ALD Technique for Functional Coatings of Nanostructured Materials

Dear Colleagues,

The conformability and thickness control of thin layers achieved using the atomic layer deposition (ALD) technique have driven the development of new material structures as well as novel devices that are more efficient in many research fields such as magnetism, photonics or biochemistry, among others. The research is still focusing on the development of novel materials and their growth mechanisms, and designing new precursors and deposition approaches. Moreover, the implementation of such techniques in combination with existing technologies will give rise to new downsized devices with better performance. In addition, the ALD process is required in many research areas such as the surface protection of nanostructures, allowing their manipulation and characterization to advance in fundamental research and quantum phenomena investigations.

This Special Issue is focused on, but not confined to, three main research levels involving the ALD technique.

• The development of new precursors and deposition approaches to increase the state of the art of ALD materials.
• Implementation of ALD in combination with other fabrication routes to yield new nanostructured materials.
• Fabrication of advance devices using the ALD technique to improve their performance.

Prof. Victor M. Prida
Dr. Víctor Vega Martínez
Dr. Javier García Fernández
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 250 words) can be sent to the Editorial Office for assessment.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-anonymized peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Nanomaterials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.