Advances of Atomic Layer Deposition Synthetic Nanostructures

Dear Colleagues,

Atomic layer deposition (ALD) is an ultrathin film deposition method. This technique permits the deposition of various materials (oxides, nitrides, metals, etc.) with a thickness control on the nanomateric scale, as well as excellent uniformity and conformality.

The aim of this Special Issue is to assemble high quality contributions on the synthesis and modification of nanostructures using ALD. It will deal with the design of new nanostructures by tuning their morphology, geometry, crystallinity, and interfaces. The relation between these parameters and the physical–chemical properties will also be investigated. New applications in different fields, such as health, environment, and renewable energy, will be explored as well.

Relevant contributions related to prospective materials’ design, original materials’ properties, and innovative characterization techniques will also be considered.

Dr. Mikhael Bechelany
Guest Editor

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