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Advances in Metasurface Optics and Devices
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Advances in Metasurface Optics and Devices

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Optical and Photonic Materials".

Deadline for manuscript submissions: 20 November 2024 | Viewed by 350

Special Issue Editor

Prof. Dr. Ting Hu

E-Mail Website
Guest Editor
School of Microelectronics, Shanghai University, Shanghai 201800, China
Interests: metalens; metasurface; flat optics; silicon photonics

Special Issue Information

Dear Colleagues,

The metasurface has emerged as a promising technology with which to overcome the challenges of conventional bulk optics by offering a new method of light manipulation based on scattering from resonant nanostructures. The subwavelength-scale control of optical amplitude, phase, and polarization in a compact form allows metasurface-based optical components to be utilized in imaging, wavefront engineering, information processing, etc. The technology used to design and fabricate these devices necessitates knowledge and understanding of the relationship between their structures and optical characteristics.

This Special Issue will be devoted to advances in metasurface optics and devices. Original papers and review articles related to the above-mentioned areas are cordially invited.

Prof. Dr. Ting Hu
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • metasurface
  • subwavelength
  • wavefront engineering
  • flat optics

Published Papers (1 paper)

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Research

11 pages, 3448 KiB  
Article
Nanoimprinted TiO2 Metasurfaces with Reduced Meta-Atom Aspect Ratio and Enhanced Performance for Holographic Imaging
by Kaiyu Zhang, Yuqi Lin, Yang Qiu, Xingyan Zhao, Shaonan Zheng, Yuan Dong, Qize Zhong and Ting Hu
Materials 2024, 17(10), 2273; https://doi.org/10.3390/ma17102273 - 11 May 2024
Viewed by 250
Abstract
Metasurface holograms, with the capability to manipulate spatial light amplitudes and phases, are considered next-generation solutions for holographic imaging. However, conventional fabrication approaches for meta-atoms are heavily dependent on electron-beam lithography (EBL), a technique known for its expensive and time-consuming nature. In this [...] Read more.
Metasurface holograms, with the capability to manipulate spatial light amplitudes and phases, are considered next-generation solutions for holographic imaging. However, conventional fabrication approaches for meta-atoms are heavily dependent on electron-beam lithography (EBL), a technique known for its expensive and time-consuming nature. In this paper, a polarization-insensitive metasurface hologram is proposed using a cost-effective and rapid nanoimprinting method with titanium dioxide (TiO2) nanoparticle loaded polymer (NLP). Based on a simulation, it has been found that, despite a reduction in the aspect ratio of meta-atoms of nearly 20%, which is beneficial to silicon master etching, NLP filling, and the mold release processes, imaging efficiency can go up to 54% at wavelength of 532 nm. In addition, it demonstrates acceptable imaging quality at wavelengths of 473 and 671 nm. Moreover, the influence of fabrication errors and nanoimprinting material degradation in terms of residual layer thickness, meta-atom loss or fracture, thermal-induced dimensional variation, non-uniform distribution of TiO2 particles, etc., on the performance is investigated. The simulation results indicate that the proposed device exhibits a high tolerance to these defects, proving its applicability and robustness in practice. Full article
(This article belongs to the Special Issue Advances in Metasurface Optics and Devices)
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