Special Issue "Challenges in Machine Learning, Artificial Intelligence, Wireless Sensor Networks and Smart Cities"

A special issue of Processes (ISSN 2227-9717). This special issue belongs to the section "Process Control and Supervision".

Deadline for manuscript submissions: 15 November 2021.

Special Issue Editors

Dr. Pablo Chamoso
E-Mail Website
Guest Editor
Department of Computing and Automation, Faculty of Sciences, University of Salamanca. Calle Espejo sn (Edificio Multiusos I+D+i), 37007 Salamanca, Spain
Interests: machine learning; smart cities; machine learning; Internet of Things; distributed systems; Software Applications
Special Issues and Collections in MDPI journals
Dr. Guillermo Hernández
E-Mail Website
Guest Editor
Air Institute, IoT Digital Innovation Hub, 37188 Salamanca, Spain
Interests: machine learning; deep learning; natural language processing; visual analytics
Prof. Dr. Paulo Novais
E-Mail Website
Guest Editor
ALGORITMI Centre, Department of Informatics, School of Engineering, University of Minho, 4710-057 Braga, Portugal
Interests: artificial intelligence; machine learning; ambient intelligence; affective computing
Special Issues and Collections in MDPI journals

Special Issue Information

Dear Colleagues,

All sectors that are directly related to information technologies (IT) are experiencing strong growth. Every year they continue to gain more interest, with new challenges and new solutions that were previously unimaginable. This Special Issue aims to show how new trends in these fields can transform and innovate processes and services in areas such as smart cities or the Internet of Things.

This Special Issue encourages original and high-quality submissions, with both applied and theoretical research approaches, related (but not limited) to the following topics:

  • Machine learning;
  • Deep learning;
  • Artificial intelligence;
  • Smart cities;
  • Internet of Things;
  • Wireless sensor networks;
  • Visual analytics;
  • Ambient intelligence;
  • Robotics;
  • Natural language processing.

Dr. Pablo Chamoso
Dr. Guillermo Hernández
Prof. Dr. Paulo Novais
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Processes is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2000 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.


  • machine learning
  • deep learning
  • artificial intelligence
  • smart cities
  • Internet of Things
  • wireless sensor networks

Published Papers (1 paper)

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Open AccessArticle
Production Flow Analysis in a Semiconductor Fab Using Machine Learning Techniques
Processes 2021, 9(3), 407; https://doi.org/10.3390/pr9030407 - 24 Feb 2021
Viewed by 527
In a semiconductor fab, wafer lots are processed in complex sequences with re-entrants and parallel machines. It is necessary to ensure smooth wafer lot flows by detecting potential disturbances in a real-time fashion to satisfy the wafer lots’ demands. This study aims to [...] Read more.
In a semiconductor fab, wafer lots are processed in complex sequences with re-entrants and parallel machines. It is necessary to ensure smooth wafer lot flows by detecting potential disturbances in a real-time fashion to satisfy the wafer lots’ demands. This study aims to identify production factors that significantly affect the system’s throughput level and find the best prediction model. The contributions of this study are as follows: (1) this is the first study that applies machine learning techniques to identify important real-time factors that influence throughput in a semiconductor fab; (2) this study develops a test bed in the Anylogic software environment, based on the Intel minifab layout; and (3) this study proposes a data collection scheme for the production control mechanism. As a result, four models (adaptive boosting, gradient boosting, random forest, decision tree) with the best accuracies are selected, and a scheme to reduce the input data types considered in the models is also proposed. After the reduction, the accuracy of each selected model was more than 97.82%. It was found that data related to the machines’ total idle times, processing steps, and machine E have notable influences on the throughput prediction. Full article
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