
Department of Electronic Engineering, Myongji University, Yongin 17046, Korea
Interests: CMOS compatible devices; capacitor-less 1T DRAMs; GaN-based LEDs; CMOS image sensors

Special Issue Information

Dear Colleagues,

The various steep-switching devices, including tunneling field-effect transistors (FETs), negative capacitance FETs, feedback FETs, and nano-electromechanical FETs, have been explored in efforts to reduce the dynamic power and to improve the operation speed. The devices can overcome the switching limit of the MOSFET with the different operating mechanisms and/or the improved gate-to-channel coupling. Despite the theoretical advantages, various technical issues still exist in each steep-switching FET, and innovative solutions are required. In this Special Issue, we focus on the development of steep-switching devices for various applications such as components of logic circuits or neuromorphic circuits, memory devices, and sensors. Articles, short communications, and review articles that cover a broad range of possible topics, including fabrication, modeling, characterization, and simulation, are all welcomed. All submissions will be reviewed in accordance with the conventional procedures of Micromachines.

Prof. Dr. Ilhwan Cho
Prof. Dr. Sangwan Kim
Prof. Dr. Garam Kim
Guest Editors

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Keywords

  • Tunneling field-effect transistor
  • Feedback field-effect transistor
  • Negative capacitance field-effect transistor
  • Nano-electro-mechanical field-effect transistor

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Published Papers (2 papers)

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Research

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11 pages, 13946 KiB  
Article
Optimization of Feedback FET with Asymmetric Source Drain Doping Profile
by Inyoung Lee, Hyojin Park, Quan The Nguyen, Garam Kim, Seongjae Cho and Ilhwan Cho
Micromachines 2022, 13(4), 508; https://doi.org/10.3390/mi13040508 - 25 Mar 2022
Cited by 2 | Viewed by 2289
Abstract
A feedback field-effect transistor (FBFET) is a novel device that uses a positive feedback mechanism. FBFET has a high on-/off ratio and is expected to realize ideal switching characteristics through steep changes from off-state to on-state. In this paper, we propose and optimize [...] Read more.
A feedback field-effect transistor (FBFET) is a novel device that uses a positive feedback mechanism. FBFET has a high on-/off ratio and is expected to realize ideal switching characteristics through steep changes from off-state to on-state. In this paper, we propose and optimize FBFET devices with asymmetric source/drain doping concentrations. Additionally, we discuss the changes in electrical characteristics across various channel length and channel thickness conditions and compare them with those of FBFET with a symmetric source/drain. This shows that FBFET with an asymmetric source/drain has a higher on-/off ratio than FBFET with a symmetric source/drain. Full article
(This article belongs to the Special Issue Steep Switching Field Effect Transistor)
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Review

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30 pages, 15488 KiB  
Review
A Review of Sharp-Switching Band-Modulation Devices
by Sorin Cristoloveanu, Joris Lacord, Sébastien Martinie, Carlos Navarro, Francisco Gamiz, Jing Wan, Hassan El Dirani, Kyunghwa Lee and Alexander Zaslavsky
Micromachines 2021, 12(12), 1540; https://doi.org/10.3390/mi12121540 - 11 Dec 2021
Cited by 3 | Viewed by 2917
Abstract
This paper reviews the recently-developed class of band-modulation devices, born from the recent progress in fully-depleted silicon-on-insulator (FD-SOI) and other ultrathin-body technologies, which have enabled the concept of gate-controlled electrostatic doping. In a lateral PIN diode, two additional gates can construct a reconfigurable [...] Read more.
This paper reviews the recently-developed class of band-modulation devices, born from the recent progress in fully-depleted silicon-on-insulator (FD-SOI) and other ultrathin-body technologies, which have enabled the concept of gate-controlled electrostatic doping. In a lateral PIN diode, two additional gates can construct a reconfigurable PNPN structure with unrivalled sharp-switching capability. We describe the implementation, operation, and various applications of these band-modulation devices. Physical and compact models are presented to explain the output and transfer characteristics in both steady-state and transient modes. Not only can band-modulation devices be used for quasi-vertical current switching, but they also show promise for compact capacitorless memories, electrostatic discharge (ESD) protection, sensing, and reconfigurable circuits, while retaining full compatibility with modern silicon processing and standard room-temperature low-voltage operation. Full article
(This article belongs to the Special Issue Steep Switching Field Effect Transistor)
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