ALD Technique for Functional Coatings of Nanostructured Materials

Dear Colleagues,

The conformability and thickness control of thin layers achieved using the atomic layer deposition (ALD) technique have driven the development of new material structures as well as novel devices that are more efficient in many research fields such as magnetism, photonics or biochemistry, among others. The research is still focusing on the development of novel materials and their growth mechanisms, and designing new precursors and deposition approaches. Moreover, the implementation of such techniques in combination with existing technologies will give rise to new downsized devices with better performance. In addition, the ALD process is required in many research areas such as the surface protection of nanostructures, allowing their manipulation and characterization to advance in fundamental research and quantum phenomena investigations.

This Special Issue is focused on, but not confined to, three main research levels involving the ALD technique.

• The development of new precursors and deposition approaches to increase the state of the art of ALD materials.
• Implementation of ALD in combination with other fabrication routes to yield new nanostructured materials.
• Fabrication of advance devices using the ALD technique to improve their performance.

 

Prof. Victor M. Prida
Dr. Víctor Vega Martínez
Dr. Javier García Fernández
Guest Editors

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