Preparation, Characterization and Application of Metal Oxide Thin Films

Dear Colleagues,

Metal oxide thin films have been widely used in various applications such as sensors, semiconductors, displays, and optical fields. There are various techniques, such as physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition(ALD), and sol–gel coating as methods for forming metal oxide thin films. Such metal oxide films could have a porous or very dense structure. Our aim is for this Special Issue to broadly cover the formation mechanism of structure of metal oxide thin films, unique methods for analyzing these thin films, and their potential applications to high-tech industry. Additionally, even if not included in the list below, this Special Issue invites papers from the very wide research fields adjacent to or indirectly related to metal oxide thin films.

Prof. Hee Chul Lee
Guest Editor

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