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Micro-nano Optical Structure Materials and Their Applications

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Optical and Photonic Materials".

Deadline for manuscript submissions: 20 July 2024 | Viewed by 947

Special Issue Editor


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Guest Editor
College of Physics and Optoelectronics, Taiyuan University of Technology, Taiyuan 030024, China
Interests: low-cost photodetectors based on organic and perovskite materials; nanostructure local photomodulation; new mechanisms and preparation technology for nano-phototrapping structures; nanostructure-enhanced ultra-thin organic photovoltaic devices; nanostructure-enhanced perovskite optoelectronic devices

Special Issue Information

Dear Colleagues,

Micro-nano optical structures—which rely on local resonance, electromagnetic field enhancement, the slow-light effect, and so on—could effectively manipulate the interaction characteristics between light and matter (such as atoms, molecules, quantum dots, and nonlinear materials). This concept finds extensive applications in photon integration, sensitive signal detection and recognition, biochemical sensing, super-resolution microscopic imaging, efficient solar cell and light-emitting device development, advancements in disease diagnosis and treatment, environmental monitoring practices, and many other crucial domains.

As an underlying component in solar cells or other optoelectronic devices, micro-nano structural materials give these devices unique optical, electrical, and mechanical properties, and provide a way to develop new and functional flexible photonic and electronic devices. This way of optimizing the structure of photoelectric devices can result in a change in the refractive index gradient at their window layer, which can effectively inhibit reflection and generate surface plasmon resonance near the metal structure. Ultimately, this can enhance light absorption and, importantly, lead to improvements to the overall performance of the photoelectric device.

By constructing isoplasmon heterogeneous nanostructures, plasmon materials with a highly efficient light capture ability (and their interaction with neighbouring materials), could enhance the energy conversion efficiency of photon-electrons and photon–chemical interactions in photovoltaic and photocatalysis processes and optical processes in a variety of linear (fluorescence) and nonlinear (second harmonic, multi-photon emission) manners. The introduction of micro-nano structures into metal halide perovskites can further improve their photoelectric performance and chemical and environmental stability. Further, micro-nano structures can enhance the optical absorption band gap effect through their anti-reflection properties, scattering enhancement, resonance mode, and PC light-trapping strategies.

Prof. Dr. Yanxia Cui
Guest Editor

Manuscript Submission Information

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Keywords

  • surface plasmon
  • photodetector
  • perovskite
  • micro- and nano-scale optical structures
  • imaging device

Published Papers (1 paper)

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Research

12 pages, 4295 KiB  
Article
A High-Efficiency Wideband Grating Coupler Based on Si3N4 and a Silicon-on-Insulator Heterogeneous Integration Platform
by Meng Liu, Xu Zheng, Xuan Zheng and Zisu Gong
Materials 2024, 17(4), 947; https://doi.org/10.3390/ma17040947 - 18 Feb 2024
Viewed by 808
Abstract
To fully utilize the advantages of Si3N4 and Silicon-On-Insulator to achieve a high-efficiency wideband grating coupler, we propose and numerically demonstrate a grating coupler based on Si3N4 and a Silicon-On-Insulator heterogeneous integration platform. A two-dimensional model of [...] Read more.
To fully utilize the advantages of Si3N4 and Silicon-On-Insulator to achieve a high-efficiency wideband grating coupler, we propose and numerically demonstrate a grating coupler based on Si3N4 and a Silicon-On-Insulator heterogeneous integration platform. A two-dimensional model of the coupler was established and a comprehensive finite difference time domain analysis was conducted. Focusing on coupling efficiency as a primary metric, we examined the impact of factors such as grating period, filling factor, etching depth, and the thicknesses of the SiO2 upper cladding, Si3N4, silicon waveguide, and SiO2 buried oxide layers. The calculations yielded an optimized grating coupler with a coupling efficiency of 81.8% (−0.87 dB) at 1550 nm and a 1-dB bandwidth of 540 nm. The grating can be obtained through a single etching step with a low fabrication complexity. Furthermore, the fabrication tolerances of the grating period and etching depth were studied systematically, and the results indicated a high fabrication tolerance. These findings can offer theoretical and parameter guidance for the design and optimization of high-efficiency and broad-bandwidth grating couplers. Full article
(This article belongs to the Special Issue Micro-nano Optical Structure Materials and Their Applications)
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