Special Issue "Nanopatterned Functional Materials"

A special issue of Nanomaterials (ISSN 2079-4991). This special issue belongs to the section "Synthesis, Interfaces and Nanostructures".

Deadline for manuscript submissions: 30 June 2021.

Special Issue Editors

Prof. Dr. Jose Maria De Teresa
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Guest Editor
Instituto de Ciencia de Materiales de Aragón, CSIC-Universidad de Zaragoza, Facultad de Ciencias, Zaragoza 50009, Spain
Interests: advanced nanolithography techniques by focused ion and electron beams; nano-magnetism and spintronics; nano-superconductivity; new materials (graphene, topological materials, etc.)
Special Issues and Collections in MDPI journals
Dr. Soraya Sangiao
Website
Guest Editor
Instituto de Nanociencia de Aragón, Universidad de Zaragoza, Zaragoza 50018, Spain and Instituto de Ciencia de Materiales de Aragón, CSIC-Universidad de Zaragoza, Zaragoza 50009, Spain
Interests: advanced nanolithography techniques by focused electron and ion beams; spintronics; ultrafast magnetization dynamics; ferromagnetic resonance; spin pumping; ferromagnetic insulators; topological insulators

Special Issue Information

Dear Colleagues,

Functional materials are at the core of modern technologies. In recent decades, the need for miniaturization, integration, and control of novel physical and chemical effects have necessitated the development of strategies for the fabrication of nanopatterned functional materials. Strategies based on bottom-up as well as top-down fabrication approaches have contributed to this global effort, leading to huge progress in technologies such as electronics, energy, information storage, sensors and actuators, catalysis, medicine, etc. This Special Issue dedicated to Nanopatterned Functional Materials aims to attract contributions related to the use of top-down approaches to fabricate materials with sub-micron precision that exhibit functional properties in modern technologies. The Guest Editors encourage submissions related to the application of existing lithography techniques and new lithography developments with the aim of producing nanopatterned materials relevant to any of the mentioned technologies. Some of the lithography techniques that are expected to be involved in the development of such nanomaterials are as follows:

  • Photon-based lithography using UV, EUV, X-rays, etc.
  • Electron-based lithography using focused electron beams such as EBL, FEBID, etc.
  • Ion-based lithography using focused ion beams such as FIB, FIBID, etc.
  • Scanning probe lithography using AFM or STM.
  • Nanoimprinting and related lithographies.
  • Other top-down lithographies: nanostencil lithography, nanosphere lithography, etc.

Besides technology-oriented contributions, the Guest Editors also encourage submissions involving research of novel effects arising from the sub-micron dimensions of the materials in, but not limited to, the following fields:

  • Magnetism and spintronics.
  • Photonics and plasmonics.
  • Superconductivity.
  • Mechanics.
  • Topological and 2D materials.
  • Biomedical applications.

It is our pleasure to invite you to submit manuscripts to this Special Issue on “Nanopatterned Functional Materials”. Review and original research articles are also welcome.

Prof. Jose Maria De Teresa
Dr. Soraya Sangiao
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Nanomaterials is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2200 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • Top-down lithography
  • Nanopatterned materials
  • Functional nanomaterials

Published Papers (2 papers)

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Research

Open AccessArticle
Optimization of Pt-C Deposits by Cryo-FIBID: Substantial Growth Rate Increase and Quasi-Metallic Behaviour
Nanomaterials 2020, 10(10), 1906; https://doi.org/10.3390/nano10101906 - 24 Sep 2020
Cited by 1
Abstract
The Focused Ion Beam Induced Deposition (FIBID) under cryogenic conditions (Cryo-FIBID) technique is based on obtaining a condensed layer of precursor molecules by cooling the substrate below the condensation temperature of the gaseous precursor material. This condensed layer is irradiated with ions according [...] Read more.
The Focused Ion Beam Induced Deposition (FIBID) under cryogenic conditions (Cryo-FIBID) technique is based on obtaining a condensed layer of precursor molecules by cooling the substrate below the condensation temperature of the gaseous precursor material. This condensed layer is irradiated with ions according to a desired pattern and, subsequently, the substrate is heated above the precursor condensation temperature, revealing the deposits with the shape of the exposed pattern. In this contribution, the fast growth of Pt-C deposits by Cryo-FIBID is demonstrated. Here, we optimize various parameters of the process in order to obtain deposits with the lowest-possible electrical resistivity. Optimized ~30 nm-thick Pt-C deposits are obtained using ion irradiation area dose of 120 μC/cm2 at 30 kV. This finding represents a substantial increment in the growth rate when it is compared with deposits of the same thickness fabricated by standard FIBID at room temperature (40 times enhancement). The value of the electrical resistivity in optimized deposits (~4 × 104 µΩ cm) is suitable to perform electrical contacts to certain materials. As a proof of concept of the potential applications of this technology, a 100 µm × 100 µm pattern is carried out in only 43 s of ion exposure (area dose of 23 μC/cm2), to be compared with 2.5 h if grown by standard FIBID at room temperature. The ion trajectories and the deposit composition have been simulated using a binary-collision-approximation Monte Carlo code, providing a solid basis for the understanding of the experimental results. Full article
(This article belongs to the Special Issue Nanopatterned Functional Materials)
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Open AccessArticle
Droplet Coalescence by Selective Wettability Enhancement in Microfluidic Devices
Nanomaterials 2020, 10(4), 737; https://doi.org/10.3390/nano10040737 - 12 Apr 2020
Cited by 2
Abstract
A new approach for droplet coalescence in microfluidic channels based on selective surface energy alteration is demonstrated. The proposed method involves patterning the surface of cyclic olefin copolymer (COC), a hydrophobic substrate attached to a polydimethylsiloxane hydrophobic microchannel, with graphene oxide (GO) using [...] Read more.
A new approach for droplet coalescence in microfluidic channels based on selective surface energy alteration is demonstrated. The proposed method involves patterning the surface of cyclic olefin copolymer (COC), a hydrophobic substrate attached to a polydimethylsiloxane hydrophobic microchannel, with graphene oxide (GO) using standard microfabrication techniques. Surface wettability and adhesion analyses confirmed the enhancement of the COC surface energy upon GO patterning and the stability of the GO film on COC. Three representative cases are illustrated to demonstrate the effectiveness of the method on the coalescence of droplets for different droplet flow regimes, as well as the effect of changing the size of the patterned surface area on the fusion process. The method achieves droplet coalescence without the need for precise synchronization. Full article
(This article belongs to the Special Issue Nanopatterned Functional Materials)
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