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Search Results (784)

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Keywords = GaN-on-Si

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13 pages, 8060 KiB  
Article
Microstructural, Mechanical, and Thermal Properties of Textured Si3N4/BN Composite Ceramics Prepared Using Two-Step Sintering
by Dexiang Gong, Yi Zhou, Yunwei Shi and Qianglong He
Materials 2025, 18(15), 3573; https://doi.org/10.3390/ma18153573 - 30 Jul 2025
Viewed by 223
Abstract
Textured Si3N4/BN composite ceramics were successfully fabricated using two-step sintering, combining pseudo-hot isostatic pressing (PHIP) and gas pressure sintering. The grain size of h-BN platelets had a significant influence on densification and mechanical and thermal properties. With an increase [...] Read more.
Textured Si3N4/BN composite ceramics were successfully fabricated using two-step sintering, combining pseudo-hot isostatic pressing (PHIP) and gas pressure sintering. The grain size of h-BN platelets had a significant influence on densification and mechanical and thermal properties. With an increase in h-BN grain size, the volume density of the composite ceramics gradually decreased, while flexural strength gradually increased. Meanwhile, larger h-BN platelets were more likely to trigger toughening mechanisms like large-angle deflection and greatly increase fracture toughness. Through proper selection of h-BN grain size, textured ceramics, with the addition of h-BN platelets of 1–2 μm, showed high thermal conductivity (∼92 W∙m−1∙K−1) and reliable mechanical properties (∼540 MPa, ∼7.5 MPa∙m1/2, ∼11.1 GPa). Therefore, texture control is an effective means of improving the overall performance of ceramic materials. Novel textured composite ceramics thus have great potential in large-scale fabrication and directional heat dissipation applications. Full article
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21 pages, 11260 KiB  
Article
GaN HEMT Oscillators with Buffers
by Sheng-Lyang Jang, Ching-Yen Huang, Tzu Chin Yang and Chien-Tang Lu
Micromachines 2025, 16(8), 869; https://doi.org/10.3390/mi16080869 - 28 Jul 2025
Viewed by 238
Abstract
With their superior switching speed, GaN high-electron-mobility transistors (HEMTs) enable high power density, reduce energy losses, and increase power efficiency in a wide range of applications, such as power electronics, due to their high breakdown voltage. GaN-HEMT devices are subject to long-term reliability [...] Read more.
With their superior switching speed, GaN high-electron-mobility transistors (HEMTs) enable high power density, reduce energy losses, and increase power efficiency in a wide range of applications, such as power electronics, due to their high breakdown voltage. GaN-HEMT devices are subject to long-term reliability due to the self-heating effect and lattice mismatch between the SiC substrate and the GaN. Depletion-mode GaN HEMTs are utilized for radio frequency applications, and this work investigates three wide-bandgap (WBG) GaN HEMT fixed-frequency oscillators with output buffers. The first GaN-on-SiC HEMT oscillator consists of an HEMT amplifier with an LC feedback network. With the supply voltage of 0.8 V, the single-ended GaN oscillator can generate a signal at 8.85 GHz, and it also supplies output power of 2.4 dBm with a buffer supply of 3.0 V. At 1 MHz frequency offset from the carrier, the phase noise is −124.8 dBc/Hz, and the figure of merit (FOM) of the oscillator is −199.8 dBc/Hz. After the previous study, the hot-carrier stressed RF performance of the GaN oscillator is studied, and the oscillator was subject to a drain supply of 8 V for a stressing step time equal to 30 min and measured at the supply voltage of 0.8 V after the step operation for performance benchmark. Stress study indicates the power oscillator with buffer is a good structure for a reliable structure by operating the oscillator core at low supply and the buffer at high supply. The second balanced oscillator can generate a differential signal. The feedback filter consists of a left-handed transmission-line LC network by cascading three unit cells. At a 1 MHz frequency offset from the carrier of 3.818 GHz, the phase noise is −131.73 dBc/Hz, and the FOM of the 2nd oscillator is −188.4 dBc/Hz. High supply voltage operation shows phase noise degradation. The third GaN cross-coupled VCO uses 8-shaped inductors. The VCO uses a pair of drain inductors to improve the Q-factor of the LC tank, and it uses 8-shaped inductors for magnetic coupling noise suppression. At the VCO-core supply of 1.3 V and high buffer supply, the FOM at 6.397 GHz is −190.09 dBc/Hz. This work enhances the design techniques for reliable GaN HEMT oscillators and knowledge to design high-performance circuits. Full article
(This article belongs to the Special Issue Research Trends of RF Power Devices)
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21 pages, 3300 KiB  
Article
Catalytic Ozonation of Nitrite in Denitrification Wastewater Based on Mn/ZSM-5 Zeolites: Catalytic Performance and Mechanism
by Yiwei Zhang, Yulin Sun, Yanqun Zhu, Wubin Weng, Yong He and Zhihua Wang
Processes 2025, 13(8), 2387; https://doi.org/10.3390/pr13082387 - 27 Jul 2025
Viewed by 345
Abstract
In wet flue gas desulfurization and denitrification processes, nitrite accumulation inhibits denitrification efficiency and induces secondary pollution due to its acidic disproportionation. This study developed a Mn-modified ZSM-5 zeolite catalyst, achieving efficient resource conversion of nitrite in nitrogen-containing wastewater through an O3 [...] Read more.
In wet flue gas desulfurization and denitrification processes, nitrite accumulation inhibits denitrification efficiency and induces secondary pollution due to its acidic disproportionation. This study developed a Mn-modified ZSM-5 zeolite catalyst, achieving efficient resource conversion of nitrite in nitrogen-containing wastewater through an O3 + Mn/ZSM-5 catalytic system. Mn/ZSM-5 catalysts with varying SiO2/Al2O3 ratios (prepared by wet impregnation) were characterized by BET, XRD, and XPS. Experimental results demonstrated that Mn/ZSM-5 (SiO2/Al2O3 = 400) exhibited a larger specific surface area, enhanced adsorption capacity, abundant surface Mn3+/Mn4+ species, hydroxyl oxygen species, and chemisorbed oxygen, leading to superior oxidation capability and catalytic activity. Under the optimized conditions of reaction temperature = 40 °C, initial pH = 4, Mn/ZSM-5 dosage = 1 g/L, and O3 concentration = 100 ppm, the NO2 oxidation efficiency reached 94.33%. Repeated tests confirmed that the Mn/ZSM-5 catalyst exhibited excellent stability and wide operational adaptability. The synergistic effect between Mn species and the zeolite support significantly improved ozone utilization efficiency. The O3 + Mn/ZSM-5 system required less ozone while maintaining high oxidation efficiency, demonstrating better cost-effectiveness. Mechanism studies revealed that the conversion pathway of NO2 followed a dual-path catalytic mechanism combining direct ozonation and free radical chain reactions. Practical spray tests confirmed that coupling the Mn/ZSM-5 system with ozone oxidation flue gas denitrification achieved over 95% removal of liquid-phase NO2 byproducts without compromising the synergistic removal efficiency of NOx/SO2. This study provided an efficient catalytic solution for industrial wastewater treatment and the resource utilization of flue gas denitrification byproducts. Full article
(This article belongs to the Special Issue Processes in 2025)
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19 pages, 3636 KiB  
Article
A High-Efficiency GaN-on-Si Power Amplifier Using a Rapid Dual-Objective Optimization Method for 5G FR2 Applications
by Lin Peng, Zuxin Ye, Yawen Zhang, Chenxuan Zhang, Yuda Fu, Jian Qin and Yuan Liang
Electronics 2025, 14(15), 2996; https://doi.org/10.3390/electronics14152996 - 27 Jul 2025
Viewed by 246
Abstract
A broadband, efficient monolithic microwave integrated circuit power amplifier (MMIC PA) in OMMIC’s 0.1 μm GaN-on-Si technology for 5G millimeter-wave communication is presented. This study concentrates on the output matching design, which has an important influence on the PA’s performance. A compact one-order [...] Read more.
A broadband, efficient monolithic microwave integrated circuit power amplifier (MMIC PA) in OMMIC’s 0.1 μm GaN-on-Si technology for 5G millimeter-wave communication is presented. This study concentrates on the output matching design, which has an important influence on the PA’s performance. A compact one-order synthesized transformer network (STN) is adopted to match the 50 Ω load to the extracted large-signal output model of the transistor. A dual-objective strategy is developed for parameter optimization, incorporating the impedance transformation trajectory inside the predefined optimal impedance domain (OID) that satisfies the required specifications, with approximation to selected optimal load impedances. By introducing a custom adjustment factor β into the error function, coupled with an automated iterative tuning process based on S-parameter simulations, desired broadband matching results can be rapidly achieved. The proposed two-stage PA occupies a small chip area of only 1.23 mm2 and demonstrates good frequency consistency over the 24–31 GHz band. Continuous-wave characterization shows a flat small-signal gain of 19.7 ± 0.5 dB; both the output power (Pout) and the power-added efficiency (PAE) at the 4 dB compression point remain smooth, ranging from 32.3 to 32.7 dBm and 35.5% to 37.8%, respectively. The peak PAE reaches up to nearly 40% at the center frequency. Full article
(This article belongs to the Special Issue Advanced RF/Microwave Circuits and System for New Applications)
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13 pages, 2944 KiB  
Article
Enhancing the Performance of Si/Ga2O3 Heterojunction Solar-Blind Photodetectors for Underwater Applications
by Nuoya Li, Zhixuan Liao, Linying Peng, Difei Xue, Kai Peng and Peiwen Lv
Nanomaterials 2025, 15(14), 1137; https://doi.org/10.3390/nano15141137 - 21 Jul 2025
Viewed by 357
Abstract
Epitaxial growth of β-Ga2O3 nanowires on silicon substrates was realized by the low-pressure chemical vapor deposition (LPCVD) method. The as-grown Si/Ga2O3 heterojunctions were employed in the Underwater DUV detection. It is found that the carrier type as [...] Read more.
Epitaxial growth of β-Ga2O3 nanowires on silicon substrates was realized by the low-pressure chemical vapor deposition (LPCVD) method. The as-grown Si/Ga2O3 heterojunctions were employed in the Underwater DUV detection. It is found that the carrier type as well as the carrier concentration of the silicon substrate significantly affect the performance of the Si/Ga2O3 heterojunction. The p-Si/β-Ga2O3 (2.68 × 1015 cm−3) devices exhibit a responsivity of up to 205.1 mA/W, which is twice the performance of the devices on the n-type substrate (responsivity of 93.69 mA/W). Moreover, the devices’ performance is enhanced with the increase in the carrier concentration of the p-type silicon substrates; the corresponding device on the high carrier concentration substrate (6.48 × 1017 cm−3) achieves a superior responsivity of 845.3 mA/W. The performance enhancement is mainly attributed to the built-in electric field at the p-Si/n-Ga2O3 heterojunction and the reduction in the Schottky barrier under high carrier concentration. These findings would provide a strategy for optimizing carrier transport and interface engineering in solar-blind UV photodetectors, advancing the practical use of high-performance solar-blind photodetectors for underwater application. Full article
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18 pages, 4038 KiB  
Article
Highly Efficient and Stable Ni-Cs/TS-1 Catalyst for Gas-Phase Propylene Epoxidation with H2 and O2
by Ziyan Mi, Huayun Long, Yuhua Jia, Yue Ma, Cuilan Miao, Yan Xie, Xiaomei Zhu and Jiahui Huang
Catalysts 2025, 15(7), 694; https://doi.org/10.3390/catal15070694 - 21 Jul 2025
Viewed by 400
Abstract
The development of non-noble metal catalysts for gas-phase propylene epoxidation with H2/O2 remains challenging due to their inadequate activity and stability. Herein, we report a Cs+-modified Ni/TS-1 catalyst (9%Ni-Cs/TS-1), which exhibits unprecedented catalytic performance, giving a state-of-the-art PO [...] Read more.
The development of non-noble metal catalysts for gas-phase propylene epoxidation with H2/O2 remains challenging due to their inadequate activity and stability. Herein, we report a Cs+-modified Ni/TS-1 catalyst (9%Ni-Cs/TS-1), which exhibits unprecedented catalytic performance, giving a state-of-the-art PO formation rate of 382.9 gPO·kgcat−1·h−1 with 87.8% selectivity at 200 °C. The catalyst stability was sustainable for 150 h, far surpassing reported Ni-based catalysts. Ni/TS-1 exhibited low catalytic activity. However, the Cs modification significantly enhanced the performance of Ni/TS-1. Furthermore, the intrinsic reason for the enhanced performance was elucidated by multiple techniques such as XPS, N2 physisorption, TEM, 29Si NMR, NH3-TPD-MS, UV–vis, and so on. The findings indicated that the incorporation of Cs+ markedly boosted the reduction of Ni, enhanced Ni0 formation, strengthened Ni-Ti interactions, reduced acid sites to inhibit PO isomerization, improved the dispersion of Ni nanoparticles, reduced particle size, and improved the hydrophobicity of Ni/TS-1 to facilitate propylene adsorption/PO desorption. The 9%Ni-Cs/TS-1 catalyst demonstrated exceptional performance characterized by a low cost, high activity, and long-term stability, offering a viable alternative to Au-based systems. Full article
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24 pages, 6475 KiB  
Review
Short-Circuit Detection and Protection Strategies for GaN E-HEMTs in High-Power Applications: A Review
by Haitz Gezala Rodero, David Garrido Díez, Iosu Aizpuru Larrañaga and Igor Baraia-Etxaburu
Electronics 2025, 14(14), 2875; https://doi.org/10.3390/electronics14142875 - 18 Jul 2025
Viewed by 392
Abstract
Gallium nitride (GaN) enhancement-mode high-electron-mobility transistors ( E-HEMTs) deliver superior performance compared to traditional silicon (Si) and silicon carbide (SiC) counterparts. Their faster switching speeds, lower on-state resistances, and higher operating frequencies enable more efficient and compact power converters. However, their integration into [...] Read more.
Gallium nitride (GaN) enhancement-mode high-electron-mobility transistors ( E-HEMTs) deliver superior performance compared to traditional silicon (Si) and silicon carbide (SiC) counterparts. Their faster switching speeds, lower on-state resistances, and higher operating frequencies enable more efficient and compact power converters. However, their integration into high-power applications is limited by critical reliability concerns, particularly regarding their short-circuit (SC) withstand capability and overvoltage (OV) resilience. GaN devices typically exhibit SC withstand times of only a few hundred nanoseconds, needing ultrafast protection circuits, which conventional desaturation (DESAT) methods cannot adequately provide. Furthermore, their high switching transients increase the risk of false activation events. The lack of avalanche capability and the dynamic nature of GaN breakdown voltage exacerbate issues related to OV stress during fault conditions. Although SC-related behaviour in GaN devices has been previously studied, a focused and comprehensive review of protection strategies tailored to GaN technology remains lacking. This paper fills that gap by providing an in-depth analysis of SC and OV failure phenomena, coupled with a critical evaluation of current and next-generation protection schemes suitable for GaN-based high-power converters. Full article
(This article belongs to the Special Issue Advances in Semiconductor GaN and Applications)
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14 pages, 2124 KiB  
Article
Simultaneous Submicron Temperature Mapping of Substrate and Channel in P-GaN/AlGaN/GaN HEMTs Using Raman Thermometry
by Jaesun Kim, Seungyoung Lim, Gyeong Eun Choi, Jung-ki Park, Ho-Young Cha, Cheol-Ho Kwak, Jinhong Lim, Youngboo Moon and Jung-Hoon Song
Appl. Sci. 2025, 15(14), 7860; https://doi.org/10.3390/app15147860 - 14 Jul 2025
Viewed by 290
Abstract
In this study, we introduce a high-resolution, high-speed thermal imaging technique using Raman spectroscopy to simultaneously measure the temperature of a substrate and a channel. By modifying the Raman spectrometer, we achieved a measurement speed faster than commercial spectrometers. This system demonstrated a [...] Read more.
In this study, we introduce a high-resolution, high-speed thermal imaging technique using Raman spectroscopy to simultaneously measure the temperature of a substrate and a channel. By modifying the Raman spectrometer, we achieved a measurement speed faster than commercial spectrometers. This system demonstrated a sub-micron spatial resolution and the ability to measure the temperatures of the Si substrate and GaN channel simultaneously. During high-current operation, we observed significant self-heating in the GaN channel, with hotspots 100 °C higher than the surroundings, while the Si substrate showed an even temperature distribution. The ability to detect hotspots can help secure the reliability of devices through early failure analysis and can also be used for improvement research to reduce hotspots. These findings highlight the potential of this technique for early defect inspection and device improvement research. This study provides a novel and effective method for measuring the sub-micron resolution temperature distribution in devices, which can be applied to various semiconductor devices, including SiC-based power devices. Full article
(This article belongs to the Special Issue Electric Power Applications II)
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13 pages, 2498 KiB  
Article
Evaluation of Dynamic On-Resistance and Trapping Effects in GaN on Si HEMTs Using Rectangular Gate Voltage Pulses
by Pasquale Cusumano, Alessandro Sirchia and Flavio Vella
Electronics 2025, 14(14), 2791; https://doi.org/10.3390/electronics14142791 - 11 Jul 2025
Cited by 1 | Viewed by 342
Abstract
Dynamic on-resistance (RON) of commercial GaN on Si normally off high-electron-mobility transistor (HEMT) devices is a very important parameter because it is responsible for conduction losses that limit the power conversion efficiency of high-power switching converters. Due to charge trapping effects, [...] Read more.
Dynamic on-resistance (RON) of commercial GaN on Si normally off high-electron-mobility transistor (HEMT) devices is a very important parameter because it is responsible for conduction losses that limit the power conversion efficiency of high-power switching converters. Due to charge trapping effects, dynamic RON is always higher than in DC, a behavior known as current collapse. To study how short-time dynamics of charge trapping and release affects RON we use rectangular 0–5 V gate voltage pulses with durations in the 1 μs to 100 μs range. Measurements are first carried out for single pulses of increasing duration, and it is found that RON depends on both pulse duration and drain current ID, being higher at shorter pulse durations and lower ID. For a train of five pulses, RON decreases with pulse number, reaching a steady state after a time interval of 100 μs. The response to a five pulses train is compared to that of a square-wave signal to study the time evolution of RON toward a dynamic steady state. The DC RON is also measured, and it is a factor of ten smaller than dynamic RON at the same ID. This confirms that a reduction in trapped charges takes place in DC as compared to the square-wave switching operation. Additional off-state stress tests at VDS = 55 V reveal the presence of residual surface traps in the drain access region, leading to four times increase in RON in comparison to pristine devices. Finally, the dynamic RON is also measured by the double-pulse test (DPT) technique with inductive load, giving a good agreement with results from single-pulse measurements. Full article
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9 pages, 1221 KiB  
Article
High-Performance GaN-Based Green Flip-Chip Mini-LED with Lattice-Compatible AlN Passivation Layer
by Jiahao Song, Lang Shi, Siyuan Cui, Lingyue Meng, Qianxi Zhou, Jingjing Jiang, Conglong Jin, Jiahui Hu, Kuosheng Wen and Shengjun Zhou
Nanomaterials 2025, 15(13), 1048; https://doi.org/10.3390/nano15131048 - 5 Jul 2025
Viewed by 412
Abstract
The GaN-based green miniaturized light-emitting diode (mini-LED) is a key component for the realization of full-color display. Optimized passivation layers can alleviate the trapping of carriers by sidewall defects and are regarded as an effective way to improve the external quantum efficiency (EQE) [...] Read more.
The GaN-based green miniaturized light-emitting diode (mini-LED) is a key component for the realization of full-color display. Optimized passivation layers can alleviate the trapping of carriers by sidewall defects and are regarded as an effective way to improve the external quantum efficiency (EQE) efficiency of mini-LEDs. Since AlN has a closer lattice match to GaN compared to other heterogeneous passivation materials, we boosted the EQE of GaN-based green flip-chip mini-LEDs through the deposition of a lattice-compatible AlN passivation layer through atomic layer deposition (ALD) and a SiO2 passivation layer through plasma-enhanced chemical vapor deposition (PECVD). Benefiting from reduced sidewall nonradiative recombination, the EQE of the green flip-chip mini-LED with a composite ALD-AlN/PECVD-SiO2 passivation layer reached 34.14% at 5 mA, which is 34.6% higher than that of the green flip-chip mini-LED with a single PECVD-SiO2 passivation layer. The results provide guidance for the realization of high-performance mini-LEDs by selecting lattice-compatible passivation layers. Full article
(This article belongs to the Section Nanoelectronics, Nanosensors and Devices)
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18 pages, 2659 KiB  
Article
DFT Study of Initial Surface Reactions in Gallium Nitride Atomic Layer Deposition Using Trimethylgallium and Ammonia
by P. Pungboon Pansila, Seckson Sukhasena, Saksit Sukprasong, Worasitti Sriboon, Wipawee Temnuch, Tongsai Jamnongkan and Tanabat Promjun
Appl. Sci. 2025, 15(13), 7487; https://doi.org/10.3390/app15137487 - 3 Jul 2025
Viewed by 509
Abstract
The initial surface reaction of gallium nitride (GaN) grown by atomic layer deposition (GaN-ALD) was investigated using density functional theory (DFT) calculations. Trimethylgallium (TMG) and ammonia (NH3) were used as gallium (Ga) and nitrogen (N) precursors, respectively. DFT calculations at the [...] Read more.
The initial surface reaction of gallium nitride (GaN) grown by atomic layer deposition (GaN-ALD) was investigated using density functional theory (DFT) calculations. Trimethylgallium (TMG) and ammonia (NH3) were used as gallium (Ga) and nitrogen (N) precursors, respectively. DFT calculations at the B3LYP/6-311+G(2d,p) and 6-31G(d) levels were performed to compute relative energies and optimize chemical structures, respectively. TMG adsorption on Si15H18–(NH2)2 and Si15H20=(NH)2 clusters was modeled, where –NH2 and =NH surface species served as adsorption sites. The reaction mechanisms in the adsorption and nitridation steps were investigated. The results showed that TMG can adsorb on both surface adsorption sites. In the initial adsorption stage, TMG adsorbs onto =NH- and –NH2-terminated Si(100) surfaces with activation energies of 1.11 and 2.00 eV, respectively, indicating that the =NH site is more reactive. During subsequent NH3 adsorption, NH3 adsorbs onto the residual TMG on the =NH- and –NH2-terminated surfaces with activation energies of approximately 2.00 ± 0.02 eV. The reaction pathways indicate that NH3 adsorbs via similar mechanisms on both surfaces, resulting in comparable nitridation kinetics. Furthermore, this study suggests that highly reactive NH2 species generated in the gas phase from ionized NH3 may help reduce the process temperature in the GaN-ALD process. Full article
(This article belongs to the Section Surface Sciences and Technology)
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17 pages, 6103 KiB  
Article
Development of Certified Reference Material of L-Thyroxine by Using Mass Balance and Quantitative Nuclear Magnetic Resonance
by Qiang Zhao, Weifei Zhang, Dan Song, Xirui Zhou, Xianjiang Li, Huan Yao, Wenjing Xing, Hongmei Li, Jian Ma and Peng Xiao
Molecules 2025, 30(13), 2840; https://doi.org/10.3390/molecules30132840 - 2 Jul 2025
Viewed by 362
Abstract
L-thyroxine (T4) is an important hormone for diagnosing and evaluating thyroid function disorders. As outlined in ISO17511, having a certified reference material (CRM) is crucial for ensuring that the results of clinical tests are traceable to the SI-unit. This study employed two principal [...] Read more.
L-thyroxine (T4) is an important hormone for diagnosing and evaluating thyroid function disorders. As outlined in ISO17511, having a certified reference material (CRM) is crucial for ensuring that the results of clinical tests are traceable to the SI-unit. This study employed two principal methods to evaluate the purity of T4, mass balance (MB) and quantitative nuclear magnetic resonance (qNMR), both of which are SI-traceable (International System of Units) approaches. The MB method involved a detailed analysis of impurities, including water, structurally related compounds, and volatile and non-volatile substances. A variety of techniques were employed to characterize T4 and its impurities, including liquid-phase tandem high-resolution mass spectrometry, ultraviolet spectrophotometry, infrared spectroscopy, and both 1H-NMR and 13C-NMR. Additionally, impurities were quantified using Karl Fischer coulometric titration, ion chromatography, gas chromatography–mass spectrometry, and inductively coupled plasma–mass spectrometry. In qNMR, ethylparaben was used as the internal standard for direct value assignment. The results showed T4 purities of 94.92% and 94.88% for the MB and qNMR methods, respectively. The water content was determined to be 3.563% (n = 6), representing the highest impurity content. Ten structurally related organic impurities were successfully separated, and five of them were quantified. Ultimately, a purity of 94.90% was assigned to T4 CRM, with an expanded uncertainty of 0.34% (k = 2). Full article
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15 pages, 2293 KiB  
Article
Preparing and Characterizing Nano Relative Permeability Improver for Low-Permeability Reservoirs
by Bo Li
Processes 2025, 13(7), 2071; https://doi.org/10.3390/pr13072071 - 30 Jun 2025
Viewed by 294
Abstract
Aiming at the problems of insufficient natural productivity and large seepage resistance in low-permeability oil and gas reservoirs, a nano relative permeability improver based on nano SiO2 was developed in this study. The nano relative permeability improver was prepared by the reversed-phase [...] Read more.
Aiming at the problems of insufficient natural productivity and large seepage resistance in low-permeability oil and gas reservoirs, a nano relative permeability improver based on nano SiO2 was developed in this study. The nano relative permeability improver was prepared by the reversed-phase microemulsion method, and the formula was optimized (nano SiO2 5.1%, Span-80 33%, isobutanol 18%, NaCl 2%), so that the minimum median particle size was 4.2 nm, with good injectivity and stability. Performance studies showed that the improvement agent had low surface tension (30–35 mN/m) and interfacial tension (3–8 mN/m) as well as significantly reduced the rock wetting angle (50–84°) and enhanced wettability. In addition, it had good temperature resistance, shear resistance, and acid-alkali resistance, making it suitable for complex environments in low-permeability reservoirs. Full article
(This article belongs to the Special Issue Circular Economy on Production Processes and Systems Engineering)
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7 pages, 645 KiB  
Article
Multi-Path Precharge for GaN Flying-Capacitor-Multi-Level Totem-Pole PFC
by Qingxuan Ma, Qingyun Huang, Felice Makain, Alex Q. Huang and Michael A. de Rooij
Electronics 2025, 14(13), 2637; https://doi.org/10.3390/electronics14132637 - 30 Jun 2025
Viewed by 297
Abstract
GaN flying-capacitor-multi-level (FCML) Totem-Pole power-factor-correctors (PFCs) have been demonstrated with very high density and efficiency in the literature. However, there is still a lack of detailed discussion about flying capacitor voltage precharge during the start-up for GaN FCML Totem-Pole PFCs. To enhance the [...] Read more.
GaN flying-capacitor-multi-level (FCML) Totem-Pole power-factor-correctors (PFCs) have been demonstrated with very high density and efficiency in the literature. However, there is still a lack of detailed discussion about flying capacitor voltage precharge during the start-up for GaN FCML Totem-Pole PFCs. To enhance the reliability during start-up, we propose a multi-path and multi-step flying capacitor precharge method. In our proposed method, the bulky DC link capacitor is precharged through the path of the auxiliary line-frequency Si diode half-bridge and the body-diodes of the Si MOSFET half-bridge. The flying capacitors which have much smaller capacitances are precharged through the path of the GaN devices and the body-diodes of the Si half-bridge. The DC link capacitor is more than 100 times higher than the flying capacitor in this topology. Therefore, by splitting the total precharging current into two paths, the precharging current through the GaN devices is almost 100 times lower than that through the body-diodes of Si MOSFETs. As a result, this method protects expensive GaN devices from high inrush current and significantly improves the reliability of the GaN devices during the voltage precharge. Detailed operation principles and experimental verifications are presented in this paper. Full article
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16 pages, 6370 KiB  
Article
The Role of Ga Promoter in Enhancing the Performance of Ni/ZrO2+SiO2 Catalysts for Dry Methane Reforming
by Salma A. Al-Zahrani, Ahmed A. Ibrahim, Ghzzai Almutairi, Anis Hamza Fakeeha, Najat Masood, Sahar Y. Rajeh, Ahmed Al Otaib, Hessah Difallah A. Al-Enazy and Ahmed S. Al-Fatesh
Catalysts 2025, 15(7), 627; https://doi.org/10.3390/catal15070627 - 26 Jun 2025
Viewed by 448
Abstract
The potential of dry reforming methane (DRM) to convert two greenhouse gases concurrently is drawing interest from around the world. This research focused on developing supported nickel catalysts for the DRM, utilizing stabilized zirconia (SZ31107), which contains 5% SiO2, as the [...] Read more.
The potential of dry reforming methane (DRM) to convert two greenhouse gases concurrently is drawing interest from around the world. This research focused on developing supported nickel catalysts for the DRM, utilizing stabilized zirconia (SZ31107), which contains 5% SiO2, as the support material. To promote the catalysts with a 5 wt.% Ni concentration, we used varying gallium loadings, specifically 0.1, 0.25, 0.5, 0.75, and 1 wt.%. After a detailed analysis, characterization was performed using X-ray diffraction, N2-physorption, temperature-programmed reduction/desorption techniques, thermogravimetry, and Raman spectroscopy. The optimal DRM performance, achieved at 700 °C with a 1:1 CH4:CO2 feed, was recorded for the catalyst that has 0.25 wt.% Ga. The catalyst demonstrated remarkable average conversion rates of 56% for CH4 and 66% for CO2 after 300 min at 700 °C, with an H2:CO ratio of 0.84. Activity was further enhanced by raising the temperature to 800 °C, which resulted in an 87% CO2 conversion and an 80% CH4 conversion. Studies on the catalyst’s long-term stability revealed a slow deactivation. With computed activation energies of 28,009 J/mol for CH4 conversion and 21,875 J/mol for CO2 conversion, temperature-programmed reaction tests conducted over the best catalyst demonstrated the DRM reaction’s endothermic character. Small additions of Ga encouraged the creation of more graphitic carbon structures, according to Raman spectroscopy of spent catalysts; the ideal catalyst had the lowest ID/IG ratio. These results suggest that the 5Ni+0.25Ga/SZ31107 catalyst is a promising candidate for large-scale syngas and hydrogen production. Full article
(This article belongs to the Section Industrial Catalysis)
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