Journal Menu► ▼ Journal Menu
Journal Browser► ▼ Journal Browser
Special Issue "Sputtering Technologies for Growth of Advanced Thin Film"
Deadline for manuscript submissions: closed (10 September 2019).
Assoc. Prof. Robert Bogdanowicz Website E-Mail
Department of Metrology and Optoelectronics, Faculty of Electronics, Telecommunications and Informatics Gdansk University of Technology, Gdansk, Poland
Interests: CVD diamond; doped nanocarbons; electrochemical and optical sensors; conductive oxides; optical properties
Sputtering technologies were established decades ago as an effective tool for the deposition of thin films. Sputtering deposition includes a wide spectra of methods, utilizing eroded material from solid matter, which subsequently condensate onto a substrate forming thin films. Namely, magnetron sputtering and hollow cathode jets, operated either in continuous or pulse mode, represent most frequently used tools for deposition of unique, functional surfaces in research laboratories, as well as in industry. Due to the high versatility and rather easy construction, sputterings systems have become outstanding devices for research of thin films and functional surfaces. Advanced, nanostructured and functional surfaces have gained enormous importance in many (energy conversion, sensors, and enhanced detection, optical, bio-medical) applications. Furthermore, we can point out protective coatings, materials for the semiconductor industry, hydrophobic/hydrophilic structures, optics or unique catalytical devices. All these stimulate improving the current state-of-the-art and encourage looking for new methods, possibilities, and ideas. Challenging nanostructured surfaces, produced as laterally homogeneous films, ultra-thin 2D atom-aggregates and/or nanoparticles (of size 10 – 100 nm) incorporated into a material matrix, bring another novel dimension of the matter. In this exciting path of science, sputtering techniques, due to their physical principle, are typically first on the list for the research and tailoring of advanced thin films; often supported by computer modeling and simulations.
For these reasons, numerous interesting outputs, gained during the recent material research, should be spread to the community. It is our pleasure to invite you to submit a manuscript to this Special Issue, focused on “Sputtering Technologies for Growth of Advanced Thin Films”. Full papers, communications, and reviews on the fabrication, properties, and applications of thin films, prepared by means of sputtering films, are all welcome. Further, we would appriciate contributions focused on advanced sputtering deposition systems (hybrid systems, co-deposition of aloys or multistructured films, combined PVD and PECVD) together with tailoring of film growth, including plasma diagnostics.
Assoc. Prof. Vitezslav Stranak
Assoc. Prof. Robert Bogdanowicz
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1800 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
- hollow cathode jet
- thin films
- nanostructured surfaces
- core-shell nanoparticles
- thin film processing
- surface analyzes
- sputtering and deposition systems
- surface modification