Special Issue "Nanolithography: A Theme Issue in Honor of Professor José María De Teresa on the Occasion of His 50th Birthday"
Deadline for manuscript submissions: closed (30 June 2022) | Viewed by 4761
Interests: nanomagnetism; spintronics; nanofabrication; magneto-optics
Interests: focused electron beam induced deposition; electron beam lithography; magnetic nanostructures; nanowires; nanotubes; magnetization dynamics
José María De Teresa is Research Professor at the Instituto de Nanociencia y Materiales de Aragón (INMA) in Spain. After obtaining a Ph.D. in Physics at the Universidad de Zaragoza in 1997, under the supervision of Prof. del Moral and Prof. Ibarra, he carried out postdoctoral stays at IFW (Dresden, Germany) and CNRS (Paris, France). In his second postdoc, he worked under the supervision of Prof. Albert Fert, Nobel Laureate in Physics 2007. During this postdoctoral period, he learned about the use of lithography techniques, which he later implemented at his current institute, where he leads the group of Nanofabrication and Advanced Microscopies (NANOMIDAS). Currently, he coordinates the Spanish network on Nanolithography and the FIB-SEM area at the Spanish National facility for Advanced Microscopies. Since 2021, he is chairing the Condensed Matter Division Board of the European Physical Society. His main research interest is nanofabrication with focused electron and ion beams for applications in nanoelectronics, magnetic materials, nano-superconductors, and new materials. He has published more than 200 research articles, supervised 15 Ph.D. students, and given about 100 invited talks at conferences. More information about his scientific activities can be found at https://nanofab-deteresa.com/
Nanolithography encompasses the set of fabrication techniques that allow patterning materials and building devices with a nanoscale resolution. Nanolithography is complemented with thin-film-deposition techniques, as well as self-assembly and self-organization, providing an immense variety of nanofabrication strategies. In this Special Issue, original articles and review and feature articles on nanolithography techniques and their applications are welcome. New material properties emerging from nanopatterning, as well as applications of nanolithography in the semiconductor and nanotechnology industry, would fit well within the scope of this Special Issue. In particular, we expect works that include the use of some of the following nanolithography techniques: optical-based lithography, electron and ion beam lithography, stamp lithography, and scanning probe lithography based on small physical apertures.
Dr. Amalio Fernández-Pacheco
Dr. Javier Pablo-Navarro
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- 2D nanomaterials
- 3D nanofabrication
- functional materials