Special Issue "Advances of Atomic Layer Deposition Synthetic Nanostructures"

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Advanced Nanomaterials and Nanotechnology".

Deadline for manuscript submissions: 31 August 2020.

Special Issue Editor

Dr. Mikhael Bechelany
Website
Guest Editor
Institut Européen des Membranes (IEMM, ENSCM UM CNRS UMR5635), Montpellier, France
Interests: biosensor; sensor; thin films; 2D materials; atomic layer deposition; nanostructure; nanocomposites; membrane; electrospinning; 3D printing; photocatalysis
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Special Issue Information

Dear Colleagues,

Atomic layer deposition (ALD) is an ultrathin film deposition method. This technique permits the deposition of various materials (oxides, nitrides, metals, etc.) with a thickness control on the nanomateric scale, as well as excellent uniformity and conformality.

The aim of this Special Issue is to assemble high quality contributions on the synthesis and modification of nanostructures using ALD. It will deal with the design of new nanostructures by tuning their morphology, geometry, crystallinity, and interfaces. The relation between these parameters and the physical–chemical properties will also be investigated. New applications in different fields, such as health, environment, and renewable energy, will be explored as well.

Relevant contributions related to prospective materials’ design, original materials’ properties, and innovative characterization techniques will also be considered.

Dr. Mikhael Bechelany
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2000 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • Thin film
  • Nanomaterial
  • Interface
  • Nanostructured material
  • Porous materials
  • Energy
  • Health
  • Environment
  • Membrane

Published Papers (2 papers)

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Research

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Open AccessFeature PaperArticle
In Situ Microgravimetric Study of Ion Exchanges in the Ternary Cu-In-S System Prepared by Atomic Layer Deposition
Materials 2020, 13(3), 645; https://doi.org/10.3390/ma13030645 - 01 Feb 2020
Abstract
Reaction mechanisms during the growth of multinary compounds by atomic layer deposition can be complex, especially for sulfide materials. For instance, the deposition of copper indium disulfide (CuInS2) shows a non-direct correlation between the cycle ratio, the growth per cycle of [...] Read more.
Reaction mechanisms during the growth of multinary compounds by atomic layer deposition can be complex, especially for sulfide materials. For instance, the deposition of copper indium disulfide (CuInS2) shows a non-direct correlation between the cycle ratio, the growth per cycle of each binary growth cycles, i.e., CuxS and In2S3, and the film composition. This evidences side reactions that compete with the direct Atomic Layer Deposition (ALD) growth reactions and makes the deposition of large films very challenging. To develop a robust upscalable recipe, it is essential to understand the chemical surface reactions. In this study, reaction mechanisms in the Cu-In-S ternary system were investigated in-situ by using a quartz crystal microbalance system to monitor mass variations. Pure binary indium sulfide (In2S3) and copper sulfide (CuxS) thin film depositions on Al2O3 substrate were first studied. Then, precursors were transported to react on CuxS and In2S3 substrates. In this paper, gas-phase ion exchanges are discussed based on the recorded mass variations. A cation exchange between the copper precursor and the In2S3 is highlighted, and a solution to reduce it by controlling the thickness deposited for each stack of binary materials during the CuInS2 deposition is finally proposed. Full article
(This article belongs to the Special Issue Advances of Atomic Layer Deposition Synthetic Nanostructures)
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Review

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Open AccessReview
Advances in Atomic Layer Deposition (ALD) Nanolaminate Synthesis of Thermoelectric Films in Porous Templates for Improved Seebeck Coefficient
Materials 2020, 13(6), 1283; https://doi.org/10.3390/ma13061283 - 12 Mar 2020
Abstract
Thermoelectrics is a green renewable energy technology which can significantly contribute to power generation due to its potential in generating electricity out of waste heat. The main challenge for the development of thermoelectrics is its low conversion efficiency. One key strategy to improve [...] Read more.
Thermoelectrics is a green renewable energy technology which can significantly contribute to power generation due to its potential in generating electricity out of waste heat. The main challenge for the development of thermoelectrics is its low conversion efficiency. One key strategy to improve conversion efficiency is reducing the thermal conductivity of thermoelectric materials. In this paper, the state-of-the-art progresses made in improving thermoelectric materials are reviewed and discussed, focusing on phononic engineering via applying porous templates and ALD deposited nanolaminates structure. The effect of nanolaminates structure and porous templates on Seebeck coefficient, electrical conductivity and thermal conductivity, and hence in figure of merit zT of different types of materials system, including PnCs, lead chalcogenide-based nanostructured films on planar and porous templates, ZnO-based superlattice, and hybrid organic-inorganic superlattices, will be reviewed and discussed. Full article
(This article belongs to the Special Issue Advances of Atomic Layer Deposition Synthetic Nanostructures)
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