Application of Plasma Technology for Nanomodeling and Nanofabrication

Dear Colleagues,

Plasma technology has emerged as a transformative tool in nanofabrication and nanomodeling, enabling precise control over materials and the construction of intricate nanostructures. Plasmas, made up of charged particles, ions, and neutral atoms, drive processes such as etching, deposition, surface modification, and ion implantation. These processes are essential for creating nanoscale features and tailored material surfaces, establishing plasma techniques as indispensable for advances in electronics, photonics, and energy devices.

The key plasma techniques used include reactive ion etching (RIE), plasma-enhanced chemical vapor deposition (PECVD), plasma spray, plasma-enhanced atomic layer deposition (PEALD), nano-etching, and atomic layer etching (ALE). RIE, nano-etching, and ALE offer nanometer-level precision in patterning surfaces, while PECVD enables the controlled deposition of thin films. Plasma spray technology produces thick, durable coatings, ideal for application in thermal barriers, wear-resistant surfaces, and biomedical implants. PEALD provides atomic-level control over film thickness and composition, facilitating the deposition of uniform coatings on complex 3D structures. Combined with plasma processes, PEALD and ALE produce dense, high-quality thin films critical for semiconductors, microelectromechanical systems (MEMSs), and optoelectronic materials.

In nanomodeling, plasma technology is also essential for controlled surface modifications at the nanoscale, using atmospheric pressure plasma jets (APPJs) and low-pressure plasma systems. These methods can activate, clean, and texture surfaces to enhance properties like wettability, biocompatibility, and catalytic activity, which are crucial for sensors, biomedical implants, and chemically functionalized coatings. A synergistic approach—using a plasma spray to deposit bulk materials and PEALD or ALE to refine surface properties—allows for the robust design of materials with functionalized layers.

Advances in plasma-based surface modifications further allow adjustments in crystallinity and defect structures, enhancing thin-film adhesion and boosting device performance. Plasma techniques enable the functionalization of surfaces, which is crucial for improving the efficiency and longevity of thin-film devices across a range of industries.

In summary, plasma technology plays a vital role in advancing nanomodeling and nanofabrication, offering researchers refined methods by which to develop materials with precise structural and functional properties. These technologies enhance the synthesis, integration, and performance of nanomaterials, unlocking new possibilities in electronics, energy storage, biomedicine, and environmental applications.

This Special Issue seeks to explore innovative uses of plasma technology in nanomodeling and nanofabrication. Its topics of interest include the following:

1. Innovative plasma-based techniques for nanofabrication, such as RIE, nano-etching, atomic layer etching, PECVD, plasma spray, and PEALD, with emphasis on advancements in precise patterning and thin-film deposition.
2. Surface modification using atmospheric pressure plasma jets (APPJs) and low-pressure plasmas.
3. Plasma-assisted nanostructuring for enhanced material properties.
4. Applications of plasma-treated nanostructures, with a focus on their uses in electronics, photonics, energy storage, and biomedicine, showcasing plasma’s versatility across industries.
5. The exploration of plasma-enhanced antimicrobial coatings: investigating their potential uses in healthcare, environmental sustainability, and food packaging.

Researchers are encouraged to submit original articles, reviews, and perspectives that contribute to the evolving field of plasma-based nanotechnology.

Prof. Dr. William Chiappim Junior
Dr. Felipe de Souza Miranda
Guest Editors

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